Lee; Byoung-taek

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Byoung-taek.The latest application filed is for "reflection photomasks with a capping layer and methods for manufacturing the same".

Company Profile

0.10.5

Lee; Byoung-taek - Seoul KR
Lee, Byoung-taek - Kyungki-do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflection photomasks with a capping layer and methods for manufacturing the same Grant 6,998,200 - Lee February 14, 2	2006-02-14
Method for manufacturing capacitor of semiconductor device having dielectric layer of high dielectric constant Grant 6,828,190 - Lee , et al. December 7, 2	2004-12-07
Reflection photomasks including buffer layer comprising group VIII metal, and methods of fabricating and using the same Grant 6,699,625 - Lee , et al. March 2, 2	2004-03-02
Reflection photomasks with a capping layer and methods for manufacturing the same App 20030198874 - Lee, Byoung-Taek	2003-10-23
Method for manufacturing a capacitor of a semiconductor device Grant 6,599,806 - Lee July 29, 2	2003-07-29
Method For Manufacturing Capacitor Of Semiconductor Device Having Dielectric Layer Of High Dielectric Constant App 20020177273 - LEE, BYOUNG-TAEK ; et al.	2002-11-28
Reflection photomasks including buffer layer comprising group VIII metal, and methods of fabricating and using the same App 20020045108 - Lee, Byoung-taek ; et al.	2002-04-18
Method for manufacturing a capacitor of a semiconductor device App 20010025976 - Lee, Byoung-taek	2001-10-04
Method of forming integrated circuit capacitors having recessed oxidation barrier spacers and method of forming same Grant 6,261,849 - Lee July 17, 2	2001-07-17
Semiconductor device capacitor having a recessed contact plug Grant 6,239,461 - Lee May 29, 2	2001-05-29
Microelectronic devices including ferroelectric capacitors with lower electrodes extending into contact holes and related methods App 20010000624 - Hwang, Cheol-seong ; et al.	2001-05-03
Method for fabricating a high dielectric capacitor Grant 6,090,704 - Kim , et al. July 18, 2	2000-07-18
Integrated circuit capacitors having recessed oxidation barrier spacers Grant 6,084,765 - Lee July 4, 2	2000-07-04
Methods of forming floating-gate FFRAM devices Grant 5,940,705 - Lee , et al. August 17, 1	1999-08-17
Methods for fabricating electrode structures including oxygen and nitrogen plasma treatments Grant 5,780,115 - Park , et al. July 14, 1	1998-07-14

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