Leclerc; Mark A.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Leclerc; Mark A..The latest application filed is for "polarization vector alignment for interference lithography patterning".
- Leclerc; Mark A. - Epping NH
| Patent | Date |
|---|---|
| Period reconfiguration and closed loop calibration of an interference lithography patterning system and method of operation Grant 6,556,280 - Kelsey , et al. April 29, 2 | 2003-04-29 |
| Interference lithography using holey fibers App 20020149849 - Kelsey, Adam F. ; et al. | 2002-10-17 |
| Polarization vector alignment for interference lithography patterning App 20020149757 - Kelsey, Adam F. ; et al. | 2002-10-17 |
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