LAUFER; Timo

Patent Applications and Registrations

Patent applications and USPTO patent grants for LAUFER; Timo.The latest application filed is for "method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus".

Company Profile

7.19.18

LAUFER; Timo - Stuttgart DE
Laufer; Timo - Aalen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method For Avoiding A Degradation Of An Optical Element, Projection System, Illumination System And Projection Exposure Apparatus App 20220308463 - EHM; Dirk ; et al.	2022-09-29
Method for temperature control of a component Grant 11,372,341 - Lof , et al. June 28, 2	2022-06-28
Method for determining properties of an EUV source Grant 11,187,989 - Laufer , et al. November 30, 2	2021-11-30
Method For Temperature Control Of A Component App 20210286272 - Lof; Joeri ; et al.	2021-09-16
Method for temperature control of a component Grant 11,022,903 - Lof , et al. June 1, 2	2021-06-01
Method for temperature control of a component App 20200233318 - Lof; Joeri ; et al.	2020-07-23
Method For Determining Properties Of An Euv Source App 20200218159 - Laufer; Timo ; et al.	2020-07-09
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,684,551 - Baer , et al.	2020-06-16
Projection exposure apparatus for semiconductor lithography with increased thermal robustness Grant 10,466,598 - Akbarinia , et al. No	2019-11-05
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20190310555 - Baer; Norman ; et al.	2019-10-10
Projection Exposure Apparatus For Semiconductor Lithography With Increased Thermal Robustness App 20190219934 - Akbarinia; Alireza ; et al.	2019-07-18
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,317,802 - Baer , et al.	2019-06-11
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20180299784 - Baer; Norman ; et al.	2018-10-18
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,031,423 - Baer , et al. July 24, 2	2018-07-24
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20170315449 - Baer; Norman ; et al.	2017-11-02
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 9,746,778 - Baer , et al. August 29, 2	2017-08-29
Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus Grant 9,639,007 - Laufer , et al. May 2, 2	2017-05-02
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20160195818 - Baer; Norman ; et al.	2016-07-07
Lithography apparatus Grant 9,383,328 - Laufer July 5, 2	2016-07-05
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 9,316,929 - Baer , et al. April 19, 2	2016-04-19
Optical Arrangement In An Optical System, In Particular In A Microlithographic Projection Exposure Apparatus App 20150346612 - Laufer; Timo ; et al.	2015-12-03
Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus Grant 9,134,504 - Laufer , et al. September 15, 2	2015-09-15
Protection module for EUV lithography apparatus, and EUV lithography apparatus Grant 8,698,999 - Ehm , et al. April 15, 2	2014-04-15
Lithography Apparatus App 20130343422 - Laufer; Timo	2013-12-26
EUV Exposure Apparatus App 20130141707 - Baer; Norman ; et al.	2013-06-06
Temperature-control device for an optical assembly Grant 8,339,569 - Schoeppach , et al. December 25, 2	2012-12-25
Optical Arrangement In An Optical System, In Particular In A Microlithographic Projection Exposure Apparatus App 20120154772 - Laufer; Timo ; et al.	2012-06-21
Protection Module For Euv Lithography Apparatus, And Euv Lithography Apparatus App 20110216298 - EHM; Dirk Heinrich ; et al.	2011-09-08
Temperature-control Device For An Optical Assembly App 20110181851 - Schoeppach; Armin ; et al.	2011-07-28
Projection objective Grant 7,557,902 - Dinger , et al. July 7, 2	2009-07-07
Optical component, comprising a material with a predetermined homogeneity of thermal expansion Grant 7,524,072 - Laufer , et al. April 28, 2	2009-04-28
Optical component that includes a material having a thermal longitudinal expansion with a zero crossing Grant 7,428,037 - Laufer , et al. September 23, 2	2008-09-23
Euv projection lens with mirrors made from material with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature App 20070035814 - Dinger; Udo ; et al.	2007-02-15
Optical component that includes a material having a thermal longitudinal expansion with a zero crossing App 20050207001 - Laufer, Timo ; et al.	2005-09-22
Optical component, comprising a material with a predetermined homogneity of thermal expansion App 20050185307 - Laufer, Timo ; et al.	2005-08-25

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