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Patent applications and USPTO patent grants for Laufer; Steffen.The latest application filed is for "enhanced patterning uniformity of gate electrodes of a semiconductor device by late gate doping".
Patent | Date |
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Enhanced patterning uniformity of gate electrodes of a semiconductor device by late gate doping Grant 9,281,200 - Thees , et al. March 8, 2 | 2016-03-08 |
Gate electrodes of a semiconductor device formed by a hard mask and double exposure in combination with a shrink spacer Grant 8,728,924 - Beyer , et al. May 20, 2 | 2014-05-20 |
Enhanced Patterning Uniformity of Gate Electrodes of a Semiconductor Device by Late Gate Doping App 20120156865 - Thees; Hans-Juergen ;   et al. | 2012-06-21 |
Etch methods for semiconductor device fabrication Grant 8,133,814 - Laufer , et al. March 13, 2 | 2012-03-13 |
Gate Electrodes of a Semiconductor Device Formed by a Hard Mask and Double Exposure in Combination with a Shrink Spacer App 20120049286 - Beyer; Sven ;   et al. | 2012-03-01 |
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