Latz; Rudolf
Patent Applications and Registrations
Patent applications and USPTO patent grants for Latz; Rudolf.The latest application filed is for "method for controlling a reactive sputtering process".
- Latz; Rudolf - Rodgau DE
- Latz; Rudolf - Rodgau-Dudenhofen DE
- Latz; Rudolf - Frankfurt am Main DE
- Latz; Rudolf - Frankfurt DE
| Patent | Date |
|---|---|
| Method for controlling a reactive sputtering process Grant 5,556,520 - Latz September 17, 1 | 1996-09-17 |
| Arrangement for generating a plasma by means of cathode sputtering Grant 5,417,834 - Latz May 23, 1 | 1995-05-23 |
| Device for coating a substrate Grant 5,026,471 - Latz , et al. June 25, 1 | 1991-06-25 |
| Microwave cathode sputtering arrangement Grant 5,006,219 - Latz , et al. April 9, 1 | 1991-04-09 |
| Apparatus for etching substrates with a luminous discharge Grant 4,954,201 - Latz , et al. September 4, 1 | 1990-09-04 |
| Apparatus for coating a substrate with dielectrics Grant 4,931,169 - Scherer , et al. June 5, 1 | 1990-06-05 |
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