Laske; Frank

Patent Applications and Registrations

Patent applications and USPTO patent grants for Laske; Frank.The latest application filed is for "multi-stage, multi-zone substrate positioning systems".

Company Profile

8.15.16

Laske; Frank - Weilburg DE
Laske; Frank - Weilmunster DE
Laske; Frank - Weilmuenster DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi-Stage, Multi-Zone Substrate Positioning Systems App 20200402827 - Uziel; Yoram ; et al.	2020-12-24
Metrology and control of overlay and edge placement errors Grant 10,533,848 - Shchegrov , et al. Ja	2020-01-14
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals Grant 10,473,460 - Gutman , et al. Nov	2019-11-12
Systems and methods for device-correlated overlay metrology Grant 10,474,040 - Laske , et al. Nov	2019-11-12
Metrology and Control of Overlay and Edge Placement Errors App 20190271542 - Shchegrov; Andrei V. ; et al.	2019-09-05
Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrate Grant 10,337,852 - Ache , et al.	2019-07-02
Method For Measuring Positions Of Structures On A Substrate And Computer Program Product For Determining Positions Of Structures App 20190186893 - Ache; Oliver ; et al.	2019-06-20
Overlay Measurements of Overlapping Target Structures Based on Symmetry of Scanning Electron Beam Signals App 20190178639 - Gutman; Nadav ; et al.	2019-06-13
Systems And Methods For Device-correlated Overlay Metrology App 20190179231 - Laske; Frank ; et al.	2019-06-13
Method and computer program product for controlling the positioning of patterns on a substrate in a manufacturing process Grant 10,303,153 - Czerkas , et al.	2019-05-28
Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor Grant 10,185,800 - Eyring , et al. Ja	2019-01-22
Measurement of overlay and edge placement errors with an electron beam column array Grant 10,141,156 - Neil , et al. Nov	2018-11-27
Apparatus and Method for the Measurement of Pattern Placement and Size of Pattern and Computer Program Therefor App 20180165404 - Eyring; Stefan ; et al.	2018-06-14
Method and Computer Program Product for Controlling the Positioning of Patterns on a Substrate in a Manufacturing Process App 20180120807 - Czerkas; Slawomir ; et al.	2018-05-03
Measurement of Overlay and Edge Placement Errors With an Electron Beam Column Array App 20180090296 - Neil; Mark Allen ; et al.	2018-03-29
System and method for drift compensation on an electron beam based characterization tool Grant 9,892,885 - Laske , et al. February 13, 2	2018-02-13
System and Method for Drift Compensation on an Electron Beam Based Characterization Tool App 20170278666 - Laske; Frank ; et al.	2017-09-28
Method for correcting position measurements for optical errors and method for determining mask writer errors Grant 9,704,238 - Eyring , et al. July 11, 2	2017-07-11
Method for measuring positions of structures on a mask and thereby determining mask manufacturing errors Grant 9,424,636 - Laske , et al. August 23, 2	2016-08-23
Method For Correcting Position Measurements For Optical Errors And Method For Determining Mask Writer Errors App 20160078609 - Eyring; Stefan ; et al.	2016-03-17
Method for correcting position measurements for optical errors and method for determining mask writer errors Grant 9,201,312 - Eyring , et al. December 1, 2	2015-12-01
Method, System And Computer Program Product For Generating High Density Registration Maps For Masks App 20150310160 - LASKE; Frank ; et al.	2015-10-29
Method For Measuring Positions Of Structures On A Mask And Thereby Determining Mask Manufacturing Errors App 20150248756 - LASKE; Frank ; et al.	2015-09-03
Method For Correcting Position Measurements For Optical Errors And Method For Determining Mask Writer Errors App 20140307949 - Eyring; Stefan ; et al.	2014-10-16
Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability Grant 8,804,137 - Choi , et al. August 12, 2	2014-08-12
Method for the reproducible determination of the position of structures on a mask with a pellicle frame Grant 8,352,886 - Laske , et al. January 8, 2	2013-01-08
Method for the Reproducible Determination of the Position of Structures on a Mask with a Pellicle Frame App 20110225554 - Laske; Frank ; et al.	2011-09-15
Unique Mark And Method To Determine Critical Dimension Uniformity And Registration Of Reticles Combined With Wafer Overlay Capability App 20110051150 - Choi; DongSub ; et al.	2011-03-03
Device and method for determining an optical property of a mask Grant 7,864,319 - Boesser , et al. January 4, 2	2011-01-04
Device and method for determining an optical property of a mask App 20090066955 - Boesser; Hans-Artur ; et al.	2009-03-12

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