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Patent applications and USPTO patent grants for Langa; Edward.The latest application filed is for "atmospheric pressure pulsed arc plasma source and methods of coating therewith".
Patent | Date |
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High power impulse plasma source Grant 10,440,808 - Poenitzsch , et al. O | 2019-10-08 |
Atmospheric pressure pulsed arc plasma source and methods of coating therewith Grant 10,354,845 - Poenitzsch , et al. July 16, 2 | 2019-07-16 |
Atmospheric Pressure Pulsed Arc Plasma Source and Methods of Coating Therewith App 20170243727 - POENITZSCH; Vasiliki Zorbas ;   et al. | 2017-08-24 |
High Power Impulse Plasma Source App 20170142819 - POENITZSCH; Vasiliki Zorbas ;   et al. | 2017-05-18 |
Apparatus and method utilizing a double glow discharge plasma for sputter cleaning Grant 8,747,631 - Wei , et al. June 10, 2 | 2014-06-10 |
Method and apparatus for high rate, uniform plasma processing of three-dimensional objects Grant 8,252,388 - Wei , et al. August 28, 2 | 2012-08-28 |
Erosion resistant coatings Grant 8,034,459 - Wei , et al. October 11, 2 | 2011-10-11 |
Apparatus And Method Utilizing A Double Glow Discharge Plasma For Sputter Cleaning App 20110220490 - WEI; Ronghua ;   et al. | 2011-09-15 |
System And Method For Depositing Coatings On Inner Surface Of Tubular Structure App 20110111132 - Wei; Ronghua ;   et al. | 2011-05-12 |
Method for magnetron sputter deposition Grant 7,790,003 - Chiang , et al. September 7, 2 | 2010-09-07 |
Method and Apparatus for High Rate, Uniform Plasma Processing of Three-dimensional Objects App 20090286012 - Wei; Ronghua ;   et al. | 2009-11-19 |
Erosion Resistant Coatings App 20090214787 - WEI; Ronghua ;   et al. | 2009-08-27 |
Erosion Resistant Coatings App 20070087185 - WEI; Ronghua ;   et al. | 2007-04-19 |
Method for magnetron sputter deposition App 20060251917 - Chiang; Kuang-Tsan Kenneth ;   et al. | 2006-11-09 |
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