loadpatents
Patent applications and USPTO patent grants for Lakshmanan; Annamalai.The latest application filed is for "low resistivity dram buried word line stack".
Patent | Date |
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Low Resistivity DRAM Buried Word Line Stack App 20220278108 - Yang; Yixiong ;   et al. | 2022-09-01 |
Low Resistivity Metal Contact Stack App 20220277961 - Lakshmanan; Annamalai ;   et al. | 2022-09-01 |
Doping Control of Metal Nitride Films App 20210159118 - Lakshmanan; Annamalai ;   et al. | 2021-05-27 |
Methods for forming a metal silicide interconnection nanowire structure Grant 10,930,472 - Mebarki , et al. February 23, 2 | 2021-02-23 |
Doping control of metal nitride films Grant 10,910,263 - Lakshmanan , et al. February 2, 2 | 2021-02-02 |
Doped tantalum nitride for copper barrier applications Grant 10,784,157 - Lakshmanan , et al. Sept | 2020-09-22 |
Laminate and core shell formation of silicide nanowire Grant 10,593,592 - Mebarki , et al. | 2020-03-17 |
Doping Control Of Metal Nitride Films App 20190378754 - Lakshmanan; Annamalai ;   et al. | 2019-12-12 |
Doping control of metal nitride films Grant 10,431,493 - Lakshmanan , et al. O | 2019-10-01 |
Methods For Forming A Metal Silicide Interconnection Nanowire Structure App 20190172686 - MEBARKI; Bencherki ;   et al. | 2019-06-06 |
Methods for forming a metal silicide interconnection nanowire structure Grant 10,204,764 - Mebarki , et al. Feb | 2019-02-12 |
Doping Control of Metal Nitride Films App 20180277428 - Lakshmanan; Annamalai ;   et al. | 2018-09-27 |
Doping control of metal nitride films Grant 10,008,412 - Lakshmanan , et al. June 26, 2 | 2018-06-26 |
Doping Control of Metal Nitride Films App 20170256448 - Lakshmanan; Annamalai ;   et al. | 2017-09-07 |
Doping control of metal nitride films Grant 9,659,814 - Lakshmanan , et al. May 23, 2 | 2017-05-23 |
Direct deposition of nickel silicide nanowire Grant 9,613,859 - Lakshmanan , et al. April 4, 2 | 2017-04-04 |
Method of depositing metals using high frequency plasma Grant 9,466,524 - Ma , et al. October 11, 2 | 2016-10-11 |
Laminate And Core Shell Formation Of Silicide Nanowire App 20160204029 - MEBARKI; Bencherki ;   et al. | 2016-07-14 |
Direct Deposition Of Nickel Silicide Nanowire App 20160204027 - LAKSHMANAN; Annamalai ;   et al. | 2016-07-14 |
Methods For Forming A Metal Silicide Interconnection Nanowire Structure App 20160118260 - MEBARKI; Bencherki ;   et al. | 2016-04-28 |
High Through-put And Low Temperature Ald Copper Deposition And Integration App 20160032455 - Liu; Feng Q. ;   et al. | 2016-02-04 |
Elimination of first wafer effect for PECVD films Grant 9,157,151 - Lakshmanan , et al. October 13, 2 | 2015-10-13 |
Method And System For Reporting Events And Conditions App 20150278733 - Lakshmanan; Annamalai ;   et al. | 2015-10-01 |
Methods for manganese nitride integration Grant 9,076,661 - Ma , et al. July 7, 2 | 2015-07-07 |
Doping Control of Metal Nitride Films App 20140220772 - Lakshmanan; Annamalai ;   et al. | 2014-08-07 |
Methods for depositing a material atop a substrate Grant 8,642,376 - Chatterjee , et al. February 4, 2 | 2014-02-04 |
Methods For Manganese Nitride Integration App 20130292806 - Ma; Paul F. ;   et al. | 2013-11-07 |
Adhesion Improvement For Low K Dielectrics To Conductive Materials App 20130230986 - RAJAGOPALAN; NAGARAJAN ;   et al. | 2013-09-05 |
Method Of Depositing Metals Using High Frequency Plasma App 20130196507 - Ma; Paul F. ;   et al. | 2013-08-01 |
Doped Tantalum Nitride for Copper Barrier Applications App 20130140698 - Lakshmanan; Annamalai ;   et al. | 2013-06-06 |
Method And Apparatus For Remote Plasma Source Assisted Silicon-containing Film Deposition App 20130012030 - Lakshmanan; Annamalai ;   et al. | 2013-01-10 |
Methods For Depositing A Material Atop A Substrate App 20120295419 - CHATTERJEE; SUKTI ;   et al. | 2012-11-22 |
Method Of Processing Low K Dielectric Films App 20120122320 - Lakshmanan; Annamalai ;   et al. | 2012-05-17 |
Method and Apparatus for Silicon Film Deposition App 20110230008 - Lakshmanan; Annamalai ;   et al. | 2011-09-22 |
High Temperature Bd Development For Memory Applications App 20100087062 - Lakshmanan; Annamalai ;   et al. | 2010-04-08 |
Uv Curing Of Pecvd-deposited Sacrificial Polymer Films For Air-gap Ild App 20080182403 - NOORI; ATIF ;   et al. | 2008-07-31 |
Overall defect reduction for PECVD films App 20080050932 - Lakshmanan; Annamalai ;   et al. | 2008-02-28 |
Elimination Of First Wafer Effect For Pecvd Films App 20070281083 - LAKSHMANAN; ANNAMALAI ;   et al. | 2007-12-06 |
Hermetic low dielectric constant layer for barrier applications Grant 7,288,205 - Lakshmanan , et al. October 30, 2 | 2007-10-30 |
Situ oxide cap layer development Grant 7,273,823 - Lakshmanan , et al. September 25, 2 | 2007-09-25 |
Interface engineering to improve adhesion between low k stacks Grant 7,259,111 - Padhi , et al. August 21, 2 | 2007-08-21 |
Adhesion improvement for low k dielectrics to conductive materials Grant 7,229,911 - Rajagopalan , et al. June 12, 2 | 2007-06-12 |
Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile Grant 7,189,658 - Lakshmanan , et al. March 13, 2 | 2007-03-13 |
In situ oxide cap layer development App 20060276054 - Lakshmanan; Annamalai ;   et al. | 2006-12-07 |
Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile App 20060252273 - Lakshmanan; Annamalai ;   et al. | 2006-11-09 |
Bi-layer approach for a hermetic low dielectric constant layer for barrier applications Grant 7,091,137 - Lee , et al. August 15, 2 | 2006-08-15 |
Interface engineering to improve adhesion between low k stacks App 20060160376 - Padhi; Deenesh ;   et al. | 2006-07-20 |
Adhesion improvement for low k dielectrics to conductive materials App 20060046479 - Rajagopalan; Nagarajan ;   et al. | 2006-03-02 |
Hermetic low dielectric constant layer for barrier applications App 20060006140 - Lakshmanan; Annamalai ;   et al. | 2006-01-12 |
Adhesion improvement for low k dielectrics to conductive materials App 20050233555 - Rajagopalan, Nagarajan ;   et al. | 2005-10-20 |
Cleaning of CVD chambers using remote source with cxfyoz based chemistry Grant 6,923,189 - Lakshmanan , et al. August 2, 2 | 2005-08-02 |
Bi-layer approach for a hermetic low dielectric constant layer for barrier applications App 20050042889 - Lee, Albert ;   et al. | 2005-02-24 |
Cleaning of CVD chambers using remote source with CXFYOZ based chemistry App 20040139983 - Lakshmanan, Annamalai ;   et al. | 2004-07-22 |
Methods for operating a chemical vapor deposition chamber using a heated gas distribution plate App 20040052969 - Lee, Ju-Hyung ;   et al. | 2004-03-18 |
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