loadpatents
Patent applications and USPTO patent grants for Lai; Yeong-Chih.The latest application filed is for "method of filling gap with dielectrics".
Patent | Date |
---|---|
Method for modulating uniformity of deposited layer thickness Grant 6,239,043 - Lai May 29, 2 | 2001-05-29 |
Method of filling gap with dielectrics Grant 6,239,024 - Huang , et al. May 29, 2 | 2001-05-29 |
Method for reducing critical dimension of dual damascene process using spin-on-glass process Grant 6,204,096 - Lai , et al. March 20, 2 | 2001-03-20 |
Method of forming a gate spacer on a semiconductor wafer Grant 6,133,131 - Lai October 17, 2 | 2000-10-17 |
Method of forming a dual damascene structure on a semiconductor wafer Grant 6,103,619 - Lai August 15, 2 | 2000-08-15 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.