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name:-0.075418949127197
name:-0.17842793464661
name:-0.011568069458008
Lai; Chiukin Steven Patent Filings

Lai; Chiukin Steven

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lai; Chiukin Steven.The latest application filed is for "substantially carbon-free molybdenum-containing and tungsten-containing films in semiconductor device manufacturing".

Company Profile
8.19.28
  • Lai; Chiukin Steven - Sunnyvale CA
  • Lai; Chiukin (Steven) - Sunnyvale CA US
  • LAI; Chiukin (Steven) - Steven
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substantially Carbon-free Molybdenum-containing And Tungsten-containing Films In Semiconductor Device Manufacturing
App 20220298624 - Blakeney; Kyle Jordan ;   et al.
2022-09-22
Low Resistivity Films Containing Molybdenum
App 20220223471 - THOMBARE; Shruti Vivek ;   et al.
2022-07-14
Atomic Layer Etching Of Tungsten For Enhanced Tungsten Deposition Fill
App 20220115244 - LAI; Chiukin Steven ;   et al.
2022-04-14
Atomic Layer Etching Of Tungsten For Enhanced Tungsten Deposition Fill
App 20210305059 - Lai; Chiukin Steven ;   et al.
2021-09-30
Atomic layer etch of tungsten for enhanced tungsten deposition fill
Grant 11,069,535 - Lai , et al. July 20, 2
2021-07-20
Low Resistivity Films Containing Molybdenum
App 20200365456 - Thombare; Shruti Vivek ;   et al.
2020-11-19
Low resistivity films containing molybdenum
Grant 10,777,453 - Thombare , et al. Sept
2020-09-15
Atomic Layer Etch Of Tungsten For Enhanced Tungsten Deposition Fill
App 20200286743 - Lai; Chiukin Steven ;   et al.
2020-09-10
Depositing ruthenium layers in interconnect metallization
Grant 10,731,250 - Kim , et al.
2020-08-04
Low Resistivity Films Containing Molybdenum
App 20200075403 - Thombare; Shruti Vivek ;   et al.
2020-03-05
Low resistivity films containing molybdenum
Grant 10,510,590 - Thombare , et al. Dec
2019-12-17
Manganese barrier and adhesion layers for cobalt
Grant 10,438,847 - Lai , et al. O
2019-10-08
Selective deposition of WCN barrier/adhesion layer for interconnect
Grant 10,283,404 - Na , et al.
2019-05-07
Systems and methods for forming low resistivity metal contacts and interconnects by reducing and removing metallic oxide
Grant 10,229,826 - Tarafdar , et al.
2019-03-12
Depositing Ruthenium Layers In Interconnect Metallization
App 20180347041 - Kim; Do Young ;   et al.
2018-12-06
Low Resistivity Films Containing Molybdenum
App 20180294187 - Thombare; Shruti Vivek ;   et al.
2018-10-11
Selective Deposition Of Wcn Barrier/adhesion Layer For Interconnect
App 20180286746 - Na; Jeong-Seok ;   et al.
2018-10-04
Atomic Layer Etch Of Tungsten For Enhanced Tungsten Deposition Fill
App 20180240682 - Lai; Chiukin Steven ;   et al.
2018-08-23
Atomic layer etching of tungsten for enhanced tungsten deposition fill
Grant 9,972,504 - Lai , et al. May 15, 2
2018-05-15
Systems And Methods For Forming Low Resistivity Metal Contacts And Interconnects By Reducing And Removing Metallic Oxide
App 20180114694 - Tarafdar; Raihan ;   et al.
2018-04-26
Manganese Barrier And Adhesion Layers For Cobalt
App 20170330797 - Lai; Chiukin Steven ;   et al.
2017-11-16
Method for void-free cobalt gap fill
Grant 9,748,137 - Lai , et al. August 29, 2
2017-08-29
Atomic Layer Etching Of Tungsten For Enhanced Tungsten Deposition Fill
App 20170040214 - Lai; Chiukin Steven ;   et al.
2017-02-09
Methods and apparatuses for atomic layer cleaning of contacts and vias
Grant 9,362,163 - Danek , et al. June 7, 2
2016-06-07
Method For Void-free Cobalt Gap Fill
App 20160056077 - Lai; Chiukin Steven ;   et al.
2016-02-25
Methods And Apparatuses For Atomic Layer Cleaning Of Contacts And Vias
App 20150037972 - Danek; Michal ;   et al.
2015-02-05
Method for removing oxides
Grant 8,846,163 - Kao , et al. September 30, 2
2014-09-30
Multi Chamber Processing System
App 20140076234 - KAO; Chien-Teh ;   et al.
2014-03-20
Modulating etch selectivity and etch rate of silicon nitride thin films
Grant 8,617,348 - Liu , et al. December 31, 2
2013-12-31
Method For Removing Oxides
App 20120244704 - KAO; Chien-Teh ;   et al.
2012-09-27
Modulating etch selectivity and etch rate of silicon nitride thin films
Grant 8,187,486 - Liu , et al. May 29, 2
2012-05-29
Method For Removing Oxides
App 20110223755 - KAO; CHIEN-TEH ;   et al.
2011-09-15
Methods for removing silicon nitride and other materials during fabrication of contacts
Grant 7,977,249 - Liu , et al. July 12, 2
2011-07-12
Method for front end of line fabrication
Grant 7,767,024 - Kao , et al. August 3, 2
2010-08-03
Method For Removing Oxides
App 20090111280 - Kao; Chien-Teh ;   et al.
2009-04-30
Lid assembly for front end of line fabrication
Grant 7,520,957 - Kao , et al. April 21, 2
2009-04-21
Method For Front End Of Line Fabrication
App 20080268645 - KAO; CHIEN-TEH ;   et al.
2008-10-30
Method for front end of line fabrication
Grant 7,396,480 - Kao , et al. July 8, 2
2008-07-08
Monitoring a flow distribution of an energized gas
App 20060093730 - Phan; See-Eng ;   et al.
2006-05-04
In-situ dry clean chamber for front end of line fabrication
App 20050230350 - Kao, Chien-Teh ;   et al.
2005-10-20
Lid assembly for front end of line fabrication
App 20050218507 - Kao, Chien-Teh ;   et al.
2005-10-06
Substrate support for in-situ dry clean chamber for front end of line fabrication
App 20050221552 - Kao, Chien-Teh ;   et al.
2005-10-06
Method for front end of line fabrication
App 20050205110 - Kao, Chien-Teh ;   et al.
2005-09-22
Cleaning of native oxide with hydrogen-containing radicals
App 20040219789 - Wood, Bingxi Sun ;   et al.
2004-11-04
Method of tisin deposition using a chemical vapor deposition process
App 20020114886 - Chou, Jing-Pei ;   et al.
2002-08-22

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