Laaksonen; Reima T.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Laaksonen; Reima T..The latest application filed is for "formation of gate dielectrics with uniform nitrogen distribution".

Company Profile

0.7.9

Laaksonen; Reima T. - Dallas TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Formation of gate dielectrics with uniform nitrogen distribution Grant 8,492,291 - Niimi , et al. July 23, 2	2013-07-23
Formation Of Gate Dielectrics With Uniform Nitrogen Distribution App 20120149186 - Niimi; Hiroaki ; et al.	2012-06-14
Method To Obtain Uniform Nitrogen Profile In Gate Dielectrics App 20080315324 - VARGHESE; AJITH ; et al.	2008-12-25
Method to obtain uniform nitrogen profile in gate dielectrics Grant 7,435,651 - Varghese , et al. October 14, 2	2008-10-14
Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment Grant 7,393,787 - Niimi , et al. July 1, 2	2008-07-01
Formation of gate dielectrics with uniform nitrogen distribution App 20070066021 - Niimi; Hiroaki ; et al.	2007-03-22
Method to obtain uniform nitrogen profile in gate dielectrics App 20070054455 - Varghese; Ajith ; et al.	2007-03-08
Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment App 20070042559 - Niimi; Hiroaki ; et al.	2007-02-22
Semiconductor process using delay-compensated exposure Grant 6,866,974 - Kim , et al. March 15, 2	2005-03-15
Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography Grant 6,803,661 - Thakar , et al. October 12, 2	2004-10-12
Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography App 20040092089 - Thakar, Gautam V. ; et al.	2004-05-13
Semiconductor process using delay-compensated exposure App 20040076896 - Kim, Keeho ; et al.	2004-04-22
Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography Grant 6,624,068 - Thakar , et al. September 23, 2	2003-09-23
Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography App 20030040179 - Thakar, Gautam V. ; et al.	2003-02-27
Hard-mask etch process App 20020072225 - Laaksonen, Reima T. ; et al.	2002-06-13

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