loadpatents
Patent applications and USPTO patent grants for La Fontaine; Bruno.The latest application filed is for "method and apparatus for pattern fidelity control".
Patent | Date |
---|---|
Defect prediction Grant 11,403,453 - Cheong , et al. August 2, 2 | 2022-08-02 |
Methods for determining an approximate value of a processing parameter at which a characteristic of the patterning process has a target value Grant 11,126,092 - Cheong , et al. September 21, 2 | 2021-09-21 |
Method And Apparatus For Pattern Fidelity Control App 20210181642 - HASAN; Tanbir ;   et al. | 2021-06-17 |
Defect Prediction App 20210150115 - CHEONG; Lin Lee ;   et al. | 2021-05-20 |
Method and apparatus for pattern fidelity control Grant 10,908,515 - Hasan , et al. February 2, 2 | 2021-02-02 |
Prediction Of Out Of Specification Based On A Spatial Characteristic Of Process Variability App 20200151600 - Huang; Wenjin ;   et al. | 2020-05-14 |
Method And Apparatus For Pattern Fidelity Control App 20200019069 - HASAN; Tanbir ;   et al. | 2020-01-16 |
Methods For Identifying A Process Window Boundary App 20180329311 - CHEONG; Lin Lee ;   et al. | 2018-11-15 |
Spacer lithography Grant 8,642,474 - Kim , et al. February 4, 2 | 2014-02-04 |
Lithographic Alignment Marks App 20090135390 - La Fontaine; Bruno ;   et al. | 2009-05-28 |
Double Exposure Of A Photoresist Layer Using A Single Reticle App 20090033892 - Kritsun; Oleg ;   et al. | 2009-02-05 |
Spacer Lithography App 20090017628 - KIM; Ryoung-han ;   et al. | 2009-01-15 |
Reflective mask for short wavelength lithography Grant 7,101,645 - La Fontaine , et al. September 5, 2 | 2006-09-05 |
Reflective mask for short wavelength lithography Grant 6,872,497 - Levinson , et al. March 29, 2 | 2005-03-29 |
Phase grating focus monitor using overlay technique Grant 6,710,853 - La Fontaine , et al. March 23, 2 | 2004-03-23 |
Phase-shift-moire focus monitor Grant 6,535,280 - La Fontaine , et al. March 18, 2 | 2003-03-18 |
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