Kwong; Ranee Wai-Ling

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kwong; Ranee Wai-Ling.The latest application filed is for "exposure photolithography methods".

Company Profile

0.14.15

Kwong; Ranee Wai-Ling - Wappingers Falls NY
Kwong; Ranee Wai-Ling - Hopewell Junction NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Exposure photolithography methods Grant 9,235,119 - Chen , et al. January 12, 2	2016-01-12
Exposure Photolithography Methods App 20140349237 - Chen; Kuang-Jung ; et al.	2014-11-27
Photoresist compositions Grant 8,846,296 - Chen , et al. September 30, 2	2014-09-30
Method and structure for reworking antireflective coating over semiconductor substrate Grant 8,835,307 - Akinmade-Yusuff , et al. September 16, 2	2014-09-16
Multiple exposure photolithography methods Grant 8,568,960 - Chen , et al. October 29, 2	2013-10-29
Method for reworking antireflective coating over semiconductor substrate Grant 8,288,271 - Akinmade Yusuff , et al. October 16, 2	2012-10-16
Method And Structure For Reworking Antireflective Coating Over Semiconductor Substrate App 20120231554 - Akinmade Yusuff; Hakeem ; et al.	2012-09-13
Photoresist Compositions App 20120214099 - Chen; Kuang-Jung ; et al.	2012-08-23
Method And Structure For Reworking Antireflective Coating Over Semiconductor Substrate App 20120205786 - Akinmade-Yusuff; Hakeem ; et al.	2012-08-16
Multiple exposure photolithography methods and photoresist compositions Grant 8,236,476 - Chen , et al. August 7, 2	2012-08-07
Multiple Exposure Photolithography Methods App 20120178027 - Chen; Kuang-Jung ; et al.	2012-07-12
Wet developable bottom antireflective coating composition and method for use thereof Grant 8,202,678 - Chen , et al. June 19, 2	2012-06-19
Photoresists and methods for optical proximity correction Grant 8,053,172 - Halle , et al. November 8, 2	2011-11-08
Photoresist compositions and methods related to near field masks Grant 8,021,828 - Huang , et al. September 20, 2	2011-09-20
Method And Structure For Reworking Antireflective Coating Over Semiconductor Substrate App 20110101507 - Akinmade Yusuff; Hakeem ; et al.	2011-05-05
Wet Developable Bottom Antireflective Coating Composition And Method For Use Thereof App 20090291392 - Chen; Kuang-Jung J. ; et al.	2009-11-26
Photoresist Compositions And Methods Related To Near Field Masks App 20090214959 - Huang; Wu-Song ; et al.	2009-08-27
Photoresists And Methods For Optical Proximity Correction App 20090214981 - Halle; Scott David ; et al.	2009-08-27
Wet developable bottom antireflective coating composition and method for use thereof Grant 7,563,563 - Chen , et al. July 21, 2	2009-07-21
Multiple Exposure Photolithography Methods And Photoresist Compostions App 20090176174 - Chen; Kuang-Jung ; et al.	2009-07-09
Apparatus And Method For Measuring The Quantity Of Condensable Materials Which Outgas During Cure Of Organic Thin Films App 20080248208 - Chace; Mark Stephen ; et al.	2008-10-09
Wet developable bottom antireflective coating composition and method for use thereof App 20070243484 - Chen; Kuang-Jung J. ; et al.	2007-10-18
Bottom antireflective coating composition and method for use thereof App 20070231736 - Chen; Kuang-Jung J. ; et al.	2007-10-04
Method of making a packaged radiation sensitive resist film-coated workpiece Grant 7,168,224 - Angelopoulos , et al. January 30, 2	2007-01-30
Packaged radiation sensitive coated workpiece process for making and method of storing same App 20040045866 - Angelopoulos, Marie ; et al.	2004-03-11
Packaged radiation sensitive coated workpiece process for making and method of storing same App 20030019782 - Angelopoulos, Marie ; et al.	2003-01-30

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.