Kwong; Ranee W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kwong; Ranee W..The latest application filed is for "developable bottom antireflective coating composition and pattern forming method using thereof".

Company Profile

0.18.13

Kwong; Ranee W. - Wappingers Falls NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Developable bottom antireflective coating composition and pattern forming method using thereof Grant 9,040,225 - Chen , et al. May 26, 2	2015-05-26
Removal of alkaline crystal defects in lithographic patterning Grant 9,012,133 - Perez , et al. April 21, 2	2015-04-21
Developable Bottom Antireflective Coating Composition And Pattern Forming Method Using Thereof App 20150050601 - Chen; Kuang-Jung ; et al.	2015-02-19
Removal Of Alkaline Crystal Defects In Lithographic Patterning App 20130052593 - Perez; Javier J. ; et al.	2013-02-28
Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication Grant 8,373,271 - Goldfarb , et al. February 12, 2	2013-02-12
INTERCONNECT STRUCTURE WITH AN OXYGEN-DOPED SiC ANTIREFLECTIVE COATING AND METHOD OF FABRICATION App 20110291284 - Goldfarb; Dario L. ; et al.	2011-12-01
Low-activation energy silicon-containing resist system Grant 6,939,664 - Huang , et al. September 6, 2	2005-09-06
Underlayer compositions for multilayer lithographic processes Grant 6,927,015 - Khojasteh , et al. August 9, 2	2005-08-09
Silicon-containing resist systems with cyclic ketal protecting groups App 20050106494 - Huang, Wu-Song ; et al.	2005-05-19
Low-activation Energy Silicon-containing Resist System App 20050089792 - Huang, Wu-Song ; et al.	2005-04-28
Underlayer compositions for multilayer lithographic processes App 20050019704 - Khojasteh, Mahmoud M. ; et al.	2005-01-27
Radiation sensitive silicon-containing negative resists and use thereof Grant 6,821,718 - Angelopoulos , et al. November 23, 2	2004-11-23
Underlayer compositions for multilayer lithographic processes Grant 6,818,381 - Khojasteh , et al. November 16, 2	2004-11-16
Low silicon-outgassing resist for bilayer lithography Grant 6,770,419 - Khojasteh , et al. August 3, 2	2004-08-03
Radiation sensitive silicon-containing negative resists and use thereof App 20040048204 - Angelopoulos, Marie ; et al.	2004-03-11
Low silicon-outgassing resist for bilayer lithography App 20040048187 - Khojasteh, Mahmoud M. ; et al.	2004-03-11
Polymers and use thereof Grant 6,689,540 - Aviram , et al. February 10, 2	2004-02-10
Radiation sensitive silicon-containing negative resists and use thereof Grant 6,653,045 - Angelopoulos , et al. November 25, 2	2003-11-25
Etch improved resist systems containing acrylate (or methacrylate) silane monomers App 20030049561 - Angelopoulos, Marie ; et al.	2003-03-13
Radiation sensitive silicon-containing negative resists and use thereof App 20020115017 - Angelopoulos, Marie ; et al.	2002-08-22
Polymers and use thereof App 20020090574 - Aviram, Ari ; et al.	2002-07-11
Underlayer compositions for multilayer lithographic processes App 20020058204 - Khojasteh, Mahmoud M. ; et al.	2002-05-16
Photoresist system and process for aerial image enhancement Grant 6,245,492 - Huang , et al. June 12, 2	2001-06-12
Organometallic polymers and use thereof Grant 6,171,757 - Angelopoulos , et al. January 9, 2	2001-01-09
Crosslinkable aqueous developable photoresist compositions and method for use thereof Grant 5,296,332 - Sachdev , et al. March 22, 1	1994-03-22
Top coat for acid catalyzed resists Grant 5,240,812 - Conley , et al. August 31, 1	1993-08-31
Photosensitive polyimide compositions Grant 5,114,826 - Kwong , et al. May 19, 1	1992-05-19
Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings Grant 4,692,205 - Sachdev , et al. September 8, 1	1987-09-08

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