Kwon; Jun Hyuck
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kwon; Jun Hyuck.The latest application filed is for "method and apparatus for atomic layer etching".
- Kwon; Jun Hyuck - Osan-si KR
- KWON; Jun Hyuck - Osan-si Gyeonggi-do KR
- Kwon; Jun-Hyuck - Chungcheongbuk-do KR
| Patent | Date |
|---|---|
| Atomic layer etching method Grant 11,450,531 - Kwon , et al. September 20, 2 | 2022-09-20 |
| Method And Apparatus For Atomic Layer Etching App 20220059325 - JIN; Kwang Seon ; et al. | 2022-02-24 |
| Substrate Processing Method App 20210193472 - JIN; Kwang Seon ; et al. | 2021-06-24 |
| Atomic Layer Etching Method App 20210193473 - KWON; Jun Hyuck ; et al. | 2021-06-24 |
| Precursor for vapor deposition having excellent thermal stability and preparing method thereof Grant 10,490,409 - Park , et al. Nov | 2019-11-26 |
| Precursor For Vapor Deposition Having Excellent Thermal Stability And Preparing Method Thereof App 20180122645 - PARK; Jung-Woo ; et al. | 2018-05-03 |
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