Kwon; Chang Gil

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kwon; Chang Gil.The latest application filed is for "cmp slurry compositions and methods of fabricating a semiconductor device using the same".

Company Profile

4.5.7

Kwon; Chang Gil - Anseong-si KR
Kwon; Chang Gil - Namyangju-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
CMP slurry compositions and methods of fabricating a semiconductor device using the same Grant 11,279,852 - Seo , et al. March 22, 2	2022-03-22
Cmp Slurry Compositions And Methods Of Fabricating A Semiconductor Device Using The Same App 20210130651 - SEO; EUNSUNG ; et al.	2021-05-06
Slurry Composition For Chemical Mechanical Polishing App 20200071566 - Park; Sang-hyun ; et al.	2020-03-05
Additive composition and positive polishing slurry composition including the same Grant 10,494,547 - Kwon , et al. De	2019-12-03
Polishing compositions and methods of manufacturing semiconductor devices using the same Grant 10,435,587 - Park , et al. O	2019-10-08
Abrasive particle-dispersion layer composite and polishing slurry composition including the same Grant 10,421,883 - Kwon , et al. Sept	2019-09-24
Chemical Mechanical Polishing Slurry Composition And Method Of Fabricating Semiconductor Device Using The Same App 20180362806 - PARK; Seung Ho ; et al.	2018-12-20
Abrasive particle-dispersion layer composite and polishing slurry composition including the same Grant 10,138,395 - Kwon , et al. Nov	2018-11-27
Abrasive Particle-dispersion Layer Composite And Polishing Slurry Composition Including The Same App 20170183539 - KWON; Jang Kuk ; et al.	2017-06-29
Additive Composition And Positive Polishing Slurry Composition Including The Same App 20170183538 - KWON; Jang Kuk ; et al.	2017-06-29
Abrasive Particle-dispersion Layer Composite And Polishing Slurry Composition Including The Same App 20170166780 - KWON; Jang Kuk ; et al.	2017-06-15
Polishing Compositions And Methods Of Manufacturing Semiconductor Devices Using The Same App 20170029664 - PARK; Seung-Ho ; et al.	2017-02-02

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