Kwon; Byung-In

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kwon; Byung-In.The latest application filed is for "apparatus and method for processing a substrate using the same".

Company Profile

6.3.9

Kwon; Byung-In - Singapore SG

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of forming multiple patterned layers on wafer and exposure apparatus thereof Grant 11,342,184 - Jeon , et al. May 24, 2	2022-05-24
Correction method of photomask pattern Grant 11,340,523 - Yang , et al. May 24, 2	2022-05-24
Apparatus and method for processing a substrate using the same Grant 11,079,690 - Yang , et al. August 3, 2	2021-08-03
Apparatus And Method For Processing A Substrate Using The Same App 20210208515 - YANG; HYUN-SUK ; et al.	2021-07-08
Reticle Stage For Preventing Haze Contamination And Exposure Apparatus Having The Same App 20210208516 - YOO; JIYONG ; et al.	2021-07-08
Method Of Forming Multiple Patterned Layers On Wafer And Exposure Apparatus Thereof App 20210159071 - JEON; BUM-HWAN ; et al.	2021-05-27
Reticle Pod For Preventing Haze Contamination And Reticle Stocker Having The Same App 20210157227 - YOO; JIYONG ; et al.	2021-05-27
Air Control Cabinet Module And Clean Room System Having The Same App 20210125843 - KIM; SUNG-UK ; et al.	2021-04-29
Alignment System App 20200219746 - YANG; SIWON ; et al.	2020-07-09
Correction Method Of Photomask Pattern App 20200218144 - YANG; SIWON ; et al.	2020-07-09
Exhaust Module For Wafer Baking Apparatus And Wafer Processing System Having The Same App 20200197851 - KWON; BYUNG-IN ; et al.	2020-06-25
Track System And Method Of Processing Semiconductor Wafers App 20200194297 - JANG; SUNGKUN ; et al.	2020-06-18

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