Kvamme; Damon

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kvamme; Damon.The latest application filed is for "vapor as a protectant and lifetime extender in optical systems".

Company Profile

2.6.6

Kvamme; Damon - Los Gatos CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Vapor As A Protectant And Lifetime Extender In Optical Systems App 20210041689 - Zare; David Jalil ; et al.	2021-02-11
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks App 20200401037 - Huang; Haifeng ; et al.	2020-12-24
Single wavelength ellipsometry with improved spot size capability Grant 9,574,992 - Salcin , et al. February 21, 2	2017-02-21
Segmented mirror apparatus for imaging and method of using the same Grant 9,448,343 - Kvamme , et al. September 20, 2	2016-09-20
Adaptable illuminating apparatus, system, and method for extreme ultra-violet light Grant 9,046,500 - Kvamme , et al. June 2, 2	2015-06-02
Segmented Mirror Apparatus For Imaging And Method Of Using The Same App 20140264051 - Kvamme; Damon ; et al.	2014-09-18
Adaptable Illuminating Apparatus, System, And Method For Extreme Ultra-violet Light App 20140175308 - Kvamme; Damon ; et al.	2014-06-26
Beam conditioning to reduce spatial coherence Grant 7,926,959 - Kvamme , et al. April 19, 2	2011-04-19
Methods for detecting and classifying defects on a reticle Grant 7,738,093 - Alles , et al. June 15, 2	2010-06-15
Methods For Detecting And Classifying Defects On A Reticle App 20080304056 - Alles; David ; et al.	2008-12-11
Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles Grant 6,952,256 - Roncone , et al. October 4, 2	2005-10-04
Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles App 20040042002 - Roncone, Ronald L. ; et al.	2004-03-04

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