KUWABARA; Rikimaru

Patent Applications and Registrations

Patent applications and USPTO patent grants for KUWABARA; Rikimaru.The latest application filed is for "polymer composition, cross-linked product, and tire".

Company Profile

2.5.8

KUWABARA; Rikimaru - Minato-ku JP
Kuwabara; Rikimaru - Yokkaichi-shi JP
Kuwabara; Rikimaru - Chuo-ku JP
Kuwabara; Rikimaru - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polymer Composition, Cross-linked Product, And Tire App 20210395500 - KUWABARA; Rikimaru	2021-12-23
Production process of rubber composition Grant 11,168,184 - Tani , et al. November 9, 2	2021-11-09
Composition For Fiber-reinforced Resin, Production Method Therefor, Fiber-reinforced Resin, And Formed Article App 20200339768 - KUWABARA; Rikimaru ; et al.	2020-10-29
Production Process Of Rubber Composition App 20200172682 - TANI; Koichiro ; et al.	2020-06-04
Polyurethane, Composition For Formation Of Polishing Layers That Contains Same, Pad For Chemical Mechanical Polishing, And Chemical Mechanical Polishing Method Using Same App 20140223832 - OKAMOTO; Takahiro ; et al.	2014-08-14
Composition for forming polishing layer of chemical mechanical polishing pad, chemical mechanical polishing pad and chemical mechanical polishing method Grant 8,388,799 - Kuwabara , et al. March 5, 2	2013-03-05
Polyurethane, Composition For Formation Of Polishing Layers That Contains Same, Pad For Chemical Mechanical Polishing, And Chemical Mechanical Polishing Method Using Same App 20120083187 - Okamoto; Takahiro ; et al.	2012-04-05
Chemical mechanical polishing pad Grant 8,053,521 - Okamoto , et al. November 8, 2	2011-11-08
Method for producing chemical mechanical polishing pad Grant 7,790,788 - Hosaka , et al. September 7, 2	2010-09-07
Composition For Forming Polishing Layer Of Chemical Mechanical Polishing Pad, Chemical Mechanical Polishing Pad And Chemical Mechanical Polishing Method App 20090191795 - KUWABARA; Rikimaru ; et al.	2009-07-30
Method For Producing Chemical Mechanical Polishing Pad App 20090104856 - HOSAKA; Yukio ; et al.	2009-04-23
Chemical Mechanical Polishing Pad App 20090036045 - Okamoto; Takahiro ; et al.	2009-02-05

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