loadpatents
name:-0.017883062362671
name:-0.011334896087646
name:-0.0053009986877441
KUSHIBIKI; Ryousuke Patent Filings

KUSHIBIKI; Ryousuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for KUSHIBIKI; Ryousuke.The latest application filed is for "perpendicular magnetic recording medium".

Company Profile
5.11.16
  • KUSHIBIKI; Ryousuke - Tsukuba-shi JP
  • Kushibiki; Ryousuke - Ibaraki JP
  • Kushibiki; Ryousuke - Tsukuba JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Perpendicular Magnetic Recording Medium
App 20220122635 - THAM; Kim Kong ;   et al.
2022-04-21
In-plane Magnetized Film, In-plane Magnetized Film Multilayer Structure, Hard Bias Layer, Magnetoresistive Element, And Sputtering Target
App 20210391105 - THAM; Kim Kong ;   et al.
2021-12-16
Sputtering Target
App 20210269911 - Tham; Kim Kong ;   et al.
2021-09-02
Sputtering Target For Magnetic Recording Medium
App 20210242000 - Kamada; Tomonari ;   et al.
2021-08-05
Sputtering target
Grant 11,072,851 - Tham , et al. July 27, 2
2021-07-27
Sputtering target for magnetic recording media
Grant 10,971,181 - Tham , et al. April 6, 2
2021-04-06
Sputtering Target
App 20210087673 - THAM; Kim Kong ;   et al.
2021-03-25
FePt-C-based sputtering target
Grant 10,787,732 - Goto , et al. September 29, 2
2020-09-29
Sputtering Target For Magnetic Recording Media
App 20200105297 - THAM; Kim Kong ;   et al.
2020-04-02
FePt-C-BASED SPUTTERING TARGET
App 20190292650 - GOTO; Yasuyuki ;   et al.
2019-09-26
FePt--C-based sputtering target and method for manufacturing same
Grant 10,186,404 - Goto , et al. Ja
2019-01-22
Sputtering Target
App 20180355473 - THAM; Kim Kong ;   et al.
2018-12-13
FePt-based sputtering target
Grant 9,358,612 - Miyashita , et al. June 7, 2
2016-06-07
Process for producing FePt-based sputtering target
Grant 9,314,845 - Miyashita , et al. April 19, 2
2016-04-19
Process for producing FePt-based sputtering target
Grant 9,314,846 - Miyashita , et al. April 19, 2
2016-04-19
Fept-c-based Sputtering Target And Method For Manufacturing Same
App 20160013033 - GOTO; Yasuyuki ;   et al.
2016-01-14
FePt-C-based sputtering target and process for producing the same
Grant 9,228,255 - Miyashita , et al. January 5, 2
2016-01-05
FePt-based sputtering target
Grant 9,095,901 - Miyashita , et al. August 4, 2
2015-08-04
Fept-based Sputtering Target
App 20140318954 - MIYASHITA; Takanobu ;   et al.
2014-10-30
Process For Producing Fept-based Sputtering Target
App 20140322062 - MIYASHITA; Takanobu ;   et al.
2014-10-30
Fept-based Sputtering Target
App 20140318955 - MIYASHITA; Takanobu ;   et al.
2014-10-30
Process For Producing Fept-based Sputtering Target
App 20140322063 - MIYASHITA; Takanobu ;   et al.
2014-10-30
FePt--C-based sputtering target and process for producing the same
Grant 8,858,674 - Miyashita , et al. October 14, 2
2014-10-14
Fept-c-based Sputtering Target And Process For Producing The Same
App 20140301887 - MIYASHITA; Takanobu ;   et al.
2014-10-09
Fept-c-based Sputtering Target And Process For Producing The Same
App 20140021043 - Miyashita; Takanobu ;   et al.
2014-01-23

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