loadpatents
Patent applications and USPTO patent grants for KUSHIBIKI; Ryousuke.The latest application filed is for "perpendicular magnetic recording medium".
Patent | Date |
---|---|
Perpendicular Magnetic Recording Medium App 20220122635 - THAM; Kim Kong ;   et al. | 2022-04-21 |
In-plane Magnetized Film, In-plane Magnetized Film Multilayer Structure, Hard Bias Layer, Magnetoresistive Element, And Sputtering Target App 20210391105 - THAM; Kim Kong ;   et al. | 2021-12-16 |
Sputtering Target App 20210269911 - Tham; Kim Kong ;   et al. | 2021-09-02 |
Sputtering Target For Magnetic Recording Medium App 20210242000 - Kamada; Tomonari ;   et al. | 2021-08-05 |
Sputtering target Grant 11,072,851 - Tham , et al. July 27, 2 | 2021-07-27 |
Sputtering target for magnetic recording media Grant 10,971,181 - Tham , et al. April 6, 2 | 2021-04-06 |
Sputtering Target App 20210087673 - THAM; Kim Kong ;   et al. | 2021-03-25 |
FePt-C-based sputtering target Grant 10,787,732 - Goto , et al. September 29, 2 | 2020-09-29 |
Sputtering Target For Magnetic Recording Media App 20200105297 - THAM; Kim Kong ;   et al. | 2020-04-02 |
FePt-C-BASED SPUTTERING TARGET App 20190292650 - GOTO; Yasuyuki ;   et al. | 2019-09-26 |
FePt--C-based sputtering target and method for manufacturing same Grant 10,186,404 - Goto , et al. Ja | 2019-01-22 |
Sputtering Target App 20180355473 - THAM; Kim Kong ;   et al. | 2018-12-13 |
FePt-based sputtering target Grant 9,358,612 - Miyashita , et al. June 7, 2 | 2016-06-07 |
Process for producing FePt-based sputtering target Grant 9,314,845 - Miyashita , et al. April 19, 2 | 2016-04-19 |
Process for producing FePt-based sputtering target Grant 9,314,846 - Miyashita , et al. April 19, 2 | 2016-04-19 |
Fept-c-based Sputtering Target And Method For Manufacturing Same App 20160013033 - GOTO; Yasuyuki ;   et al. | 2016-01-14 |
FePt-C-based sputtering target and process for producing the same Grant 9,228,255 - Miyashita , et al. January 5, 2 | 2016-01-05 |
FePt-based sputtering target Grant 9,095,901 - Miyashita , et al. August 4, 2 | 2015-08-04 |
Fept-based Sputtering Target App 20140318954 - MIYASHITA; Takanobu ;   et al. | 2014-10-30 |
Process For Producing Fept-based Sputtering Target App 20140322062 - MIYASHITA; Takanobu ;   et al. | 2014-10-30 |
Fept-based Sputtering Target App 20140318955 - MIYASHITA; Takanobu ;   et al. | 2014-10-30 |
Process For Producing Fept-based Sputtering Target App 20140322063 - MIYASHITA; Takanobu ;   et al. | 2014-10-30 |
FePt--C-based sputtering target and process for producing the same Grant 8,858,674 - Miyashita , et al. October 14, 2 | 2014-10-14 |
Fept-c-based Sputtering Target And Process For Producing The Same App 20140301887 - MIYASHITA; Takanobu ;   et al. | 2014-10-09 |
Fept-c-based Sputtering Target And Process For Producing The Same App 20140021043 - Miyashita; Takanobu ;   et al. | 2014-01-23 |
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