Kushibiki; Masato
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kushibiki; Masato.The latest application filed is for "plasma processing method and plasma processing apparatus".
Company Profile
0.27.21
- Kushibiki; Masato - Miyagi JP
- Kushibiki; Masato - Kurokawa-gun N/A JP
- Kushibiki; Masato - Yamanashi N/A JP
- Kushibiki; Masato - Nirasaki N/A JP
- KUSHIBIKI; Masato - Nirasaki-shi JP
- KUSHIBIKI; Masato - Nirasaki City JP
- Kushibiki; Masato - Yamanashi-Ken JP
Patent Activity
| Patent | Date |
|---|---|
| Plasma processing method and plasma processing apparatus Grant 9,660,182 - Sone , et al. May 23, 2 | 2017-05-23 |
| Etching method and substrate processing apparatus Grant 9,419,211 - Nishimura , et al. August 16, 2 | 2016-08-16 |
| Method of etching copper layer and mask Grant 9,208,997 - Nishimura , et al. December 8, 2 | 2015-12-08 |
| Substrate processing method and storage medium Grant 9,165,784 - Nishimura , et al. October 20, 2 | 2015-10-20 |
| Method for etching film containing cobalt and palladium Grant 8,962,489 - Nishimura , et al. February 24, 2 | 2015-02-24 |
| Plasma Processing Method And Plasma Processing Apparatus App 20150050750 - Sone; Takashi ; et al. | 2015-02-19 |
| Method For Etching Film Containing Cobalt And Palladium App 20140287591 - NISHIMURA; Eiichi ; et al. | 2014-09-25 |
| Pattern forming method and manufacturing method of semiconductor device Grant 8,815,495 - Kushibiki , et al. August 26, 2 | 2014-08-26 |
| Semiconductor device manufacturing method and plasma etching apparatus Grant 8,772,172 - Kushibiki , et al. July 8, 2 | 2014-07-08 |
| Etching Method And Substrate Processing Apparatus App 20140120635 - Nishimura; Eiichi ; et al. | 2014-05-01 |
| Method Of Etching Copper Layer And Mask App 20140110373 - Nishimura; Eiichi ; et al. | 2014-04-24 |
| Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process Grant 8,642,136 - Kushibiki , et al. February 4, 2 | 2014-02-04 |
| Semiconductor Device Manufacturing Method And Plasma Etching Apparatus App 20130302993 - KUSHIBIKI; Masato ; et al. | 2013-11-14 |
| Substrate processing method Grant 8,530,354 - Kushibiki , et al. September 10, 2 | 2013-09-10 |
| Substrate processing method Grant 8,491,804 - Kushibiki , et al. July 23, 2 | 2013-07-23 |
| Semiconductor device manufacturing method and plasma etching apparatus Grant 8,491,805 - Kushibiki , et al. July 23, 2 | 2013-07-23 |
| Pattern Forming Method And Manufacturing Method Of Semiconductor Device App 20130122429 - KUSHIBIKI; Masato ; et al. | 2013-05-16 |
| Substrate processing method Grant 8,383,521 - Nishimura , et al. February 26, 2 | 2013-02-26 |
| Substrate Processing Method And Storage Medium App 20120244718 - NISHIMURA; Eiichi ; et al. | 2012-09-27 |
| Substrate processing method Grant 8,252,698 - Kushibiki , et al. August 28, 2 | 2012-08-28 |
| Substrate processing method Grant 8,241,511 - Kushibiki , et al. August 14, 2 | 2012-08-14 |
| Substrate Processing Method App 20120196387 - KUSHIBIKI; Masato ; et al. | 2012-08-02 |
| Substrate processing method Grant 8,202,805 - Kushibiki , et al. June 19, 2 | 2012-06-19 |
| Semiconductor Device Manufacturing Method And Plasma Etching Apparatus App 20110195577 - KUSHIBIKI; Masato ; et al. | 2011-08-11 |
| Pattern Forming Method And Manufacturing Method Of Semiconductor Device App 20110065049 - KUSHIBIKI; Masato ; et al. | 2011-03-17 |
| Method for manufacturing semiconductor device Grant 7,897,498 - Gale , et al. March 1, 2 | 2011-03-01 |
| Plasma etching method Grant 7,811,939 - Kushibiki , et al. October 12, 2 | 2010-10-12 |
| Substrate Processing Method App 20100240217 - KUSHIBIKI; Masato ; et al. | 2010-09-23 |
| Substrate Processing Method App 20100233883 - Nishimura; Eiichi ; et al. | 2010-09-16 |
| Substrate Processing Method App 20100233885 - KUSHIBIKI; Masato ; et al. | 2010-09-16 |
| Substrate Processing Method App 20100173493 - Kushibiki; Masato ; et al. | 2010-07-08 |
| Substrate Processing Method, Substrate Processing Apparatus, And Storage Medium App 20100086670 - Kushibiki; Masato ; et al. | 2010-04-08 |
| Substrate Processing Method App 20100068892 - KUSHIBIKI; Masato ; et al. | 2010-03-18 |
| Fine pattern forming method Grant 7,604,908 - Kushibiki , et al. October 20, 2 | 2009-10-20 |
| Method for Manufacturing Semiconductor Device App 20080268655 - Gale; Glenn ; et al. | 2008-10-30 |
| Plasma Etching Method App 20070224828 - KUSHIBIKI; Masato ; et al. | 2007-09-27 |
| Etching method and computer storage medium storing program for controlling same Grant 7,256,135 - Kushibiki , et al. August 14, 2 | 2007-08-14 |
| Dry etching method Grant 7,192,532 - Koh , et al. March 20, 2 | 2007-03-20 |
| Fine pattern forming method App 20060204899 - Kushibiki; Masato ; et al. | 2006-09-14 |
| Etching method and computer storage medium storing program for controlling same App 20050070111 - Kushibiki, Masato ; et al. | 2005-03-31 |
| Dry etching method App 20050045588 - Koh, Akiteru ; et al. | 2005-03-03 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 