Kusabiraki; Kazunori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kusabiraki; Kazunori.The latest application filed is for "upper layer-forming composition and resist patterning method".

Company Profile

0.8.12

Kusabiraki; Kazunori - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for forming liquid immersion upper layer film, and polymer Grant 9,926,462 - Tanaka , et al. March 27, 2	2018-03-27
Upper Layer-forming Composition And Resist Patterning Method App 20170160637 - Hayama; Takahiro ; et al.	2017-06-08
Composition For Forming Liquid Immersion Upper Layer Film, And Polymer App 20170073541 - TANAKA; Kiyoshi ; et al.	2017-03-16
Composition for forming liquid immersion upper layer film, and polymer Grant 9,540,535 - Tanaka , et al. January 10, 2	2017-01-10
Upper Layer-forming Composition And Resist Patterning Method App 20160109801 - Hayama; Takahiro ; et al.	2016-04-21
Composition, resist pattern-forming method, compound, method for production of compound, and polymer Grant 9,268,225 - Tanaka , et al. February 23, 2	2016-02-23
Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method Grant 9,261,789 - Hayama , et al. February 16, 2	2016-02-16
Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound Grant 9,046,775 - Minegishi , et al. June 2, 2	2015-06-02
Composition For Forming Liquid Immersion Upper Layer Film, Resist Pattern-forming Method, Polymer, And Compound App 20140377707 - MINEGISHI; Shinya ; et al.	2014-12-25
Composition, Resist Pattern-forming Method, Compound, Method For Production Of Compound, And Polymer App 20140248563 - TANAKA; Kiyoshi ; et al.	2014-09-04
Method Of Forming Photoresist Pattern App 20140147794 - SUGIE; Norihiko ; et al.	2014-05-29
Composition For Forming Liquid Immersion Upper Layer Film, Resist Pattern-forming Method, Polymer, And Compound App 20140093826 - MINEGISHI; Shinya ; et al.	2014-04-03
Composition For Forming Liquid Immersion Upper Layer Film, And Polymer App 20130217850 - TANAKA; Kiyoshi ; et al.	2013-08-22
Upper layer-forming composition and resist patterning method Grant 8,501,389 - Kusabiraki , et al. August 6, 2	2013-08-06
Composition For Forming Liquid Immersion Upper Layer Film And Method For Forming Resist Pattern App 20130084524 - HAYAMA; Takahiro ; et al.	2013-04-04
Upper Layer Film-forming Composition And Method Of Forming Photoresist Pattern App 20120171613 - SUGIE; Norihiko ; et al.	2012-07-05
Upper Layer-forming Composition And Resist Patterning Method App 20120021359 - HAYAMA; Takahiro ; et al.	2012-01-26
Upper Layer-forming Composition And Resist Patterning Method App 20110262859 - KUSABIRAKI; Kazunori ; et al.	2011-10-27

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