| Patent | Date |
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Composition for forming passivation layer, semiconductor substrate having passivation layer, method of producing semiconductor substrate having passivation layer, photovoltaic cell element, method of producing photovoltaic cell element and photovoltaic cell
Grant 9,714,262 - Adachi , et al. July 25, 2 | 2017-07-25 |
Composition For Forming N-type Diffusion Layer, Method For Forming N-type Diffusion Layer, Method Of Producing Semiconductor Substrate With N-type Diffusion Layer, And Method For Producing Photovoltaic Cell Element
App 20160359078 - SATO; Tetsuya ; et al. | 2016-12-08 |
Composition For Forming Passivation Layer, Semiconductor Substrate Having Passivation Layer, Method Of Producing Semiconductor Substrate Having Passivation Layer, Photov Oltaic Cell Element, Method Of Producing Photovoltaic Cell Element, And Photovoltaic Cell
App 20160211389 - TANAKA; Tooru ; et al. | 2016-07-21 |
Composition For Forming Electrode, Photovoltaic Cell Element And Photovoltatic Cell
App 20160118513 - ADACHI; Shuichiro ; et al. | 2016-04-28 |
Composition For Forming Passivation Layer, Semiconductor Substrate Having Passivation Layer, Method Of Producing Semiconductor Substrate Having Passivation Layer, Photololtaic Cell Element, Method Of Producing Photovoltaic Cell Element, And Photovoltaic Cell
App 20150228812 - Tanaka; Tooru ; et al. | 2015-08-13 |
Composition For Forming Passivation Layer, Semiconductor Substrate With Passivation Layer, Method Of Producing Semiconductor Substrate With Passivation Layer, Photovoltaic Cell Element, Method Of Producing Photovoltaic Cell Element And Photovoltaic Cell
App 20150179829 - Tanaka; Tooru ; et al. | 2015-06-25 |
Composition For Forming Passivation Layer, Semiconductor Substrate Having Passivation Layer, Method Of Producing Semiconductor Substrate Having Passivation Layer, Photovoltaic Cell Element, Method Of Producing Photovoltaic Cell Element And Photovoltaic Cell
App 20150166582 - Adachi; Shuichiro ; et al. | 2015-06-18 |
Scintillator single crystal, heat treatment method for production of scintillator single crystal, and method for production of scintillator single crystal
Grant 8,999,281 - Kurata , et al. April 7, 2 | 2015-04-07 |
Scintillator Single Crystal, Heat Treatment Process For Production Of Scintillator Single Crystal, And Process For Production Of Scintillator Single Crystal
App 20150069298 - Kurata; Yasushi ; et al. | 2015-03-12 |
Composition For Forming N-type Diffusion Layer, Method For Producing Semiconductor Substrate Having N-type Diffusion Layer, And Method For Producing Solar Cell Element
App 20150017754 - Sato; Tetsuya ; et al. | 2015-01-15 |
Element And Photovoltaic Cell
App 20140158196 - Kurihara; Yoshiaki ; et al. | 2014-06-12 |
Single crystal heat treatment method
Grant 8,728,232 - Usui , et al. May 20, 2 | 2014-05-20 |
Polishing slurry and polishing method
Grant 8,696,929 - Kurata , et al. April 15, 2 | 2014-04-15 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 8,616,936 - Yoshida , et al. December 31, 2 | 2013-12-31 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 08616936 - | 2013-12-31 |
Solder Bonded Body, Method Of Producing Solder Bonded Body, Element, Photovoltaic Cell, Method Of Producing Element And Method Of Producing Photovoltaic Cell
App 20130042912 - KURIHARA; Yoshiaki ; et al. | 2013-02-21 |
Abrasive, Method Of Polishing Target Member And Process For Producing Semiconductor Device
App 20120227331 - YOSHIDA; Masato ; et al. | 2012-09-13 |
Polishing slurry for chemical mechanical polishing and method for polishing substrate
Grant 8,231,735 - Haga , et al. July 31, 2 | 2012-07-31 |
CMP polishing slurry and polishing method
Grant 8,168,541 - Fukasawa , et al. May 1, 2 | 2012-05-01 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 8,162,725 - Yoshida , et al. April 24, 2 | 2012-04-24 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 8,137,159 - Yoshida , et al. March 20, 2 | 2012-03-20 |
Abrasive, Method of Polishing Target Member and Process for Producing Semiconductor Device
App 20110312251 - Yoshida; Masato ; et al. | 2011-12-22 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 7,963,825 - Yoshida , et al. June 21, 2 | 2011-06-21 |
Cmp Polishing Slurry And Polishing Method
App 20110028073 - Fukasawa; Masato ; et al. | 2011-02-03 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 7,871,308 - Yoshida , et al. January 18, 2 | 2011-01-18 |
Cerium oxide abrasive and method of polishing substrates
Grant 7,867,303 - Yoshida , et al. January 11, 2 | 2011-01-11 |
Scintillator Single Crystal, Heat Treatment Process For Production Of Scintillator Single Crystal, And Process For Production Of Scintillator Single Crystal
App 20100327227 - Kurata; Yasushi ; et al. | 2010-12-30 |
Polishing Slurry And Method Of Polishing
App 20100301265 - KURATA; Yasushi ; et al. | 2010-12-02 |
CMP polishing slurry and polishing method
Grant 7,837,800 - Fukasawa , et al. November 23, 2 | 2010-11-23 |
CMP polishing compound and polishing method
Grant 7,838,482 - Fukasawa , et al. November 23, 2 | 2010-11-23 |
Polishing fluid and method of polishing
Grant 7,799,688 - Kurata , et al. September 21, 2 | 2010-09-21 |
Single crystal for scintillator and method for manufacturing same
Grant 7,749,323 - Shimura , et al. July 6, 2 | 2010-07-06 |
Polishing medium for chemical-mechanical polishing, and method of polishing substrate member
Grant 7,744,666 - Kurata , et al. June 29, 2 | 2010-06-29 |
Cerium oxide abrasive and method of polishing substrates
Grant 7,708,788 - Yoshida , et al. May 4, 2 | 2010-05-04 |
Scintillator single crystal and production method of same
Grant 7,618,491 - Kurata , et al. November 17, 2 | 2009-11-17 |
Single crystal heat treatment method
Grant 7,531,036 - Shimura , et al. May 12, 2 | 2009-05-12 |
Scintillator Single Crystal, Heat Treatment Method For Production Of Scintillator Single Crystal, And Method For Production Of Scintillator Single Crystal
App 20080299027 - KURATA; Yasushi ; et al. | 2008-12-04 |
Abrasive, Method Of Polishing Target Member And Process For Producing Semiconductor Device
App 20080271383 - Yoshida; Masato ; et al. | 2008-11-06 |
CMP polishing slurry and polishing method
App 20080214093 - Fukasawa; Masato ; et al. | 2008-09-04 |
Polishing slurry for chemical mechanical polishing and method for polishing substrate
App 20080176982 - Haga; Kouji ; et al. | 2008-07-24 |
Polishing fluid and polishing method
Grant 7,367,870 - Kurata , et al. May 6, 2 | 2008-05-06 |
Single crystal for scintillator and method for manufacturing same
App 20080089824 - Shimura; Naoaki ; et al. | 2008-04-17 |
Polishing medium for chemical-mechanical polishing, and method of polishing substrate member
Grant 7,319,072 - Kurata , et al. January 15, 2 | 2008-01-15 |
Cmp Polishing Slurry and Method of Polishing Substrate
App 20080003925 - Fukasawa; Masato ; et al. | 2008-01-03 |
Polishing slurry and polishing method
App 20080003924 - Kurata; Yasushi ; et al. | 2008-01-03 |
Polishing slurry and polishing method
App 20070295934 - Kurata; Yasushi ; et al. | 2007-12-27 |
Polishing slurry for chemical mechanical polishing and method for polishing substrate
Grant 7,311,855 - Haga , et al. December 25, 2 | 2007-12-25 |
Scintillator single crystal and process for its production
App 20070292330 - Kurata; Yasushi ; et al. | 2007-12-20 |
Method For Heat Treating Single Crystal
App 20070277726 - Usui; Tatsuya ; et al. | 2007-12-06 |
Abrasive, method of polishing target member and process for producing semiconductor device
App 20070266642 - Yoshida; Masato ; et al. | 2007-11-22 |
Cmp Polishing Slurry And Method Of Polishing Substrate
App 20070218811 - Kurata; Yasushi ; et al. | 2007-09-20 |
Polishing Medium For Chemical-mechanical Polishing, And Polishing Method
App 20070190906 - UCHIDA; TAKESHI ; et al. | 2007-08-16 |
Polishing compound for chemimechanical polishing and polishing method
Grant 7,232,529 - Uchida , et al. June 19, 2 | 2007-06-19 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
Grant 7,163,644 - Akahori , et al. January 16, 2 | 2007-01-16 |
Scintillator single crystal and production method of same
App 20060288926 - Kurata; Yasushi ; et al. | 2006-12-28 |
Single crystal heat treatment method
App 20060266277 - Usui; Tatsuya ; et al. | 2006-11-30 |
Single crystal heat treatment method
App 20060266276 - Shimura; Naoaki ; et al. | 2006-11-30 |
Abrasive, method of polishing target member and process for producing semiconductor device
Grant 7,115,021 - Yoshida , et al. October 3, 2 | 2006-10-03 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
App 20060197054 - Akahori; Toshihiko ; et al. | 2006-09-07 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
App 20060186372 - Akahori; Toshihiko ; et al. | 2006-08-24 |
Polishing medium for chemical-mechanical polishing, and polishing method
App 20060186373 - Uchida; Takeshi ; et al. | 2006-08-24 |
Cerium Oxide Abrasive And Method Of Polishing Substrates
App 20060180787 - Yoshida; Masato ; et al. | 2006-08-17 |
Cmp polishing compound and polishing method
App 20060148667 - Fukasawa; Masato ; et al. | 2006-07-06 |
Polishing slurry for chemical mechanical polishing and method for polishing substrate
App 20060124591 - Haga; Kouji ; et al. | 2006-06-15 |
Polishing medium for chemical-mechanical polishing, and method of polishing substrate member
App 20060124597 - Kurata; Yasushi ; et al. | 2006-06-15 |
Cerium Oxide Abrasive And Method Of Polishing Substrates
App 20060118524 - Yoshida; Masato ; et al. | 2006-06-08 |
Polishing medium for chemical-mechanical polishing, and method of polishing substrate member
App 20060037251 - Kurata; Yasushi ; et al. | 2006-02-23 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
App 20050269295 - Akahori, Toshihiko ; et al. | 2005-12-08 |
Polishing fluid and polishing method
App 20050181609 - Kurata, Yasushi ; et al. | 2005-08-18 |
Polishing fluid and method of polishing
App 20050173669 - Kurata, Yasushi ; et al. | 2005-08-11 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
App 20050118820 - Akahori, Toshihiko ; et al. | 2005-06-02 |
Cerium oxide abrasive and method of polishing substrates
App 20050085168 - Yoshida, Masato ; et al. | 2005-04-21 |
Cerium oxide abrasive and method of polishing substrates
Grant 6,863,700 - Yoshida , et al. March 8, 2 | 2005-03-08 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
Grant 6,783,434 - Akahori , et al. August 31, 2 | 2004-08-31 |
CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
App 20040147206 - Akahori, Toshihiko ; et al. | 2004-07-29 |
CMP (chemical mechanical polishing) polishing liquid for metal and polishing method
App 20030219982 - Kurata, Yasushi ; et al. | 2003-11-27 |
Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same
Grant 6,420,269 - Matsuzawa , et al. July 16, 2 | 2002-07-16 |
Abrasive, method of polishing target member and process for producing semiconductor device
App 20020090895 - Yoshida, Masato ; et al. | 2002-07-11 |
Cerium Oxide abrasive and method of polishing substrates
App 20020069593 - Yoshida, Masato ; et al. | 2002-06-13 |
Cerium Oxide Abrasive For Polishing Insulating Films Formed On Substrate And Methods For Using The Same
App 20020016060 - MATSUZAWA, JUN ; et al. | 2002-02-07 |
Abrasive, method of polishing wafer, and method of producing semiconductor device
Grant 6,343,976 - Yoshida , et al. February 5, 2 | 2002-02-05 |
Cerium oxide abrasive and method of polishing substrates
Grant 6,221,118 - Yoshida , et al. April 24, 2 | 2001-04-24 |
Tetrahydrobenzindolone derivatives
Grant 6,077,840 - Kurihara , et al. June 20, 2 | 2000-06-20 |
Method of growing a rare earth silicate single crystal
Grant 5,728,213 - Kurata , et al. March 17, 1 | 1998-03-17 |
Method of growing single crystal
Grant 5,690,731 - Kurata , et al. November 25, 1 | 1997-11-25 |
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