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name:-0.056096076965332
name:-0.052195072174072
Kuo; Teng-Fang Patent Filings

Kuo; Teng-Fang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kuo; Teng-Fang.The latest application filed is for "chamber component with protective ceramic coating containing yttrium, aluminum and oxygen".

Company Profile
5.10.11
  • Kuo; Teng-Fang - Santa Clara CA
  • Kuo; Teng-fang - San Jose CA
  • Kuo; Teng-Fang - Kaohsiung TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Chamber Component With Protective Ceramic Coating Containing Yttrium, Aluminum And Oxygen
App 20220254672 - Boyd, Jr.; Wendell Glenn ;   et al.
2022-08-11
Cleaning method
Grant 11,087,979 - Olsen , et al. August 10, 2
2021-08-10
Cleaning method
Grant 10,861,693 - Stone , et al. December 8, 2
2020-12-08
Substrate Support Assembly With Deposited Surface Features
App 20200243368 - Boyd, JR.; Wendell Glenn ;   et al.
2020-07-30
Substrate support assembly with deposited surface features
Grant 10,679,885 - Boyd, Jr. , et al.
2020-06-09
Cleaning Method
App 20190172712 - OLSEN; Christopher S. ;   et al.
2019-06-06
Cleaning method
Grant 10,199,221 - Olsen , et al. Fe
2019-02-05
Substrate Support Assembly With Deposited Surface Features
App 20180301364 - Boyd, JR.; Wendell Glenn ;   et al.
2018-10-18
Substrate support assembly with deposited surface features
Grant 10,020,218 - Boyd, Jr. , et al. July 10, 2
2018-07-10
Device conformity control by low temperature, low pressure, inductively coupled ammonia-nitrogen trifluoride plasma
Grant 10,008,388 - Hsieh , et al. June 26, 2
2018-06-26
Cleaning Method
App 20180138038 - OLSEN; Christopher S. ;   et al.
2018-05-17
Cleaning method
Grant 9,870,921 - Olsen , et al. January 16, 2
2018-01-16
Methods for removing contamination from surfaces in substrate processing systems
Grant 9,805,914 - Yan , et al. October 31, 2
2017-10-31
Device Conformity Control By Low Temperature, Low Pressure, Inductively Coupled Ammonia-nitrogen Trifluoride Plasma
App 20170301556 - HSIEH; Ping Han ;   et al.
2017-10-19
Cleaning Method
App 20170178894 - STONE; Peter ;   et al.
2017-06-22
Substrate Support Assembly With Deposited Surface Features
App 20170140970 - Boyd, JR.; Wendell Glenn ;   et al.
2017-05-18
Cleaning Method
App 20170084456 - OLSEN; Christopher S. ;   et al.
2017-03-23
Methods For Removing Contamination From Surfaces In Substrate Processing Systems
App 20160293384 - YAN; Chun ;   et al.
2016-10-06
CVD oxide surface pre-conditioning by inductively coupled O2 plasma
Grant 9,240,315 - Hsieh , et al. January 19, 2
2016-01-19
Thermal pyrolysising chemical vapor deposition method for synthesizing nano-carbon material
Grant 7,226,643 - Juang , et al. June 5, 2
2007-06-05
Thermal cracking chemical vapor deposition method for synthesizing nano-carbon material
App 20030138561 - Juang, Zhen-Yu ;   et al.
2003-07-24

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