KUMAKURA; Sho
Patent Applications and Registrations
Patent applications and USPTO patent grants for KUMAKURA; Sho.The latest application filed is for "etching method and etching apparatus".
Company Profile
17.15.26
- KUMAKURA; Sho - Miyagi JP
- Kumakura; Sho - Kurokawa-gun JP
Patent Activity
| Patent | Date |
|---|---|
| Etching Method And Etching Apparatus App 20220301881 - TOMURA; Maju ; et al. | 2022-09-22 |
| Substrate processing method and substrate processing apparatus Grant 11,450,537 - Kumakura , et al. September 20, 2 | 2022-09-20 |
| Substrate Processing Method And Substrate Processing Apparatus App 20220246440 - KUMAKURA; Sho ; et al. | 2022-08-04 |
| Etching method and etching apparatus Grant 11,380,555 - Tomura , et al. July 5, 2 | 2022-07-05 |
| Substrate Processing Method App 20220199371 - KUMAKURA; Sho ; et al. | 2022-06-23 |
| Plasma Processing Method And Plasma Processing Apparatus App 20220115241 - Tabata; Masahiro ; et al. | 2022-04-14 |
| Plasma processing method and plasma processing apparatus Grant 11,239,090 - Tabata , et al. February 1, 2 | 2022-02-01 |
| Method And Apparatus For Etching Target Object App 20220005700 - Kumakura; Sho ; et al. | 2022-01-06 |
| Plasma Processing Method And Plasma Processing Apparatus App 20210375602 - SASAGAWA; Hironari ; et al. | 2021-12-02 |
| Method and apparatus for etching target object Grant 11,145,518 - Kumakura , et al. October 12, 2 | 2021-10-12 |
| Etching method and etching apparatus Grant 11,139,169 - Kumakura , et al. October 5, 2 | 2021-10-05 |
| Substrate processing method Grant 11,114,304 - Katsunuma , et al. September 7, 2 | 2021-09-07 |
| Etching method and etching apparatus Grant 11,094,550 - Kumakura , et al. August 17, 2 | 2021-08-17 |
| Etching Method, Substrate Processing Apparatus, And Substrate Processing System App 20210233778 - TOMURA; Maju ; et al. | 2021-07-29 |
| Etching Method And Etching Apparatus App 20210159084 - Tomura; Maju ; et al. | 2021-05-27 |
| Processing method and plasma processing apparatus Grant 10,916,420 - Tabata , et al. February 9, 2 | 2021-02-09 |
| Etching Method And Etching Apparatus App 20200402800 - Kumakura; Sho ; et al. | 2020-12-24 |
| Apparatus For Substrate Processing App 20200381265 - Tabata; Masahiro ; et al. | 2020-12-03 |
| Method of processing substrate Grant 10,777,425 - Tabata , et al. Sept | 2020-09-15 |
| Substrate Processing Method And Substrate Processing Apparatus App 20200279757 - KUMAKURA; Sho ; et al. | 2020-09-03 |
| Substrate Processing Method And Substrate Processing Apparatus App 20200279733 - KUMAKURA; Sho ; et al. | 2020-09-03 |
| Film Forming Method App 20200273699 - Kumakura; Sho ; et al. | 2020-08-27 |
| Etching method and plasma processing apparatus Grant 10,755,944 - Tabata , et al. A | 2020-08-25 |
| Etching Method And Etching Apparatus App 20200234963 - KUMAKURA; Sho ; et al. | 2020-07-23 |
| Apparatus For Selectively Etching First Region Made Of Silicon Nitride Against Second Region Made Of Silicon Oxide App 20200185238 - Tabata; Masahiro ; et al. | 2020-06-11 |
| Substrate Processing Method App 20200176265 - KATSUNUMA; Takayuki ; et al. | 2020-06-04 |
| Film forming method Grant 10,672,605 - Kumakura , et al. | 2020-06-02 |
| Method of selectively etching first region made of silicon nitride against second region made of silicon oxide Grant 10,600,660 - Tabata , et al. | 2020-03-24 |
| Method And Apparatus For Etching Target Object App 20200058512 - Kumakura; Sho ; et al. | 2020-02-20 |
| Plasma Processing Method And Plasma Processing Apparatus App 20200035501 - TABATA; Masahiro ; et al. | 2020-01-30 |
| Plasma Processing Method And Plasma Processing Apparatus App 20200032395 - NAKAYA; Michiko ; et al. | 2020-01-30 |
| Etching method Grant 10,483,118 - Kumakura , et al. Nov | 2019-11-19 |
| Etching Method And Plasma Processing Apparatus App 20190259626 - TABATA; Masahiro ; et al. | 2019-08-22 |
| Method Of Selectively Etching First Region Made Of Silicon Nitride Against Second Region Made Of Silicon Oxide App 20190252217 - Tabata; Masahiro ; et al. | 2019-08-15 |
| Method Of Processing Substrate App 20190198350 - Tabata; Masahiro ; et al. | 2019-06-27 |
| Method of selectively etching first region made of silicon nitride against second region made of silicon oxide Grant 10,319,613 - Tabata , et al. | 2019-06-11 |
| Etching method Grant 10,269,578 - Kumakura , et al. | 2019-04-23 |
| Etching Method App 20180330958 - Kumakura; Sho ; et al. | 2018-11-15 |
| Film Forming Method App 20180301332 - Kumakura; Sho ; et al. | 2018-10-18 |
| Etching Method App 20180301346 - Kumakura; Sho ; et al. | 2018-10-18 |
| Method Of Selectively Etching First Region Made Of Silicon Nitride Against Second Region Made Of Silicon Oxide App 20180166303 - Tabata; Masahiro ; et al. | 2018-06-14 |
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