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Patent applications and USPTO patent grants for Kulp; Mary Jo.The latest application filed is for "polyurethane polishing pad".
Patent | Date |
---|---|
Polyurethane Polishing Pad App 20150059254 - Yeh; Fengji ;   et al. | 2015-03-05 |
Creep-resistant polishing pad window Grant 8,697,217 - Loyack , et al. April 15, 2 | 2014-04-15 |
Multi-functional polishing pad Grant 8,697,239 - Kulp , et al. April 15, 2 | 2014-04-15 |
Chemical mechanical polishing pad having a low defect window Grant 8,431,489 - Kulp , et al. April 30, 2 | 2013-04-30 |
Chemical mechanical polishing pad having a low defect window App 20120295442 - Kulp; Mary Jo ;   et al. | 2012-11-22 |
Polyurethane polishing pad Grant 8,288,448 - Kulp October 16, 2 | 2012-10-16 |
Chemical mechanical polishing pad having a low defect integral window Grant 8,257,544 - Kulp , et al. September 4, 2 | 2012-09-04 |
Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith Grant 8,257,545 - Loyack , et al. September 4, 2 | 2012-09-04 |
Chemical Mechanical Polishing Pad With Light Stable Polymeric Endpoint Detection Window And Method Of Polishing Therewith App 20120077418 - Loyack; Adam ;   et al. | 2012-03-29 |
Chemical mechanical polishing pad having integral identification feature Grant 8,118,644 - Kulp , et al. February 21, 2 | 2012-02-21 |
Chemical mechanical polishing pad having window with integral identification feature Grant 8,118,641 - Kulp , et al. February 21, 2 | 2012-02-21 |
Creep-resistant polishing pad window App 20110177758 - Loyack; Adam ;   et al. | 2011-07-21 |
Polyurethane polishing pad App 20110054057 - Kulp; Mary Jo | 2011-03-03 |
Multi-functional polishing pad App 20110021123 - Kulp; Mary Jo ;   et al. | 2011-01-27 |
Chemical mechanical polishing pad having a low defect integral window App 20100317261 - Kulp; Mary Jo ;   et al. | 2010-12-16 |
Chemical Mechanical Polishing Pad Having Window With Integral Identification Feature App 20100227533 - Kulp; Mary Jo ;   et al. | 2010-09-09 |
Chemical mechanical polishing pad having integral identification feature App 20100099336 - Kulp; Mary Jo ;   et al. | 2010-04-22 |
Chemical mechanical polishing pad App 20100035529 - Kulp; Mary Jo ;   et al. | 2010-02-11 |
Chemical mechanical polishing pad having electrospun polishing layer App 20100015895 - Hendron; Jeffrey J. ;   et al. | 2010-01-21 |
Chemical mechanical polishing pad Grant 7,569,268 - Crkvenac , et al. August 4, 2 | 2009-08-04 |
Chemical mechanical polishing pad Grant 7,445,847 - Kulp November 4, 2 | 2008-11-04 |
Chemical mechanical polishing pad Grant 7,438,636 - Kulp , et al. October 21, 2 | 2008-10-21 |
Method for forming a porous polishing pad Grant 7,435,364 - James , et al. October 14, 2 | 2008-10-14 |
Polyurethane polishing pad App 20080242755 - Kulp; Mary Jo | 2008-10-02 |
Polyurethane polishing pad Grant 7,414,080 - Kulp August 19, 2 | 2008-08-19 |
Chemical mechanical polishing pad App 20080182492 - Crkvenac; T. Todd ;   et al. | 2008-07-31 |
Chemical mechanical polishing pad App 20080153395 - Kulp; Mary Jo ;   et al. | 2008-06-26 |
Elastomer-modified chemical mechanical polishing pad Grant 7,371,160 - Cruz , et al. May 13, 2 | 2008-05-13 |
Chemical mechanical polishing pad App 20070275226 - Kulp; Mary Jo | 2007-11-29 |
Chemical mechanical polishing pad Grant 7,169,030 - Kulp January 30, 2 | 2007-01-30 |
Method for forming a porous polishing pad App 20060226567 - James; David B. ;   et al. | 2006-10-12 |
Polishing pad Grant 7,074,115 - James , et al. July 11, 2 | 2006-07-11 |
Polyurethane polishing pad App 20050171225 - Kulp, Mary Jo | 2005-08-04 |
Polyurethane polishing pad App 20050171224 - Kulp, Mary Jo | 2005-08-04 |
Polishing pad App 20050079806 - James, David B. ;   et al. | 2005-04-14 |
Polishing pad having an advantageous micro-texture and methods relating thereto Grant 6,679,769 - Pinheiro , et al. January 20, 2 | 2004-01-20 |
Polishing pad having an advantageous micro-texture and methods relating thereto App 20020058469 - Pinheiro, Barry Scott ;   et al. | 2002-05-16 |
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