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name:-0.0024020671844482
name:-0.010702133178711
name:-0.0018579959869385
KUKLA; Reiner Patent Filings

KUKLA; Reiner

Patent Applications and Registrations

Patent applications and USPTO patent grants for KUKLA; Reiner.The latest application filed is for "deposition apparatus for coating a flexible substrate, method of coating a flexible substrate and flexible substrate having a coating".

Company Profile
2.8.3
  • KUKLA; Reiner - Hanau DE
  • Kukla; Reiner - Hanau am Main DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Deposition Apparatus For Coating A Flexible Substrate, Method Of Coating A Flexible Substrate And Flexible Substrate Having A Coating
App 20210222288 - KURTHEN; Christof ;   et al.
2021-07-22
Deposition Apparatus, Method Of Coating A Flexible Substrate And Flexible Substrate Having A Coating
App 20200318233 - HABERKORN; Edgar ;   et al.
2020-10-08
Guide arrangement with at least on guide roller for the guidance of webs in webs treatment installations
Grant 7,882,946 - Hein , et al. February 8, 2
2011-02-08
Sputtering cathode for coating substrates in cathode sputtering apparatus
Grant 5,133,850 - Kukla , et al. July 28, 1
1992-07-28
Process for coating a dielectric substrate with copper
Grant 5,108,571 - Ludwig , et al. April 28, 1
1992-04-28
Apparatus for coating substrates by means of a magnetron cathode
Grant 5,069,772 - Fritsche , et al. December 3, 1
1991-12-03
Cathode sputtering apparatus on the magnetron principle with a hollow cathode and a cylindrical target
Grant 4,966,677 - Aichert , et al. October 30, 1
1990-10-30
Sputtering cathode based on the magnetron principle
Grant 4,933,064 - Geisler , et al. June 12, 1
1990-06-12
Magnetron cathode for sputtering ferromagnetic targets
Grant 4,572,776 - Aichert , et al. February 25, 1
1986-02-25
Magnetron cathode for cathodic evaportion apparatus
Grant 4,515,675 - Kieser , et al. May 7, 1
1985-05-07

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