Kudo; Takanori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kudo; Takanori.The latest application filed is for "novolak/dnq based, chemically amplified photoresist".

Company Profile

0.22.21

Kudo; Takanori - Bedminster NJ
KUDO; Takanori - Tokyo JP
Kudo, Takanori - Somerville NJ
Kudo; Takanori - Shizuoka JP
Kudo, Takanori - Ogasa-gun JP
Kudo; Takanori - Kodaira JP
Kudo; Takanori - Saitama JP
Kudo; Takanori - Hachioji JP
Kudo; Takanori - Kokubunji JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Novolak/dnq Based, Chemically Amplified Photoresist App 20210382390 - Toukhy; Medhat A. ; et al.	2021-12-09
Antireflective coating compositions and processes thereof Grant 9,274,426 - Rahman , et al. March 1, 2	2016-03-01
Antireflective Coating Compositions And Processes Thereof App 20150309403 - RAHMAN; M. Dalil ; et al.	2015-10-29
Antireflective Coating Compositions And Processes Thereof App 20150309410 - RAHMAN; M. Dalil ; et al.	2015-10-29
Antireflective coating composition and process thereof Grant 9,152,051 - Rahman , et al. October 6, 2	2015-10-06
Antireflective Coating Composition And Process Thereof App 20140370444 - RAHMAN; M. Dalil ; et al.	2014-12-18
Bottom antireflective coating compositions and processes thereof Grant 8,623,589 - Kudo , et al. January 7, 2	2014-01-07
Method And Device For Controlling Operation Of Heat Pump Unit App 20130312438 - KUDO; Takanori ; et al.	2013-11-28
Bottom Antireflective Coating Compositions And Processes Thereof App 20120308939 - Kudo; Takanori ; et al.	2012-12-06
Photoresist compositions Grant 8,252,503 - Chakrapani , et al. August 28, 2	2012-08-28
Underlayer Developable Coating Compositions and Processes Thereof App 20120122029 - Kudo; Takanori ; et al.	2012-05-17
Positive-Working Photoimageable Bottom Antireflective Coating App 20110086312 - Dammel; Ralph R. ; et al.	2011-04-14
Photoactive compounds Grant 7,601,480 - Rahman , et al. October 13, 2	2009-10-13
Composition for coating over a photoresist pattern Grant 7,595,141 - Kudo , et al. September 29, 2	2009-09-29
Photoresist Compositions App 20090053652 - Chakrapani; Srinivasan ; et al.	2009-02-26
Photoactive Compounds App 20080153032 - Rahman; M. Dalil ; et al.	2008-06-26
Photoresist compositions Grant 7,122,291 - Padmanaban , et al. October 17, 2	2006-10-17
Composition for coating over a photoresist pattern App 20060088788 - Kudo; Takanori ; et al.	2006-04-27
Photoresist compositions App 20060024610 - Padmanaban; Munirathna ; et al.	2006-02-02
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds Grant 6,991,888 - Padmanaban , et al. January 31, 2	2006-01-31
Inter-region thermal complementary system by distributed cryogenic and thermal devices Grant 6,889,520 - Sano , et al. May 10, 2	2005-05-10
Negative deep ultraviolet photoresist Grant 6,800,416 - Kudo , et al. October 5, 2	2004-10-05
Coating composition App 20040106742 - Harada, Takamasa ; et al.	2004-06-03
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating Grant 6,737,492 - Kang , et al. May 18, 2	2004-05-18
Photoresist composition for deep UV radiation containing an additive Grant 6,723,488 - Kudo , et al. April 20, 2	2004-04-20
Inter-region thermal complementary system by distributed cryogenic and termal devices App 20040011074 - Sano, Makoto ; et al.	2004-01-22
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds App 20030235782 - Padmanaban, Munirathna ; et al.	2003-12-25
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds App 20030235775 - Padmanaban, Munirathna ; et al.	2003-12-25
Process for producing film forming resins for photoresist compositions Grant 6,610,465 - Rahman , et al. August 26, 2	2003-08-26
Negative deep ultraviolet photoresist App 20030129527 - Kudo, Takanori ; et al.	2003-07-10
Photoresist composition for deep UV radiation containing an additive App 20030087180 - Kudo, Takanori ; et al.	2003-05-08
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating App 20030065119 - Kang, Wen-Bing ; et al.	2003-04-03
Process for producing film forming resins for photoresist compositions App 20020197555 - Rahman, M. Dalil ; et al.	2002-12-26
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating Grant 6,468,718 - Kang , et al. October 22, 2	2002-10-22
Coal gasification furnace with a slag tap hole of specific shape Grant 5,782,032 - Tanaka , et al. July 21, 1	1998-07-21
Radiation-sensitive mixture comprising a basic iodonium compound Grant 5,663,035 - Masuda , et al. September 2, 1	1997-09-02
Radiation sensitive composition Grant 5,595,855 - Padmanaban , et al. January 21, 1	1997-01-21
Process for producing information recording medium Grant 5,008,128 - Kudo , et al. April 16, 1	1991-04-16
Magnetic recording medium Grant 4,794,035 - Ishihara , et al. December 27, 1	1988-12-27
Magnetic recording medium Grant 4,722,859 - Kudo , et al. February 2, 1	1988-02-02

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