loadpatents
name:-1.1044361591339
name:-0.030395030975342
name:-0.0071330070495605
Kruger; James Bernard Patent Filings

Kruger; James Bernard

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kruger; James Bernard.The latest application filed is for "method for forming thin film heads using a bi-layer anti-reflection coating for photolithographic applications and a device thereof".

Company Profile
0.4.6
  • Kruger; James Bernard - Half Moon Bay CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method For Forming Thin Film Heads Using A Bi-layer Anti-reflection Coating For Photolithographic Applications And A Device Thereof
App 20080124942 - Kruger; James Bernard ;   et al.
2008-05-29
Structure for photolithographic applications using a multi-layer anti-reflection coating
Grant 7,365,408 - Kruger , et al. April 29, 2
2008-04-29
Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing
Grant 6,972,928 - Snyder , et al. December 6, 2
2005-12-06
Method of fabricating a narrow projection such as a write pole extending from a substrate
App 20050147793 - Kruger, James Bernard ;   et al.
2005-07-07
Method of making a narrow pole tip by ion beam deposition
Grant 6,862,798 - Kruger , et al. March 8, 2
2005-03-08
Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing
App 20050000935 - Snyder, Clinton David ;   et al.
2005-01-06
Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing
Grant 6,770,209 - Snyder , et al. August 3, 2
2004-08-03
Method for forming thin film heads using a bi-layer anti-reflection coating for photolithographic applications and a structure thereof
App 20030203645 - Kruger, James Bernard ;   et al.
2003-10-30
Method of making a narrow pole tip by ion beam deposition
App 20030135987 - Kruger, James Bernard ;   et al.
2003-07-24
Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing
App 20030128463 - Snyder, Clinton David ;   et al.
2003-07-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed