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Patent applications and USPTO patent grants for Kropewnicki; Thomas J..The latest application filed is for "method for forming a through silicon via layout".
Patent | Date |
---|---|
Method for forming a through silicon via layout Grant 7,799,678 - Kropewnicki , et al. September 21, 2 | 2010-09-21 |
Method for etching having a controlled distribution of process results Grant 7,648,914 - Kropewnicki , et al. January 19, 2 | 2010-01-19 |
Disposable organic spacers Grant 7,579,228 - Grudowski , et al. August 25, 2 | 2009-08-25 |
Method For Forming A Through Silicon Via Layout App 20090191708 - Kropewnicki; Thomas J. ;   et al. | 2009-07-30 |
Disposable organic spacers App 20090017587 - Grudowski; Paul A. ;   et al. | 2009-01-15 |
Alternating Asymmetrical Plasma Generation In A Process Chamber App 20080023443 - Paterson; Alexander ;   et al. | 2008-01-31 |
Method for etching having a controlled distribution of process results App 20070042603 - Kropewnicki; Thomas J. ;   et al. | 2007-02-22 |
Alternating asymmetrical plasma generation in a process chamber App 20050241762 - Paterson, Alexander ;   et al. | 2005-11-03 |
Substrate cleaning process Grant 6,440,864 - Kropewnicki , et al. August 27, 2 | 2002-08-27 |
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