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Deposition-selective etch-deposition process for dielectric film gapfill
Grant 7,799,698 - Zhang , et al. September 21, 2 | 2010-09-21 |
Gas distribution system for improved transient phase deposition
Grant 7,722,737 - Gondhalekar , et al. May 25, 2 | 2010-05-25 |
Deposition-selective etch-deposition process for dielectric film gapfill
Grant 7,691,753 - Zhang , et al. April 6, 2 | 2010-04-06 |
Gas delivery system for semiconductor processing
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Gas distributor having directed gas flow and cleaning method
Grant 7,431,772 - Murugesh , et al. October 7, 2 | 2008-10-07 |
Sequential gas flow oxide deposition technique
Grant 7,399,388 - Moghadam , et al. July 15, 2 | 2008-07-15 |
In situ application of etch back for improved deposition into high-aspect-ratio features
Grant 7,399,707 - Krishnaraj , et al. July 15, 2 | 2008-07-15 |
Gas Distribution System for Improved Transient Phase Deposition
App 20080041821 - Gondhalekar; Sudhir ; et al. | 2008-02-21 |
Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applications
Grant 7,189,639 - Krishnaraj , et al. March 13, 2 | 2007-03-13 |
Gas Delivery System For Semiconductor Processing
App 20070048446 - Gondhalekar; Sudhir ; et al. | 2007-03-01 |
Gas delivery system for semiconductor processing
Grant 7,141,138 - Gondhalekar , et al. November 28, 2 | 2006-11-28 |
Deposition-selective Etch-deposition Process For Dielectric Film Gapfill
App 20060228886 - Zhang; Lin ; et al. | 2006-10-12 |
Deposition process for high aspect ratio trenches
Grant 7,097,886 - Moghadam , et al. August 29, 2 | 2006-08-29 |
Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applications
App 20060178003 - Krishnaraj; Padmanabhan ; et al. | 2006-08-10 |
Deposition-selective etch-deposition process for dielectric film gapfill
Grant 7,081,414 - Zhang , et al. July 25, 2 | 2006-07-25 |
Method for high aspect ratio HDP CVD gapfill
Grant 7,064,077 - Hua , et al. June 20, 2 | 2006-06-20 |
Gas distribution system for improved transient phase deposition
App 20060113038 - Gondhalekar; Sudhir ; et al. | 2006-06-01 |
Deposition of low dielectric constant films by N2O addition
App 20050214457 - Schmitt, Francimar ; et al. | 2005-09-29 |
Gas distributor having directed gas flow and cleaning method
App 20050199184 - Murugesh, Laxman ; et al. | 2005-09-15 |
In situ application of etch back for improved deposition into high-aspect-ratio features
App 20050124166 - Krishnaraj, Padmanabhan ; et al. | 2005-06-09 |
HDP-CVD uniformity control
Grant 6,890,597 - Krishnaraj , et al. May 10, 2 | 2005-05-10 |
Method for high aspect ratio HDP CVD gapfill
App 20050079715 - Hua, Zhong Qiang ; et al. | 2005-04-14 |
In situ application of etch back for improved deposition into high-aspect-ratio features
Grant 6,869,880 - Krishnaraj , et al. March 22, 2 | 2005-03-22 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
Grant 6,863,019 - Shamouilian , et al. March 8, 2 | 2005-03-08 |
Sequential gas flow oxide deposition technique
App 20050019494 - Moghadam, Farhad K. ; et al. | 2005-01-27 |
[deposition-selective Etch-deposition Process For Dielectric Film Gapfill]
App 20040251236 - Zhang, Lin ; et al. | 2004-12-16 |
Gas delivery system for semiconductor processing
App 20040231798 - Gondhalekar, Sudhir ; et al. | 2004-11-25 |
HDP-CVD uniformity control
App 20040224090 - Krishnaraj, Padmanabhan ; et al. | 2004-11-11 |
Method for high aspect ratio HDP CVD gapfill
Grant 6,812,153 - Hua , et al. November 2, 2 | 2004-11-02 |
Gas delivery system for semiconductor processing
App 20040126952 - Gondhalekar, Sudhir ; et al. | 2004-07-01 |
Deposition process for high aspect ratio trenches
App 20040115898 - Moghadam, Farhad K. ; et al. | 2004-06-17 |
Method and apparatus for cleaning a semiconductor wafer processing system
Grant 6,715,496 - Kwan , et al. April 6, 2 | 2004-04-06 |
Method for high aspect ratio HDP CVD gapfill
App 20030203637 - Hua, Zhong Qiang ; et al. | 2003-10-30 |
Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment
Grant 6,635,144 - Cui , et al. October 21, 2 | 2003-10-21 |
Methods and apparatus for producing stable low k FSG film for HDP-CVD
Grant 6,633,076 - Krishnaraj , et al. October 14, 2 | 2003-10-14 |
Method and apparatus for cleaning a semiconductor wafer processing system
App 20030164224 - Kwan, Michael Chiu ; et al. | 2003-09-04 |
In situ application of etch back for improved deposition into high-aspect-ratio features
App 20030136332 - Krishnaraj, Padmanabhan ; et al. | 2003-07-24 |
Methods and apparatus for producing stable low k FSG film for HDP-CVD
App 20030064556 - Krishnaraj, Padmanabhan ; et al. | 2003-04-03 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
App 20030036272 - Shamouilian, Shamouil ; et al. | 2003-02-20 |
Gas distribution system for a CVD processing chamber
Grant 6,486,081 - Ishikawa , et al. November 26, 2 | 2002-11-26 |
Methods and apparatus for producing stable low k FSG film for HDP-CVD
App 20020173167 - Krishnaraj, Padmanabhan ; et al. | 2002-11-21 |
Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment
App 20020151186 - Cui, Zhenjiang ; et al. | 2002-10-17 |
Remote plasma cleaning method for processing chambers
Grant 6,274,058 - Rajagopalan , et al. August 14, 2 | 2001-08-14 |
Process kit
Grant 6,189,483 - Ishikawa , et al. February 20, 2 | 2001-02-20 |
Gas distribution system for a CVD processing chamber
Grant 6,143,078 - Ishikawa , et al. November 7, 2 | 2000-11-07 |
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