Krishnan; Rishikesh

Patent Applications and Registrations

Patent applications and USPTO patent grants for Krishnan; Rishikesh.The latest application filed is for "gate oxide for nanosheet transistor devices".

Company Profile

8.50.52

Krishnan; Rishikesh - Cohoes NY
Krishnan; Rishikesh - Poughkeepsie NY
Krishnan; Rishikesh - Painted Post NY
Krishnan; Rishikesh - Boise ID
Krishnan; Rishikesh - Hopewell Junction NY US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Gate Oxide For Nanosheet Transistor Devices App 20220069104 - Siddiqui; Shahab ; et al.	2022-03-03
Gate oxide for nanosheet transistor devices Grant 11,211,474 - Siddiqui , et al. December 28, 2	2021-12-28
Precise Bottom Junction Formation For Vertical Transport Field Effect Transistor With Highly Doped Epitaxial Source/drain, Sharp Junction Gradient, And/or Reduced Parasitic Capacitance App 20210391473 - Zhao; Kai ; et al.	2021-12-16
FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth Grant 11,081,583 - Harley , et al. August 3, 2	2021-08-03
Gate Oxide For Nanosheet Transistor Devices App 20210217873 - Siddiqui; Shahab ; et al.	2021-07-15
Device with highly active acceptor doping and method of production thereof Grant 10,886,178 - Lee , et al. January 5, 2	2021-01-05
Fin structures Grant 10,790,198 - Al-Amoody , et al. September 29, 2	2020-09-29
FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth Grant 10,615,279 - Harley , et al.	2020-04-07
Finfet With Dielectric Isolation After Gate Module For Improved Source And Drain Region Epitaxial Growth App 20200066908 - HARLEY; ERIC C. ; et al.	2020-02-27
Device With Highly Active Acceptor Doping And Method Of Production Thereof App 20200066593 - LEE; Tek Po Rinus ; et al.	2020-02-27
Fin Structures App 20200051867 - AL-AMOODY; Fuad H. ; et al.	2020-02-13
FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth Grant 10,243,077 - Harley , et al.	2019-03-26
Microwave annealing of flowable oxides with trap layers Grant 10,211,045 - Krishnan , et al. Feb	2019-02-19
Shallow Trench Isolation (sti) Gap Fill App 20190027556 - Shu; Jiehui ; et al.	2019-01-24
Finfet With Dielectric Isolation After Gate Module For Improved Source And Drain Region Epitaxial Growth App 20180097113 - HARLEY; ERIC C. ; et al.	2018-04-05
FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth Grant 9,917,190 - Harley , et al. March 13, 2	2018-03-13
Trench metal insulator metal capacitor with oxygen gettering layer Grant 9,911,597 - Ando , et al. March 6, 2	2018-03-06
Hydroxyl group termination for nucleation of a dielectric metallic oxide Grant 9,831,084 - Ando , et al. November 28, 2	2017-11-28
Trench Metal Insulator Metal Capacitor With Oxygen Gettering Layer App 20170250073 - Ando; Takashi ; et al.	2017-08-31
Trench metal-insulator-metal capacitor with oxygen gettering layer Grant 9,653,534 - Ando , et al. May 16, 2	2017-05-16
DT capacitor with silicide outer electrode and/or compressive stress layer, and related methods Grant 9,653,535 - Breil , et al. May 16, 2	2017-05-16
FinFET and nanowire semiconductor devices with suspended channel regions and gate structures surrounding the suspended channel regions Grant 9,577,100 - Cheng , et al. February 21, 2	2017-02-21
Epitaxial growth of material on source/drain regions of FinFET structure Grant 9,536,985 - Chudzik , et al. January 3, 2	2017-01-03
DT capacitor with silicide outer electrode and/or compressive stress layer, and related methods Grant 9,496,329 - Breil , et al. November 15, 2	2016-11-15
Finfet With Dielectric Isolation After Gate Module For Improved Source And Drain Region Epitaxial Growth App 20160197186 - HARLEY; ERIC C. ; et al.	2016-07-07
Trench Metal-insulator-metal Capacitor With Oxygen Gettering Layer App 20160181353 - Ando; Takashi ; et al.	2016-06-23
Hydroxyl group termination for nucleation of a dielectric metallic oxide Grant 9,373,501 - Ando , et al. June 21, 2	2016-06-21
Die level chemical mechanical polishing Grant 9,373,524 - Krishnan , et al. June 21, 2	2016-06-21
Non-volatile memory structure employing high-k gate dielectric and metal gate Grant 9,318,336 - Breil , et al. April 19, 2	2016-04-19
finFET with dielectric isolation after gate module for improved source and drain region epitaxial growth Grant 9,312,364 - Harley , et al. April 12, 2	2016-04-12
Epitaxial Growth Of Material On Source/drain Regions Of Finfet Structure App 20160093720 - Chudzik; Michael P. ; et al.	2016-03-31
DT capacitor with silicide outer electrode and/or compressive stress layer, and related methods Grant 9,299,766 - Breil , et al. March 29, 2	2016-03-29
Wafer stress control with backside patterning Grant 9,269,607 - Engbrecht , et al. February 23, 2	2016-02-23
Finfet With Dielectric Isolation After Gate Module For Improved Source And Drain Region Epitaxial Growth App 20160035878 - HARLEY; ERIC C. ; et al.	2016-02-04
Hydroxyl Group Termination For Nucleation Of A Dielectric Metallic Oxide App 20160027640 - Ando; Takashi ; et al.	2016-01-28
Die Level Chemical Mechanical Polishing App 20150371870 - Krishnan; Rishikesh ; et al.	2015-12-24
Wafer Stress Control With Backside Patterning App 20150364362 - Engbrecht; Edward ; et al.	2015-12-17
Finfet And Nanowire Semiconductor Devices With Suspended Channel Regions And Gate Structures Surrounding The Suspended Channel Regions App 20150364603 - Cheng; Kangguo ; et al.	2015-12-17
Dt Capacitor With Silicide Outer Electrode And/or Compressive Stress Layer, And Related Methods App 20150357403 - Breil; Nicolas L. ; et al.	2015-12-10
Dt Capacitor With Silicide Outer Electrode And/or Compressive Stress Layer, And Related Methods App 20150357402 - Breil; Nicolas L. ; et al.	2015-12-10
Finfet With Dielectric Isolation After Gate Module For Improved Source And Drain Region Epitaxial Growth App 20150349093 - Harley; ERIC C. ; et al.	2015-12-03
Die Level Chemical Mechanical Polishing App 20150311088 - Krishnan; Rishikesh ; et al.	2015-10-29
Dt Capacitor With Silicide Outer Electrode And/or Compressive Stress Layer, And Related Methods App 20150279925 - Breil; Nicolas L. ; et al.	2015-10-01
Single-crystal Source-drain Merged By Polycrystalline Material App 20150270332 - Harley; Eric C. ; et al.	2015-09-24
Single crystal source-drain merged by polycrystalline material Grant 9,123,826 - Harley , et al. September 1, 2	2015-09-01
Non-volatile memory structure employing high-k gate dielectric and metal gate Grant 9,099,394 - Breil , et al. August 4, 2	2015-08-04
Structure And Process To Decouple Deep Trench Capacitors And Well Isolation App 20150214244 - Ho; Herbert L. ; et al.	2015-07-30
Thermally stable high-K tetragonal HFO2 layer within high aspect ratio deep trenches Grant 9,087,927 - Chudzik , et al. July 21, 2	2015-07-21
Methods of forming capacitors having dielectric regions that include multiple metal oxide-comprising materials Grant 8,993,044 - Krishnan , et al. March 31, 2	2015-03-31
Electrical components for microelectronic devices and methods of forming the same Grant 8,987,863 - Krishnan , et al. March 24, 2	2015-03-24
Thermally Stable High-k Tetragonal Hfo2 Layer Within High Aspect Ratio Deep Trenches App 20150044853 - Chudzik; Michael P. ; et al.	2015-02-12
Capacitors Having Dielectric Regions that Include Multiple Metal Oxide-Comprising Materials App 20150001674 - Krishnan; Rishikesh ; et al.	2015-01-01
Thermally stable high-K tetragonal HFO.sub.2 layer within high aspect ratio deep trenches Grant 8,901,706 - Chudzik , et al. December 2, 2	2014-12-02
Hydroxyl Group Termination For Nucleation Of A Dielectric Metallic Oxide App 20140308821 - Ando; Takashi ; et al.	2014-10-16
Capacitors having dielectric regions that include multiple metal oxide-comprising materials Grant 8,861,179 - Krishnan , et al. October 14, 2	2014-10-14
Replacement gate with reduced gate leakage current Grant 8,809,176 - Ando , et al. August 19, 2	2014-08-19
Deposition Of Pure Metals In 3d Structures App 20140183051 - Chudzik; Michael P. ; et al.	2014-07-03
Shallow trench isolation for device including deep trench capacitors Grant 8,679,938 - Fang , et al. March 25, 2	2014-03-25
Methods of making crystalline tantalum pentoxide Grant 8,673,390 - Bhat , et al. March 18, 2	2014-03-18
Non-volatile Memory Structure Employing High-k Gate Dielectric And Metal Gate App 20140057426 - Breil; Nicolas ; et al.	2014-02-27
Insulating layers on different semiconductor materials Grant 8,592,325 - Shepard, Jr. , et al. November 26, 2	2013-11-26
Replacement gate with reduced gate leakage current Grant 8,581,351 - Ando , et al. November 12, 2	2013-11-12
Electrical Components For Microelectronic Devices And Methods Of Forming The Same App 20130258550 - Krishnan; Rishikesh ; et al.	2013-10-03
Replacement Gate With Reduced Gate Leakage Current App 20130217219 - Ando; Takashi ; et al.	2013-08-22
Shallow Trench Isolation For Device Including Deep Trench Capacitors App 20130200482 - FANG; Sunfei ; et al.	2013-08-08
Thermally Stable High-k Tetragonal Hfo2 Layer Within High Aspect Ratio Deep Trenches App 20130175665 - Chudzik; Michael P. ; et al.	2013-07-11
Electrical components for microelectronic devices and methods of forming the same Grant 8,450,173 - Krishnan , et al. May 28, 2	2013-05-28
Non-volatile Memory Structure Employing High-k Gate Dielectric And Metal Gate App 20130105879 - Breil; Nicolas ; et al.	2013-05-02
Methods of Making Crystalline Tantalum Pentoxide App 20130011990 - Bhat; Vishwanath ; et al.	2013-01-10
Capacitors Having Dielectric Regions That Include Multiple Metal Oxide-Comprising Materials App 20120320494 - Krishnan; Rishikesh ; et al.	2012-12-20
Capacitors having dielectric regions that include multiple metal oxide-comprising materials Grant 8,310,807 - Krishnan , et al. November 13, 2	2012-11-13
Methods of Forming Capacitors Having Dielectric Regions That Include Multiple Metal Oxide-Comprising Materials App 20120282754 - Krishnan; Rishikesh ; et al.	2012-11-08
Methods of making crystalline tantalum pentoxide Grant 8,282,988 - Bhat , et al. October 9, 2	2012-10-09
Method of fabricating a deep trench (DT) metal-insulator-metal (MIM) capacitor Grant 8,241,981 - Krishnan , et al. August 14, 2	2012-08-14
Methods of forming capacitors having dielectric regions that include multiple metal oxide-comprising materials Grant 8,236,372 - Krishnan , et al. August 7, 2	2012-08-07
Method Of Fabricating A Deep Trench (dt) Metal-insulator-metal (mim) Capacitor App 20120196424 - Krishnan; Rishikesh ; et al.	2012-08-02
Insulating Layers On Different Semiconductor Materials App 20120187453 - Shepard, JR.; Joseph F. ; et al.	2012-07-26
Replacement Gate With Reduced Gate Leakage Current App 20120181630 - Ando; Takashi ; et al.	2012-07-19
Trench Capacitor And Method Of Fabrication App 20110298089 - Krishnan; Rishikesh ; et al.	2011-12-08
Methods of Making Crystalline Tantalum Pentoxide App 20110300721 - Bhat; Vishwanath ; et al.	2011-12-08
Electrical Components For Microelectronic Devices And Methods Of Forming The Same App 20110254129 - Krishnan; Rishikesh ; et al.	2011-10-20
Methods of making crystalline tantalum pentoxide Grant 8,012,532 - Bhat , et al. September 6, 2	2011-09-06
Insulating Layers On Different Semiconductor Materials App 20110169141 - Shepard, JR.; Joseph F. ; et al.	2011-07-14
Electrical components for microelectronic devices Grant 7,968,969 - Krishnan , et al. June 28, 2	2011-06-28
Capacitors Having Dielectric Regions That Include Multiple Metal Oxide-Comprising Materials App 20100315760 - Krishnan; Rishikesh ; et al.	2010-12-16
Methods Of Forming Capacitors Having Dielectric Regions That Include Multiple Metal Oxide-Comprising Materials App 20100316793 - Krishnan; Rishikesh ; et al.	2010-12-16
Electrical Components For Microelectronic Devices And Methods Of Forming The Same App 20090273058 - Krishnan; Rishikesh ; et al.	2009-11-05
Electrical components for microelectronic devices and methods of forming the same Grant 7,560,392 - Krishnan , et al. July 14, 2	2009-07-14
Methods Of Making Crystalline Tantalum Pentoxide App 20090155486 - Bhat; Vishwanath ; et al.	2009-06-18
Electrical components for microelectronic devices and methods of forming the same App 20070264838 - Krishnan; Rishikesh ; et al.	2007-11-15

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.