| Patent | Date |
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Lithographic apparatus and device manufacturing method
Grant 8,089,609 - Sewell , et al. January 3, 2 | 2012-01-03 |
Using an interferometer as a high speed variable attenuator
Grant 7,898,646 - Noordman , et al. March 1, 2 | 2011-03-01 |
Interferometric lithographic projection apparatus
Grant 7,751,030 - Markoya , et al. July 6, 2 | 2010-07-06 |
Using an interferometer as a high speed variable attenuator
Grant 7,683,300 - Noordman , et al. March 23, 2 | 2010-03-23 |
Lithographic apparatus and device manufacturing method
App 20090109412 - Sewell; Harry ; et al. | 2009-04-30 |
Symmetrical illumination forming system and method
Grant 7,511,826 - Kreuzer March 31, 2 | 2009-03-31 |
Using an interferometer as a high speed variable attenuator
App 20080117494 - Noordman; Oscar Franciscus Jozephus ; et al. | 2008-05-22 |
Using an Interferometer as a High Speed Variable Attenuator
App 20080106717 - NOORDMAN; Oscar Franciscus Jozephus ; et al. | 2008-05-08 |
Wafer handling method for use in lithography patterning
Grant 7,298,459 - del Puerto , et al. November 20, 2 | 2007-11-20 |
Optical beam shearing apparatus
Grant 7,274,468 - Hill , et al. September 25, 2 | 2007-09-25 |
Symmetrical illumination forming system
App 20070201034 - Kreuzer; Justin L. | 2007-08-30 |
Method and system for improving focus accuracy in a lithography system
Grant 7,248,336 - Nelson , et al. July 24, 2 | 2007-07-24 |
Optical reduction system with control of illumination polarization
Grant 7,239,446 - Kreuzer July 3, 2 | 2007-07-03 |
System and method to block unwanted light reflecting from a pattern generating portion from reaching an object
Grant 7,180,573 - Lipson , et al. February 20, 2 | 2007-02-20 |
Method and system for improving focus accuracy in a lithography system
App 20060187436 - Nelson; Michael L. ; et al. | 2006-08-24 |
Interferometric lithographic projection apparatus
App 20060170896 - Markoya; Louis J. ; et al. | 2006-08-03 |
Method and system to interferometrically detect an alignment mark
Grant 7,084,987 - Kreuzer August 1, 2 | 2006-08-01 |
Method and systems for improving focus accuracy in a lithography system
Grant 7,053,984 - Nelson , et al. May 30, 2 | 2006-05-30 |
System and method to block unwanted light reflecting from a pattern generating portion from reaching an object
App 20060082745 - Lipson; Matthew ; et al. | 2006-04-20 |
Optical reduction method with elimination of reticle diffraction induced bias
Grant 7,031,077 - Kreuzer April 18, 2 | 2006-04-18 |
Wafer handling method for use in lithography patterning
App 20050264791 - del Puerto, Santiago E. ; et al. | 2005-12-01 |
Optical beam shearing apparatus
App 20050213105 - Hill, Henry Allen ; et al. | 2005-09-29 |
Wafer handling method for use in lithography patterning
Grant 6,927,842 - del Puerto , et al. August 9, 2 | 2005-08-09 |
Interferometers for measuring changes in optical beam direction
Grant 6,917,432 - Hill , et al. July 12, 2 | 2005-07-12 |
Method and systems for improving focus accuracy in a lithography system
App 20050128456 - Nelson, Michael L. ; et al. | 2005-06-16 |
Optical reduction system with elimination of reticle diffraction induced bias
App 20050094289 - Kreuzer, Justin L. | 2005-05-05 |
Method and system to detect an alignment mark
App 20050041256 - Kreuzer, Justin L. | 2005-02-24 |
Method and system for improving focus accuracy in a lithography system
Grant 6,859,260 - Nelson , et al. February 22, 2 | 2005-02-22 |
Optical reduction system with elimination of reticle diffraction induced bias
Grant 6,836,380 - Kreuzer December 28, 2 | 2004-12-28 |
Wafer handling method for use in lithography patterning
App 20040257554 - del Puerto, Santiago E. ; et al. | 2004-12-23 |
Self referencing mark independent alignment sensor
Grant 6,809,827 - Kreuzer October 26, 2 | 2004-10-26 |
Wafer handling system for use in lithography patterning
Grant 6,778,258 - del Puerto , et al. August 17, 2 | 2004-08-17 |
Optical reduction system with control of illumination polarization
App 20040120044 - Kreuzer, Justin L. | 2004-06-24 |
Self referencing mark independent alignment sensor
App 20040066518 - Kreuzer, Justin L. | 2004-04-08 |
Optical reduction system with control of illumination polarization
Grant 6,680,798 - Kreuzer January 20, 2 | 2004-01-20 |
Optical reduction system with elimination of reticle diffraction induced bias
App 20030223126 - Kreuzer, Justin L. | 2003-12-04 |
Self referencing mark independent alignment sensor
Grant 6,628,406 - Kreuzer September 30, 2 | 2003-09-30 |
Interferometers for measuring changes in optical beam direction
App 20030117631 - Hill, Henry Allen ; et al. | 2003-06-26 |
Wafer handling system and method for use in lithography patterning
App 20030082466 - del Puerto, Santiago E. ; et al. | 2003-05-01 |
Optical reduction system with elimination of reticle diffraction induced bias
Grant 6,522,483 - Kreuzer February 18, 2 | 2003-02-18 |
Method and system for improving focus accuracy in a lithography system
App 20020158185 - Nelson, Michael L. ; et al. | 2002-10-31 |
In situ projection optic metrology method and apparatus
Grant 6,360,012 - Kreuzer March 19, 2 | 2002-03-19 |
Optical reduction system with control of illumination polarization
App 20020027719 - Kreuzer, Justin L. | 2002-03-07 |
Optical reduction system with elimination of reticle diffraction induced bias
App 20020027718 - Kreuzer, Justin L. | 2002-03-07 |
Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle
Grant 5,559,601 - Gallatin , et al. September 24, 1 | 1996-09-24 |
Synthetic imaging technique
Grant 4,913,524 - Kreuzer April 3, 1 | 1990-04-03 |
Method and apparatus for aligning an opaque mask with an integrated circuit wafer
Grant 4,335,313 - Kreuzer , et al. June 15, 1 | 1982-06-15 |
Comparing Position And Configuration Of An Object With A Standard
Grant 3,631,711 - Kreuzer January 4, 1 | 1972-01-04 |
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