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name:-0.010772943496704
name:-0.0067558288574219
name:-0.0011420249938965
Kramer; Jens Patent Filings

Kramer; Jens

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kramer; Jens.The latest application filed is for "wafer processing apparatuses and methods of operating the same".

Company Profile
0.7.9
  • Kramer; Jens - Dresden DE
  • Kramer; Jens - Oelde DE
  • Kramer; Jens - Langenargen DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Chemical mechanical polishing apparatus
Grant 10,322,493 - Kramer
2019-06-18
Wafer processing apparatuses and methods of operating the same
Grant 9,685,342 - Kramer , et al. June 20, 2
2017-06-20
Wafer Processing Apparatuses And Methods Of Operating The Same
App 20160172255 - Kramer; Jens ;   et al.
2016-06-16
Chemical Mechanical Polishing Method And Apparatus
App 20160158912 - KRAMER; Jens
2016-06-09
Chemical mechanical polishing method and apparatus
Grant 9,312,142 - Kramer April 12, 2
2016-04-12
Chemical Mechanical Polishing Method And Apparatus
App 20150357199 - KRAMER; Jens
2015-12-10
Method for Reprocessing an Emulsion Formed During Hydrometallurgical Recovery of a Metal
App 20150152518 - Horbach; Ulrich ;   et al.
2015-06-04
Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor
Grant 7,198,542 - Kramer , et al. April 3, 2
2007-04-03
Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
Grant 7,150,675 - Kramer , et al. December 19, 2
2006-12-19
Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
Grant 6,957,997 - Marxsen , et al. October 25, 2
2005-10-25
Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor
App 20050142987 - Kramer, Jens ;   et al.
2005-06-30
Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
App 20050070209 - Marxsen, Gerd ;   et al.
2005-03-31
Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
App 20040242122 - Kramer, Jens ;   et al.
2004-12-02
Retaining ring having reduced wear and contamination rate for a polishing head of a CMP tool
App 20040123951 - Kramer, Jens ;   et al.
2004-07-01
Electrodynamic drive system
Grant 6,719,655 - Kramer April 13, 2
2004-04-13
Electrodynamic drive system
App 20030078127 - Kramer, Jens
2003-04-24

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