KOYAMA; Yoshihiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for KOYAMA; Yoshihiro.The latest application filed is for "liquid metal ion source and focused ion beam apparatus".

Company Profile

1.21.17

KOYAMA; Yoshihiro - Tokyo JP
Koyama; Yoshihiro - Yokohama JP
Koyama; Yoshihiro - Yokohama-shi JP
Koyama; Yoshihiro - Chiba JP
Koyama; Yoshihiro - Chiba-shi JP
Koyama; Yoshihiro - Kyoto JP
Koyama; Yoshihiro - Kanagawa JP
Koyama; Yoshihiro - Takatsuki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Liquid Metal Ion Source And Focused Ion Beam Apparatus App 20210090842 - KOYAMA; Yoshihiro ; et al.	2021-03-25
Inkjet apparatus Grant 10,016,982 - Kuronuma , et al. July 10, 2	2018-07-10
Inkjet Apparatus App 20170087862 - Kuronuma; Daigo ; et al.	2017-03-30
Charged particle beam apparatus, thin film forming method, defect correction method and device forming method Grant 9,257,273 - Koyama , et al. February 9, 2	2016-02-09
Focused ion beam apparatus Grant 8,822,945 - Nishinaka , et al. September 2, 2	2014-09-02
Charged Particle Beam Apparatus, Thin Film Forming Method, Defect Correction Method And Device Forming Method App 20130224889 - Koyama; Yoshihiro ; et al.	2013-08-29
Focused ion beam apparatus Grant 8,513,602 - Ogawa , et al. August 20, 2	2013-08-20
Ink-jet Recording Apparatus App 20130083144 - Hokazono; Yutaka ; et al.	2013-04-04
Focused ion beam apparatus Grant 8,389,953 - Ogawa , et al. March 5, 2	2013-03-05
Ink-jet recording apparatus Grant 8,336,985 - Hokazono , et al. December 25, 2	2012-12-25
Printer Grant 8,287,119 - Yamaguchi , et al. October 16, 2	2012-10-16
Focused ion beam apparatus App 20110233401 - Nishinaka; Kenichi ; et al.	2011-09-29
Focused ion beam apparatus App 20110204252 - Ogawa; Takashi ; et al.	2011-08-25
Focused Ion Beam Apparatus App 20100219339 - Ogawa; Takashi ; et al.	2010-09-02
Ink-jet Recording Apparatus App 20100214346 - Hokazono; Yutaka ; et al.	2010-08-26
Printer App 20100214343 - Yamaguchi; Toshiaki ; et al.	2010-08-26
Substrate processing apparatus and substrate processing method Grant 7,396,199 - Koyama , et al. July 8, 2	2008-07-08
Plating Apparatus, Cartridge And Copper Dissolution Tank For Use In The Plating Apparatus, And Plating Method App 20070235341 - Mizohata; Yasuhiro ; et al.	2007-10-11
Plating apparatus, cartridge and copper dissolution tank for use in the plating apparatus, and plating method Grant 7,279,079 - Mizohata , et al. October 9, 2	2007-10-09
Liquid discharge method and apparatus and display device panel manufacturing method and apparatus Grant 7,111,755 - Koyama , et al. September 26, 2	2006-09-26
Thermal processing apparatus and thermal processing method App 20050149222 - Kobayashi, Toshiyuki ; et al.	2005-07-07
Method for repairing a phase shift mask and a focused ion beam apparatus for carrying out method Grant 6,891,171 - Hagiwara , et al. May 10, 2	2005-05-10
Thermal processing apparatus Grant 6,868,302 - Kobayashi , et al. March 15, 2	2005-03-15
Plating apparatus, cartridge and copper dissolution tank for use in the plating apparatus, and plating method App 20040069647 - Mizohata, Yasuhiro ; et al.	2004-04-15
Liquid discharge method and apparatus and display device panel manufacturing method and apparatus App 20040023567 - Koyama, Yoshihiro ; et al.	2004-02-05
Thermal processing apparatus and thermal processing method App 20030186563 - Kobayashi, Toshiyuki ; et al.	2003-10-02
Substrate processing apparatus and substrate processing method App 20030123971 - Koyama, Yoshihiro ; et al.	2003-07-03
Focused ion beam apparatus having a gas injector in which one of a plurality of nozzles can be selectively driven for elevation Grant 6,576,913 - Koyama June 10, 2	2003-06-10
Gas injector in which one of a plurality of nozzles can be selectively driven for elevation App 20020171050 - Koyama, Yoshihiro	2002-11-21
Focused ion beam processing apparatus Grant 6,365,905 - Koyama , et al. April 2, 2	2002-04-02
Focused ion beam apparatus Grant 6,348,689 - Koyama February 19, 2	2002-02-19
Ion beam working apparatus Grant 6,118,122 - Koyama , et al. September 12, 2	2000-09-12
Probing apparatus for measuring electrical characteristics of semiconductor device formed on wafer Grant 4,746,857 - Sakai , et al. May 24, 1	1988-05-24

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