Koyama; Kiyomi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Koyama; Kiyomi.The latest application filed is for "lsi mask manufacturing system, lsi mask manufacturing method and lsi mask manufacturing program".

Company Profile

0.11.1

Koyama; Kiyomi - Tokyo JP
Koyama; Kiyomi - Yokohama JP
Koyama; Kiyomi - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program Grant 7,047,094 - Koyama May 16, 2	2006-05-16
LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program App 20030188289 - Koyama, Kiyomi	2003-10-02
Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region Grant 6,304,024 - Uda , et al. October 16, 2	2001-10-16
Optical proximity correction system Grant 6,077,310 - Yamamoto , et al. June 20, 2	2000-06-20
Method for generating exposure data for lithographic apparatus Grant 6,047,116 - Murakami , et al. April 4, 2	2000-04-04
Optical proximity correction method Grant 5,879,844 - Yamamoto , et al. March 9, 1	1999-03-09
Method and a system for designing a photomask for use in manufacture of a semiconductor device Grant 5,795,683 - Uno , et al. August 18, 1	1998-08-18
Apparatus for designing photomasks Grant 5,761,075 - Oi , et al. June 2, 1	1998-06-02
Method for designing phase-shifting masks with automatization capability Grant 5,538,815 - Oi , et al. July 23, 1	1996-07-23
Charged-beam exposure system Grant 4,914,304 - Koyama April 3, 1	1990-04-03
Electron-beam lithographic apparatus Grant 4,538,232 - Koyama August 27, 1	1985-08-27
Electron beam pattern generation system Grant 4,531,191 - Koyama July 23, 1	1985-07-23

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