Koveshnikov; Sergei V

Patent Applications and Registrations

Patent applications and USPTO patent grants for Koveshnikov; Sergei V.The latest application filed is for "building stacked hollow channels for a three dimensional circuit device".

Company Profile

0.13.18

Koveshnikov; Sergei V - Boise ID
Koveshnikov; Sergei V. - Boise ID
Koveshnikov; Sergei V. - Hillsboro OR
Koveshnikov; Sergei V. - Vancouver WA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Building stacked hollow channels for a three dimensional circuit device Grant 11,018,149 - Lu , et al. May 25, 2	2021-05-25
Building Stacked Hollow Channels For A Three Dimensional Circuit Device App 20150279855 - Lu; Zhenyu ; et al.	2015-10-01
Optical coatings Grant 7,687,225 - Koveshnikov , et al. March 30, 2	2010-03-30
Silicon based optically degraded arc for lithographic patterning Grant 7,507,521 - Flanigan , et al. March 24, 2	2009-03-24
Optical coatings App 20060073424 - Koveshnikov; Sergei V. ; et al.	2006-04-06
Silicon based optically degraded arc for lithographic patterning App 20060029879 - Flanigan; Kyle Y. ; et al.	2006-02-09
Method of determining nitrogen concentration within a wafer Grant 6,896,727 - Koveshnikov May 24, 2	2005-05-24
Method of producing an SOI wafer Grant 6,794,227 - Koveshnikov September 21, 2	2004-09-21
Systems, methods and computer program products for determining contaminant concentrations in semiconductor materials App 20040010394 - Koveshnikov, Sergei V.	2004-01-15
High resistivity silicon wafer having electrically inactive dopant and method of producing same Grant 6,673,147 - Kononchuk , et al. January 6, 2	2004-01-06
Method of producing an SOI wafer App 20040002200 - Koveshnikov, Sergei V.	2004-01-01
Method of determining nitrogen concentration within a wafer App 20040000267 - Koveshnikov, Sergei V.	2004-01-01
High resistivity silicon wafer produced by a controlled pull rate czochralski method Grant 6,669,775 - Kononchuk , et al. December 30, 2	2003-12-30
Method of producing a high resistivity silicon wafer utilizing heat treatment that occurs during device fabrication Grant 6,669,777 - Kononchuk , et al. December 30, 2	2003-12-30
Double side polished wafers having external gettering sites, and method of producing same App 20030224603 - Beauchaine, David A. ; et al.	2003-12-04
Double side polished wafers having external gettering sites, and method of producing same App 20030224135 - Beauchaine, David A. ; et al.	2003-12-04
Method for evaluating impurity concentrations in epitaxial susceptors Grant 6,649,427 - Koveshnikov , et al. November 18, 2	2003-11-18
Method for evaluating impurity concentrations in epitaxial reagent gases Grant 6,632,688 - Koveshnikov October 14, 2	2003-10-14
Method for evaluating impurity concentrations in unpolished wafers grown by the Czochralski method Grant 6,630,363 - Koveshnikov , et al. October 7, 2	2003-10-07
Method for evaluating impurity concentrations in semiconductor substrates Grant 6,620,632 - Koveshnikov , et al. September 16, 2	2003-09-16
Method For Evaluating Impurity Concentrations In Semiconductor Substrates App 20030138979 - Koveshnikov, Sergei V. ; et al.	2003-07-24
High resistivity silicon wafer having electrically inactive dopant and method of producing same App 20030106482 - Kononchuk, Oleg V. ; et al.	2003-06-12
High resistivity silicon wafer produced by a controlled pull rate czochralski method App 20030106481 - Kononchuk, Oleg V. ; et al.	2003-06-12
High Resistivity Silicon Wafer And Method Of Producing Same Using The Magnetic Field Czochralski Method App 20030106485 - Kononchuk, Oleg V. ; et al.	2003-06-12
Method of producing a high resistivity silicon wafer utilizing heat treatment that occurs during device fabrication App 20030106486 - Kononchuk, Oleg V. ; et al.	2003-06-12
High Resistivity Silicon Wafer With Thick Epitaxial Layer And Method Of Producing Same App 20030109115 - Kononchuk, Oleg V. ; et al.	2003-06-12
Double side polished wafers having external gettering sites, and method of producing same Grant 6,576,501 - Beauchaine , et al. June 10, 2	2003-06-10
Method for evaluating impurity concentrations in unpolished wafers grown by the Czochralski method App 20020098601 - Koveshnikov, Sergei V. ; et al.	2002-07-25
Method for evaluating impurity concentrations in epitaxial reagent gases App 20020076839 - Koveshnikov, Sergei V.	2002-06-20
Method for evaluating impurity concentrations in epitaxial susceptors App 20020052095 - Koveshnikov, Sergei V. ; et al.	2002-05-02
Method for evaluating impurity concentrations in heat treatment furnaces App 20020048908 - Koveshnikov, Sergei V. ; et al.	2002-04-25

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