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Patent applications and USPTO patent grants for Kovall; George A..The latest application filed is for "dynamically controllable reduction of vertical contact diameter through adjustment of etch mask stack for dielectric etch".
Patent | Date |
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Dynamically controllable reduction of vertical contact diameter through adjustment of etch mask stack for dielectric etch Grant 7,297,628 - Chao , et al. November 20, 2 | 2007-11-20 |
Dynamically controllable reduction of vertical contact diameter through adjustment of etch mask stack for dielectric etch App 20050106882 - Chao, Chunyuan ;   et al. | 2005-05-19 |
Methods of reducing or removing micromasking residue prior to metal etch using oxide hardmask App 20050048788 - Tang, Woody K. Sattayapiwat ;   et al. | 2005-03-03 |
Method for etching a titanium-containing layer prior to etching an aluminum layer in a metal stack App 20040192059 - Sattayapiwat Tang, Woody K. ;   et al. | 2004-09-30 |
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