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Patent applications and USPTO patent grants for KOUMURA; Kazuhiko.The latest application filed is for "photosensitive resin composition, method for forming resist pattern, and method for producing plated formed product".
Patent | Date |
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Photosensitive Resin Composition, Method For Forming Resist Pattern, And Method For Producing Plated Formed Product App 20220146932 - NODA; Hiroto ;   et al. | 2022-05-12 |
Pattern-forming method and resist underlayer film-forming composition Grant 9,607,849 - Koumura , et al. March 28, 2 | 2017-03-28 |
Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method Grant 9,091,922 - Nakafuji , et al. July 28, 2 | 2015-07-28 |
Pattern-forming Method And Resist Underlayer Film-forming Composition App 20140220783 - KOUMURA; Kazuhiko ;   et al. | 2014-08-07 |
Resin Composition, Resist Underlayer Film, Resist Underlayer Film-forming Method And Pattern-forming Method App 20140014620 - NAKAFUJI; Shin-ya ;   et al. | 2014-01-16 |
Resin Composition, Resist Underlayer Film, Resist Underlayer Film-forming Method And Pattern-forming Method App 20130153535 - NAKAFUJI; Shin-ya ;   et al. | 2013-06-20 |
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