Kotecki; David Edward
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kotecki; David Edward.The latest application filed is for "method for fabricating a dual-diameter electrical conductor".
- Kotecki; David Edward - Hopewell Junction NY
- Kotecki; David Edward - Orono ME
- Kotecki; David Edward - Hopewell Juction NY
| Patent | Date |
|---|---|
| Method for fabricating a dual-diameter electrical conductor Grant 6,727,174 - Kotecki , et al. April 27, 2 | 2004-04-27 |
| Method for removal of hard mask used to define noble metal electrode Grant 6,420,272 - Shen , et al. July 16, 2 | 2002-07-16 |
| Capacitor formed with Pt electrodes having a 3D cup-like shape with roughened inner and outer surfaces Grant 6,323,127 - Andricacos , et al. November 27, 2 | 2001-11-27 |
| Filling of high aspect ratio trench isolation Grant 6,136,664 - Economikos , et al. October 24, 2 | 2000-10-24 |
| Deep trench with enhanced sidewall surface area Grant 6,015,985 - Ho , et al. January 18, 2 | 2000-01-18 |
| Compound electrode stack capacitor Grant 5,998,250 - Andricacos , et al. December 7, 1 | 1999-12-07 |
| Isolated sidewall capacitor Grant 5,914,851 - Saenger , et al. June 22, 1 | 1999-06-22 |
| Compound electrode stack capacitor Grant 5,825,609 - Andricacos , et al. October 20, 1 | 1998-10-20 |
| Plating of noble metal electrodes for DRAM and FRAM Grant 5,789,320 - Andricacos , et al. August 4, 1 | 1998-08-04 |
| Sidewall capacitor with L-shaped dielectric Grant 5,712,759 - Saenger , et al. January 27, 1 | 1998-01-27 |
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