| Patent | Date |
|---|
Polyimide and/or polyamideimide porous body and method for manufacturing same, method for separation and/or adsorption, separation material, adsorption material, filter media, laminate, and filter device
Grant 10,576,432 - Sugawara , et al. | 2020-03-03 |
Method for purifying liquid, method for producing chemical solution or cleaning solution, filter medium, and filter device
Grant 10,576,433 - Takashima , et al. | 2020-03-03 |
Method For Purifying Liquid, Method For Producing Chemical Solution Or Cleaning Solution, Filter Medium, And Filter Device
App 20180028983 - TAKASHIMA; Hayato ; et al. | 2018-02-01 |
Polyimide And/or Polyamideimide Porous Body And Method For Manufacturing Same, Method For Separation And/or Adsorption, Separation Material, Adsorption Material, Filter Media, Laminate, And Filter Device
App 20180021739 - SUGAWARA; Tsukasa ; et al. | 2018-01-25 |
Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
Grant 9,291,905 - Kumagai , et al. March 22, 2 | 2016-03-22 |
Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate
Grant 9,244,358 - Koshiyama , et al. January 26, 2 | 2016-01-26 |
Developing Solution For Photolithography, Method For Forming Resist Pattern, And Method And Apparatus For Producing Developing Solution For Photolithography
App 20150160560 - Kumagai; Tomoya ; et al. | 2015-06-11 |
Surface treatment agent and surface treatment method
Grant 8,623,131 - Yoshida , et al. January 7, 2 | 2014-01-07 |
Composition for antireflection film formation and method for resist pattern formation using the composition
Grant 8,455,182 - Sawano , et al. June 4, 2 | 2013-06-04 |
Surface treatment agent and surface treatment method
Grant 8,410,296 - Yoshida , et al. April 2, 2 | 2013-04-02 |
Cleaning method for a process of liquid immersion lithography
Grant 8,409,360 - Koshiyama , et al. April 2, 2 | 2013-04-02 |
Detergent for lithography and method of forming resist pattern with the same
Grant 8,367,312 - Sawada , et al. February 5, 2 | 2013-02-05 |
Anti-reflection film forming material, and method for forming resist pattern using the same
Grant 8,216,775 - Shirai , et al. July 10, 2 | 2012-07-10 |
Chemically Amplified Positive-type Photoresist Composition For Thick Film, And Method For Producing Thick Film Resist Pattern
App 20120141940 - Shimizu; Takahiro ; et al. | 2012-06-07 |
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same
Grant 8,158,328 - Sawano , et al. April 17, 2 | 2012-04-17 |
Method for forming pattern, and material for forming coating film
Grant 8,124,312 - Ishikawa , et al. February 28, 2 | 2012-02-28 |
Cleaning liquid for lithography and a cleaning method using it for photoexposure devices
Grant 8,058,220 - Koshiyama , et al. November 15, 2 | 2011-11-15 |
Surface Treatment Liquid, Surface Treatment Method, Hydrophobilization Method, And Hydrophobilized Substrate
App 20110195190 - Koshiyama; Jun ; et al. | 2011-08-11 |
Developing Solution For Photolithography, Method For Forming Resist Pattern, And Method And Apparatus For Producing Developing Solution For Photolithography
App 20110159447 - KUMAGAI; Tomoya ; et al. | 2011-06-30 |
Surface Treatment Agent And Surface Treatment Method
App 20110118494 - YOSHIDA; Masaaki ; et al. | 2011-05-19 |
Surface Treatment Agent And Surface Treatment Method
App 20110073011 - YOSHIDA; Masaaki ; et al. | 2011-03-31 |
Cleaning liquid for lithography and a cleaning method using it for photoexposure devices
App 20110061678 - Koshiyama; Jun ; et al. | 2011-03-17 |
Cleaning liquid and a cleaning method
App 20110056511 - Koshiyama; Jun ; et al. | 2011-03-10 |
Surface Treatment Agent And Surface Treatment Method
App 20110054184 - Yoshida; Masaaki ; et al. | 2011-03-03 |
Lithographic rinse solution and method for forming patterned resist layer using the same
Grant 7,897,325 - Sawada , et al. March 1, 2 | 2011-03-01 |
Cleaning liquid for lithography and cleaning method using same
Grant 7,884,062 - Koshiyama , et al. February 8, 2 | 2011-02-08 |
Resist pattern forming method and composite rinse agent
Grant 7,811,748 - Koshiyama , et al. October 12, 2 | 2010-10-12 |
Fine Pattern Forming Method And Coat Film Forming Material
App 20100255429 - Ishikawa; Kiyoshi ; et al. | 2010-10-07 |
Cleaning Liquid For Lithography And Method For Forming A Resist Pattern Using The Same
App 20100248164 - KUMAGAI; Tomoya ; et al. | 2010-09-30 |
Cleaning liquid for lithography and method for resist pattern formation
Grant 7,795,197 - Sawada , et al. September 14, 2 | 2010-09-14 |
Rinsing fluid for lithography
Grant 7,741,260 - Koshiyama , et al. June 22, 2 | 2010-06-22 |
Composition For Antireflection Film Formation And Method Of Forming Resist Pattern With The Same
App 20100104978 - Sawano; Atsushi ; et al. | 2010-04-29 |
Composition For Antireflection Film Formation And Method For Resist Pattern Formation Using The Composition
App 20100104987 - Sawano; Atsushi ; et al. | 2010-04-29 |
Method For Forming Pattern, And Material For Forming Coating Film
App 20100035177 - Ishikawa; Kiyoshi ; et al. | 2010-02-11 |
Anti-reflection film forming material, and method for forming resist pattern using the same
App 20090253077 - Shirai; Yuriko ; et al. | 2009-10-08 |
Cleaning liquid for lithography and method of cleaning therewith
Grant 7,576,046 - Koshiyama , et al. August 18, 2 | 2009-08-18 |
Cleaning Liquid For Lithography and Cleaning Method Using Same
App 20090029893 - Koshiyama; Jun ; et al. | 2009-01-29 |
Detergent For Lithography And Method Of Forming Resist Pattern With The Same
App 20090004608 - Sawada; Yoshihiro ; et al. | 2009-01-01 |
Cleaning Liquid for Lithography and Method of Cleaning Therewith
App 20080227678 - Koshiyama; Jun ; et al. | 2008-09-18 |
Rinsing Liquid for Lithography and Method for Resist Pattern Formation
App 20080193876 - Sawada; Yoshihiro ; et al. | 2008-08-14 |
Cleaning Liquid For Lithography And Method For Resist Pattern Formation
App 20080096141 - Sawada; Yoshihiro ; et al. | 2008-04-24 |
Rinsing Fluid for Lithography
App 20080026975 - Koshiyama; Jun ; et al. | 2008-01-31 |
Developing Solution Composition for Lithography and Method for Resist Pattern Formation
App 20070292808 - Koshiyama; Jun ; et al. | 2007-12-20 |
Resist Pattern Forming Method and Composite Rinse Agent
App 20070218399 - Koshiyama; Jun ; et al. | 2007-09-20 |
Rinse Solution For Lithography
App 20070218412 - Koshiyama; Jun ; et al. | 2007-09-20 |
Material for forming protective film
Grant 7,179,399 - Koshiyama , et al. February 20, 2 | 2007-02-20 |
Lithographic rinse solution and method for forming patterned resist layer using the same
App 20060128581 - Sawada; Yoshihiro ; et al. | 2006-06-15 |
Base material for lithography
Grant 6,835,530 - Nakamura , et al. December 28, 2 | 2004-12-28 |
Base material for lithography
App 20040121260 - Nakamura, Etsuko ; et al. | 2004-06-24 |
Protective coating composition for dual damascene process
Grant 6,734,258 - Iguchi , et al. May 11, 2 | 2004-05-11 |
Material for forming protective film
App 20020182360 - Koshiyama, Jun ; et al. | 2002-12-05 |
Protective coating composition for dual damascene process
App 20020077426 - Iguchi, Etsuko ; et al. | 2002-06-20 |
| 