Koshimizu; Chishio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Koshimizu; Chishio.The latest application filed is for "apparatus for plasma processing and method of etching".

Company Profile

31.154.173

Koshimizu; Chishio - Yamanashi JP
Koshimizu; Chishio - Miyagi JP
KOSHIMIZU; Chishio - Kurokawa-gun Miyagi
KOSHIMIZU; Chishio - Nirasaki-shi JP
Koshimizu; Chishio - Nirasaki JP
KOSHIMIZU; Chishio - Nirasaki City JP
Koshimizu; Chishio - Tokyo JP
Koshimizu; Chishio - Kitakoma-gun JP
Koshimizu; Chishio - Yamanashi-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method Grant 11,446,714 - Dobashi , et al. September 20, 2	2022-09-20
Upper electrode and plasma processing apparatus Grant 11,443,924 - Tamamushi , et al. September 13, 2	2022-09-13
Plasma processing apparatus Grant 11,443,920 - Yamawaku , et al. September 13, 2	2022-09-13
Plasma processing system and substrate processing method Grant 11,417,502 - Koshimizu August 16, 2	2022-08-16
Apparatus For Plasma Processing And Method Of Etching App 20220238313 - KOSHIMIZU; Chishio	2022-07-28
Control Method And Plasma Processing Apparatus App 20220216036 - KOSHIMIZU; Chishio ; et al.	2022-07-07
Apparatus for plasma processing and method of etching Grant 11,361,947 - Koshimizu June 14, 2	2022-06-14
Plasma Processing Method And Plasma Processing Apparatus App 20220159820 - DOKAN; Takashi ; et al.	2022-05-19
Plasma processing method and plasma processing apparatus Grant 11,337,297 - Dokan , et al. May 17, 2	2022-05-17
Plasma Processing Apparatus App 20220130646 - KOSHIMIZU; Chishio	2022-04-28
Plasma processing apparatus and plasma processing method Grant 11,315,765 - Yamawaku , et al. April 26, 2	2022-04-26
Plasma Processing Apparatus And Plasma Processing Method App 20220108878 - KOSHIMIZU; Chishio	2022-04-07
Plasma Processing Apparatus And Plasma Processing Method App 20220084787 - KOSHIMIZU; Chishio ; et al.	2022-03-17
Plasma Processing Apparatus And Control Method App 20220076921 - HISATOMI; Ryuji ; et al.	2022-03-10
Plasma Processing Apparatus And Plasma Processing Method App 20220037129 - KOSHIMIZU; Chishio	2022-02-03
Plasma Processing Apparatus And Plasma Processing Method App 20220020567 - KOSHIMIZU; Chishio	2022-01-20
Plasma Processing Apparatus App 20210407772 - KOSHIMIZU; Chishio	2021-12-30
Plasma processing apparatus and control method Grant 11,201,034 - Hisatomi , et al. December 14, 2	2021-12-14
Control Method And Plasma Processing Apparatus App 20210327681 - KOSHIMIZU; Chishio ; et al.	2021-10-21
Plasma Processing Apparatus App 20210296093 - KOSHIMIZU; Chishio	2021-09-23
Inspection Method, Inspection Apparatus, And Plasma Processing Apparatus App 20210296091 - KOSHIMIZU; Chishio	2021-09-23
Detecting Method And Plasma Processing Apparatus App 20210296092 - KOSHIMIZU; Chishio	2021-09-23
Plasma Processing Apparatus, Semiconductive Member, And Semiconductive Ring App 20210280397 - KUROSAWA; Yoichi ; et al.	2021-09-09
Cleaning Method And Plasma Processing Apparatus App 20210272782 - KOSHIMIZU; Chishio	2021-09-02
Plasma Processing Apparatus And Plasma Processing Method App 20210272775 - KOSHIMIZU; Chishio	2021-09-02
Plasma Processing System And Substrate Processing Method App 20210233745 - KOSHIMIZU; Chishio	2021-07-29
Plasma Processing Apparatus And Plasma Processing Method App 20210183622 - KOSHIMIZU; Chishio ; et al.	2021-06-17
Plasma Processing Apparatus And Measurement Method App 20210166920 - KOSHIMIZU; Chishio ; et al.	2021-06-03
Substrate Support And Substrate Processing Apparatus App 20210159057 - KOSHIMIZU; Chishio	2021-05-27
Plasma processing apparatus, impedance matching method, and plasma processing method Grant 11,017,985 - Koshimizu , et al. May 25, 2	2021-05-25
Plasma Processing Apparatus And Method App 20210082669 - KOSHIISHI; Akira ; et al.	2021-03-18
Substrate Support And Substrate Processing Apparatus App 20210074524 - KOSHIMIZU; Chishio	2021-03-11
Plasma processing apparatus and plasma processing method Grant 10,937,631 - Yamawaku , et al. March 2, 2	2021-03-02
Plasma Processing Method And Plasma Processing Apparatus App 20210051792 - DOKAN; Takashi ; et al.	2021-02-18
Control Method And Plasma Processing Apparatus App 20210043472 - KOSHIMIZU; Chishio ; et al.	2021-02-11
Plasma Processing Apparatus App 20210027980 - KOSHIMIZU; Chishio ; et al.	2021-01-28
Plasma Processing Method And Plasma Processing Apparatus App 20210020407 - KOSHIMIZU; Chishio	2021-01-21
Control Method And Plasma Processing Apparatus App 20200411286 - KOSHIMIZU; Chishio ; et al.	2020-12-31
Plasma Processing Method And Plasma Processing Apparatus App 20200381215 - KOSHIMIZU; Chishio ; et al.	2020-12-03
Plasma processing apparatus and method Grant 10,854,431 - Koshiishi , et al. December 1, 2	2020-12-01
Substrate Processing Method App 20200373131 - Yamawaku; Jun ; et al.	2020-11-26
Plasma processing apparatus Grant 10,847,341 - Koshimizu , et al. November 24, 2	2020-11-24
Plasma Processing Apparatus And Plasma Processing Method App 20200357606 - YAMAZAWA; Yohei ; et al.	2020-11-12
Plasma processing apparatus and plasma processing method Grant 10,804,076 - Yamazawa , et al. October 13, 2	2020-10-13
Plasma processing apparatus Grant 10,804,072 - Koshimizu , et al. October 13, 2	2020-10-13
Substrate processing apparatus Grant 10,777,392 - Yamawaku , et al. Sept	2020-09-15
Plasma Processing Apparatus And Control Method App 20200273670 - KOSHIMIZU; Chishio ; et al.	2020-08-27
Upper Electrode And Plasma Processing Apparatus App 20200234930 - TAMAMUSHI; Gen ; et al.	2020-07-23
Plasma Processing Apparatus App 20200219701 - KOSHIMIZU; Chishio	2020-07-09
Apparatus For Plasma Processing And Method Of Etching App 20200219706 - KOSHIMIZU; Chishio	2020-07-09
Plasma Processing Apparatus And Control Method App 20200211823 - HISATOMI; Ryuji ; et al.	2020-07-02
Plasma Processing Apparatus, Impedance Matching Method, And Plasma Processing Method App 20200203129 - Koshimizu; Chishio ; et al.	2020-06-25
Plasma processing apparatus Grant 10,685,859 - Koshimizu , et al.	2020-06-16
Plasma Processing Apparatus And Etching Method App 20200185193 - KOSHIMIZU; Chishio	2020-06-11
Plasma processing apparatus and control method Grant 10,672,589 - Koshimizu , et al.	2020-06-02
Plasma Processing Apparatus App 20200144026 - YAMAWAKU; Jun ; et al.	2020-05-07
Plasma Processing Apparatus And Control Method App 20200118794 - KOSHIMIZU; Chishio ; et al.	2020-04-16
Plasma Processing Apparatus And Method App 20200111645 - KOSHIISHI; Akira ; et al.	2020-04-09
Plasma processing apparatus and method Grant 10,546,727 - Koshiishi , et al. Ja	2020-01-28
Capacitive coupling plasma processing apparatus and method for using the same Grant 10,529,596 - Matsumoto , et al. J	2020-01-07
Plasma processing apparatus and method Grant 10,529,539 - Koshiishi , et al. J	2020-01-07
Plasma Processing Apparatus And Plasma Processing Method App 20190311888 - Koshimizu; Chishio	2019-10-10
Plasma Processing Apparatus And Plasma Processing Method App 20190221405 - YAMAWAKU; Jun ; et al.	2019-07-18
Plasma processing apparatus Grant 10,325,758 - Yamawaku , et al.	2019-06-18
Plasma processing apparatus and plasma processing method Grant 10,283,328 - Yamawaku , et al.	2019-05-07
Plasma Processing Apparatus And Plasma Processing Method App 20190115188 - YAMAWAKU; Jun ; et al.	2019-04-18
Plasma Processing Apparatus And Plasma Processing Method App 20190108975 - YAMAWAKU; Jun ; et al.	2019-04-11
Plasma processing apparatus and plasma processing method Grant 10,211,031 - Koshimizu , et al. Feb	2019-02-19
Plasma Processing Apparatus And Plasma Processing Method App 20180308662 - YAMAZAWA; Yohei ; et al.	2018-10-25
Plasma Processing Apparatus App 20180294137 - KOSHIMIZU; Chishio ; et al.	2018-10-11
Temperature Measuring Method, Substrate Processing System And Component To Be Provided In Substrate Processing Apparatus Of The Substrate Processing System App 20180231369 - KOSHIMIZU; Chishio ; et al.	2018-08-16
Substrate Processing Apparatus App 20180218884 - Yamawaku; Jun ; et al.	2018-08-02
Plasma processing apparatus and plasma processing method Grant 9,997,332 - Yamazawa , et al. June 12, 2	2018-06-12
Temperature measuring method, substrate processing system and component to be provided in substrate processing apparatus of the substrate processing system Grant 9,952,032 - Koshimizu , et al. April 24, 2	2018-04-24
Plasma processing apparatus Grant 9,941,097 - Yamazawa , et al. April 10, 2	2018-04-10
Plasma Processing Apparatus App 20180061681 - KOSHIMIZU; Chishio ; et al.	2018-03-01
Plasma processing apparatus Grant 9,899,191 - Yamazawa , et al. February 20, 2	2018-02-20
Processing Apparatus And Processing Method, And Gas Cluster Generating Apparatus And Gas Cluster Generating Method App 20180015510 - Dobashi; Kazuya ; et al.	2018-01-18
Capacitive Coupling Plasma Processing Apparatus And Method For Using The Same App 20170162406 - MATSUMOTO; NAOKI ; et al.	2017-06-08
Capacitive coupling plasma processing apparatus and method for using the same Grant 9,607,866 - Matsumoto , et al. March 28, 2	2017-03-28
Film formation device, substrate processing device, and film formation method Grant 9,583,312 - Yamawaku , et al. February 28, 2	2017-02-28
Plasma Processing Apparatus And Method App 20170032936 - KOSHIISHI; Akira ; et al.	2017-02-02
Plasma Processing Apparatus And Method App 20160379805 - KOSHIISHI; Akira ; et al.	2016-12-29
Plasma Processing Apparatus App 20160379796 - KOSHIMIZU; Chishio ; et al.	2016-12-29
Plasma Processing Apparatus And Method App 20160358753 - KOSHIISHI; Akira ; et al.	2016-12-08
Temperature measurement apparatus and method Grant 9,500,537 - Abe , et al. November 22, 2	2016-11-22
Plasma processing apparatus and plasma processing method Grant 9,502,215 - Kato , et al. November 22, 2	2016-11-22
Plasma processing apparatus and method Grant 9,490,105 - Koshiishi , et al. November 8, 2	2016-11-08
Heat-flux measuring method, substrate processing system, and heat-flux measuring member Grant 9,459,159 - Koshimizu , et al. October 4, 2	2016-10-04
Plasma Processing Apparatus And Plasma Processing Method App 20160203951 - YAMAZAWA; Yohei ; et al.	2016-07-14
Temperature Measurement Apparatus And Method App 20160195436 - ABE; Jun ; et al.	2016-07-07
Plasma Processing Apparatus And Plasma Processing Method App 20160172160 - YAMAZAWA; Yohei ; et al.	2016-06-16
Substrate processing apparatus Grant 9,349,618 - Yamawaku , et al. May 24, 2	2016-05-24
Plasma Processing Apparatus App 20160126065 - YAMAWAKU; Jun ; et al.	2016-05-05
Plasma Processing Apparatus And Plasma Processing Method App 20160126064 - YAMAWAKU; Jun ; et al.	2016-05-05
Plasma processing apparatus and plasma processing method Grant 9,313,872 - Yamazawa , et al. April 12, 2	2016-04-12
Temperature measurement apparatus and method Grant 9,304,050 - Abe , et al. April 5, 2	2016-04-05
Plasma processing apparatus and plasma processing method Grant 9,253,867 - Yamazawa , et al. February 2, 2	2016-02-02
Plasma processing apparatus Grant 9,236,226 - Yamawaku , et al. January 12, 2	2016-01-12
Substrate temperature control method and plasma processing apparatus Grant 9,207,689 - Koshimizu December 8, 2	2015-12-08
Plasma processing apparatus, plasma generating apparatus, antenna structure and plasma generating method Grant 9,167,680 - Yamazawa , et al. October 20, 2	2015-10-20
Apparatus and method for measuring thickness and temperature and substrate processing system Grant 9,163,931 - Matsudo , et al. October 20, 2	2015-10-20
Shower plate and substrate processing apparatus Grant 9,136,097 - Koshimizu , et al. September 15, 2	2015-09-15
Film deposition apparatus, substrate processing apparatus and film deposition method Grant 9,111,747 - Yamawaku , et al. August 18, 2	2015-08-18
Heat-flux Measuring Method, Substrate Processing System, And Heat-flux Measuring Member App 20150185092 - KOSHIMIZU; Chishio ; et al.	2015-07-02
Apparatus And Method For Measuring Thickness And Temperature And Substrate Processing System App 20150176974 - MATSUDO; Tatsuo ; et al.	2015-06-25
Plasma Processing Apparatus And Plasma Processing Method App 20150179407 - KOSHIMIZU; Chishio ; et al.	2015-06-25
Plasma Processing Apparatus And Plasma Processing Method App 20150170882 - YAMAWAKU; Jun ; et al.	2015-06-18
Temperature Measuring Method, Substrate Processing System And Component To Be Provided In Substrate Processing Apparatus Of The Substrate Processing System App 20150168231 - KOSHIMIZU; Chishio ; et al.	2015-06-18
Plasma Processing Apparatus And Plasma Processing Method App 20150132505 - KATO; Hitoshi ; et al.	2015-05-14
Method of measuring temperature of component in processing chamber of substrate processing apparatus Grant 9,028,139 - Yamawaku , et al. May 12, 2	2015-05-12
Temperature control system including sub-chiller Grant 9,019,505 - Yamawaku , et al. April 28, 2	2015-04-28
Plasma processing apparatus and plasma processing method Grant 8,894,806 - Koshimizu , et al. November 25, 2	2014-11-25
Plasma Processing Apparatus And Method App 20140326409 - KOSHIISHI; Akira ; et al.	2014-11-06
Focus ring heating method, plasma etching apparatus, and plasma etching method Grant 8,858,753 - Koshimizu , et al. October 14, 2	2014-10-14
Temperature Measuring Apparatus And Temperature Measuring Method App 20140286375 - ABE; Jun ; et al.	2014-09-25
Plasma processing apparatus having hollow electrode on periphery and plasma control method Grant 8,829,387 - Koshimizu , et al. September 9, 2	2014-09-09
Temperature measuring method, storage medium, and program Grant 8,825,434 - Koshimizu , et al. September 2, 2	2014-09-02
Method for heating part in processing chamber of semiconductor manufacturing apparatus and semiconductor manufacturing apparatus Grant 8,824,875 - Yamawaku , et al. September 2, 2	2014-09-02
Plasma Processing Apparatus App 20140216346 - YAMAZAWA; Yohei ; et al.	2014-08-07
Substrate Processing Apparatus And Method Of Depositing A Film App 20140220260 - Yamawaku; Jun ; et al.	2014-08-07
Plasma Processing Apparatus App 20140216345 - YAMAZAWA; Yohei ; et al.	2014-08-07
Plasma processing apparatus and method Grant 8,790,490 - Koshiishi , et al. July 29, 2	2014-07-29
Temperature measuring apparatus and temperature measuring method Grant 8,777,483 - Yamawaku , et al. July 15, 2	2014-07-15
Temperature measuring apparatus and temperature measuring method Grant 8,764,288 - Abe , et al. July 1, 2	2014-07-01
Film Formation Device, Substrate Processing Device, And Film Formation Method App 20140170859 - YAMAWAKU; Jun ; et al.	2014-06-19
Plasma processing apparatus, plasma processing method, and computer readable storage medium Grant 8,741,095 - Koshimizu June 3, 2	2014-06-03
Plasma processing apparatus and plasma processing method Grant 8,741,097 - Yamazawa , et al. June 3, 2	2014-06-03
Plasma Processing Apparatus And Method App 20140124139 - KOSHIISHI; Akira ; et al.	2014-05-08
Plasma processor Grant 8,689,733 - Koshimizu , et al. April 8, 2	2014-04-08
Plasma Processing Apparatus, Plasma Generating Apparatus, Antenna Structure And Plasma Generating Method App 20140062296 - YAMAZAWA; Yohei ; et al.	2014-03-06
Temperature Measurement Apparatus And Method App 20140056328 - ABE; Jun ; et al.	2014-02-27
Film Deposition Apparatus, Substrate Processing Apparatus And Film Deposition Method App 20130337635 - YAMAWAKU; Jun ; et al.	2013-12-19
Plasma processing apparatus and plasma processing method Grant 8,608,903 - Yamazawa , et al. December 17, 2	2013-12-17
Plasma processing apparatus and method Grant 8,603,293 - Koshiishi , et al. December 10, 2	2013-12-10
Method Of Measuring Temperature Of Component In Processing Chamber Of Substrate Processing Apparatus App 20130308681 - YAMAWAKU; Jun ; et al.	2013-11-21
Temperature measurement apparatus and method Grant 8,585,284 - Abe , et al. November 19, 2	2013-11-19
Focus Ring Heating Method, Plasma Etching Apparatus, And Plasma Etching Method App 20130299455 - KOSHIMIZU; Chishio ; et al.	2013-11-14
Temperature measuring apparatus and temperature measuring method Grant 8,573,837 - Matsudo , et al. November 5, 2	2013-11-05
Capacitive Coupling Plasma Processing Apparatus And Method For Using The Same App 20130284371 - MATSUMOTO; Naoki ; et al.	2013-10-31
Component in processing chamber of substrate processing apparatus and method of measuring temperature of the component Grant 8,523,428 - Yamawaku , et al. September 3, 2	2013-09-03
Plasma processing apparatus and plasma processing method Grant 8,513,563 - Matsumoto , et al. August 20, 2	2013-08-20
Capacitive coupling plasma processing apparatus and method for using the same Grant 8,506,753 - Matsumoto , et al. August 13, 2	2013-08-13
Focus ring heating method, plasma etching apparatus, and plasma etching method Grant 8,486,221 - Koshimizu , et al. July 16, 2	2013-07-16
Plasma processing apparatus and method Grant 8,431,035 - Iwata , et al. April 30, 2	2013-04-30
In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including same Grant 8,425,791 - Koshimizu , et al. April 23, 2	2013-04-23
Plasma processing apparatus and plasma processing method Grant 8,426,317 - Koshimizu April 23, 2	2013-04-23
Plasma processing apparatus and plasma processing method Grant 8,404,137 - Koshimizu , et al. March 26, 2	2013-03-26
Plasma Processing Apparatus App 20130008609 - KOSHIMIZU; Chishio ; et al.	2013-01-10
Plasma processing apparatus Grant 8,342,121 - Koshimizu January 1, 2	2013-01-01
Plasma processing apparatus and method of plasma distribution correction Grant 8,343,306 - Tanaka , et al. January 1, 2	2013-01-01
Plasma processing apparatus Grant 8,298,371 - Koshimizu , et al. October 30, 2	2012-10-30
Plasma processing apparatus Grant 8,293,068 - Koshimizu , et al. October 23, 2	2012-10-23
Plasma Processing Apparatus App 20120247954 - YAMAWAKU; Jun ; et al.	2012-10-04
Component In Processing Chamber Of Substrate Processing Apparatus And Method Of Measuring Temperature Of The Component App 20120251759 - YAMAWAKU; Jun ; et al.	2012-10-04
Temperature Measuring Apparatus And Temperature Measuring Method App 20120243572 - MATSUDO; Tatsuo ; et al.	2012-09-27
Plasma Processing Apparatus App 20120241092 - Yamawaku; Jun ; et al.	2012-09-27
Substrate Temperature Control Method And Plasma Processing Apparatus App 20120227955 - KOSHIMIZU; Chishio	2012-09-13
Temperature Measuring Apparatus And Temperature Measuring Method App 20120224603 - ABE; Jun ; et al.	2012-09-06
Plasma processing apparatus Grant 8,251,011 - Yamazawa , et al. August 28, 2	2012-08-28
Temperature Measurement Apparatus And Method App 20120207189 - Abe; Jun ; et al.	2012-08-16
Substrate Processing Apparatus App 20120175063 - YAMAWAKU; Jun ; et al.	2012-07-12
Focus Ring And Substrate Processing Apparatus Having Same App 20120176692 - Yamawaku; Jun ; et al.	2012-07-12
Plasma Processing Apparatus App 20120145186 - KOSHIMIZU; Chishio	2012-06-14
Plasma Processing Apparatus And Plasma Processing Method App 20120145679 - Matsumoto; Naoki ; et al.	2012-06-14
Plasma Processing Apparatus And Method App 20120145324 - Koshiishi; Akira ; et al.	2012-06-14
Temperature measuring apparatus and temperature measuring method Grant 8,182,142 - Abe , et al. May 22, 2	2012-05-22
Substrate processing method and substrate processing apparatus Grant 8,178,444 - Koshimizu , et al. May 15, 2	2012-05-15
Stage, substrate processing apparatus, plasma processing apparatus, control method for stage, control method for plasma processing apparatus, and storage media Grant 8,164,033 - Koshimizu , et al. April 24, 2	2012-04-24
Temperature Measuring Method, Storage Medium, And Program App 20120084045 - KOSHIMIZU; Chishio ; et al.	2012-04-05
Temperature Control System App 20120073781 - YAMAWAKU; Jun ; et al.	2012-03-29
Temperature measurement apparatus and method Grant 8,144,332 - Abe , et al. March 27, 2	2012-03-27
Plasma processing apparatus and method Grant 8,137,471 - Koshiishi , et al. March 20, 2	2012-03-20
Plasma processing apparatus and plasma processing method Grant 8,138,445 - Matsumoto , et al. March 20, 2	2012-03-20
Temperature Measuring Apparatus And Temperature Measuring Method App 20120063486 - YAMAWAKU; Jun ; et al.	2012-03-15
Physical State Measuring Apparatus And Physical State Measuring Method App 20120062870 - YAMAWAKU; Jun ; et al.	2012-03-15
Plasma processing apparatus, focus ring, and susceptor Grant 8,124,539 - Endoh , et al. February 28, 2	2012-02-28
Plasma Processing Apparatus And Plasma Control Method App 20120037597 - Koshimizu; Chishio ; et al.	2012-02-16
Plasma Processing Apparatus App 20120031560 - Koshimizu; Chishio	2012-02-09
Plasma Processing Apparatus And Method App 20110272097 - Koshiishi; Akira ; et al.	2011-11-10
Capacitive Coupling Plasma Processing Apparatus And Method For Using The Same App 20110259524 - MATSUMOTO; Naoki ; et al.	2011-10-27
Plasma processing apparatus and plasma processing method Grant 8,034,213 - Matsumoto , et al. October 11, 2	2011-10-11
Method For Measuring Wear Rate App 20110235056 - Matsudo; Tatsuo ; et al.	2011-09-29
Substrate Mounting Table App 20110235675 - Matsudo; Tatsuo ; et al.	2011-09-29
Plasma Processing Apparatus And Method App 20110214815 - Koshiishi; Akira ; et al.	2011-09-08
Method For Heating Part In Processing Chamber Of Semiconductor Manufacturing Apparatus And Semiconductor Manufacturing Apparatus App 20110211817 - Yamawaku; Jun ; et al.	2011-09-01
Stage, Substrate Processing Apparatus, Plasma Processing Apparatus, Control Method For Stage, Control Method For Plasma Processing Apparatus, And Storage Media App 20110207245 - KOSHIMIZU; Chishio ; et al.	2011-08-25
Plasma Processing Method App 20110198315 - KOSHIMIZU; Chishio ; et al.	2011-08-18
Capacitive coupling plasma processing apparatus and method for using the same Grant 7,993,489 - Matsumoto , et al. August 9, 2	2011-08-09
Plasma processing apparatus and method Grant 7,988,816 - Koshiishi , et al. August 2, 2	2011-08-02
Stage, substrate processing apparatus, plasma processing apparatus, control method for stage, control method for plasma processing apparatus, and storage media Grant 7,956,310 - Koshimizu , et al. June 7, 2	2011-06-07
Temperature measuring apparatus and temperature measuring method Grant 7,952,717 - Abe , et al. May 31, 2	2011-05-31
Plasma processing apparatus and method Grant 7,951,262 - Koshiishi , et al. May 31, 2	2011-05-31
Plasma Processing Apparatus And Plasma Processing Method App 20110114599 - KOSHIMIZU; Chishio ; et al.	2011-05-19
Plasma Processing Apparatus And Plasma Processing Method App 20110104902 - Yamazawa; Yohei ; et al.	2011-05-05
Plasma Processing Apparatus And Plasma Processing Method App 20110094997 - Yamazawa; Yohei ; et al.	2011-04-28
Plasma Processing Apparatus And Plasma Processing Method App 20110094995 - Yamazawa; Yohei ; et al.	2011-04-28
Plasma Processing Apparatus And Plasma Processing Method App 20110094996 - YAMAZAWA; Yohei ; et al.	2011-04-28
Plasma Processing Apparatus, Focus Ring, And Susceptor App 20110000883 - Endoh; Shosuke ; et al.	2011-01-06
Plasma Processing Apparatus And Plasma Processing Method App 20100304572 - Koshimizu; Chishio	2010-12-02
Plasma processing method and plasma processing apparatus Grant 7,829,463 - Matsumoto , et al. November 9, 2	2010-11-09
Plasma Processing Apparatus And Plasma Processing Method App 20100243606 - KOSHIMIZU; Chishio ; et al.	2010-09-30
Plasma Processing Apparatus And Plasma Processing Method App 20100243608 - Koshimizu; Chishio	2010-09-30
Plasma Processing Apparatus App 20100243162 - Koshimizu; Chishio	2010-09-30
Plasma Processing Apparatus App 20100243620 - Yamawaku; Jun ; et al.	2010-09-30
Focus Ring Heating Method, Plasma Etching Apparatus, And Plasma Etching Method App 20100213171 - Koshimizu; Chishio ; et al.	2010-08-26
Plasma Processing Apparatus And Temperature Measuring Method And Apparatus Used Therein App 20100206482 - MATSUDO; Tatsuo ; et al.	2010-08-19
Plasma processing apparatus and method Grant 7,740,737 - Koshiishi , et al. June 22, 2	2010-06-22
Plasma Processing Apparatus And Method App 20100126668 - KOSHIISHI; Akira ; et al.	2010-05-27
Capacitive coupling plasma processing apparatus and method Grant 7,692,916 - Matsumoto , et al. April 6, 2	2010-04-06
Focus Ring, Substrate Mounting Table And Plasma Processing Apparatus Having Same App 20100012274 - Miyagawa; Masaaki ; et al.	2010-01-21
In-chamber Member Temperature Control Method, In-chamber Member, Substrate Mounting Table And Plasma Processing Apparatus Including Same App 20100000970 - Koshimizu; Chishio ; et al.	2010-01-07
Plasma Processing Apparatus, Plasma Processing Method, And Computer Readable Storage Medium App 20090255800 - Koshimizu; Chishio	2009-10-15
Plasma Processing Apparatus App 20090242135 - KOSHIMIZU; Chishio ; et al.	2009-10-01
Plasma Etching Apparatus And Method, And Computer-readable Storage Medium App 20090242127 - KOSHIMIZU; Chishio ; et al.	2009-10-01
Substrate For Observation And Observation System App 20090237496 - YAMAZAWA; Yohei ; et al.	2009-09-24
Temperature Measurement Apparatus And Method App 20090228234 - ABE; Jun ; et al.	2009-09-10
Plasma Processing Apparatus And Method App 20090223933 - Iwata; Manabu ; et al.	2009-09-10
Method and apparatus for measuring electron density of plasma and plasma processing apparatus Grant 7,582,182 - Matsumoto , et al. September 1, 2	2009-09-01
Substrate Processing Method And Substrate Processing Apparatus App 20090197423 - KOSHIMIZU; Chishio ; et al.	2009-08-06
Method for measuring physical quantity of measurement object in substrate processing apparatus and storage medium storing program for implementing the method Grant 7,542,148 - Koshimizu , et al. June 2, 2	2009-06-02
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Method and apparatus for measuring electron density of plasma and plasma processing apparatus Grant 7,532,322 - Koshimizu , et al. May 12, 2	2009-05-12
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Method and apparatus for measuring electron density of plasma and plasma processing apparatus Grant 7,462,293 - Matsumoto , et al. December 9, 2	2008-12-09
Plasma Processor App 20080277062 - Koshimizu; Chishio ; et al.	2008-11-13
System, apparatus, and method for determining temperature/thickness of an object using light interference measurements Grant 7,446,881 - Suzuki , et al. November 4, 2	2008-11-04
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Temperature Measuring Apparatus And Temperature Measuring Method App 20080218744 - ABE; Jun ; et al.	2008-09-11
Method and apparatus for measuring temperature of substrate Grant 7,416,330 - Ito , et al. August 26, 2	2008-08-26
Plasma processor Grant 7,415,940 - Koshimizu , et al. August 26, 2	2008-08-26
Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method Grant 7,379,189 - Suzuki , et al. May 27, 2	2008-05-27
Temperature measuring apparatus, temperature measurement method, temperature measurement system, control system and control method Grant 7,355,715 - Suzuki , et al. April 8, 2	2008-04-08
Plasma Processing Apparatus And Plasma Processing Method App 20080053817 - Koshimizu; Chishio ; et al.	2008-03-06
Method and apparatus for measuring electron density of plasma and plasma processing apparatus Grant 7,339,656 - Matsumoto , et al. March 4, 2	2008-03-04
Plasma processing apparatus and plasma processing method Grant 7,335,278 - Koshimizu , et al. February 26, 2	2008-02-26
Plasma Processing Apparatus And Plasma Processing Method App 20080029385 - KOSHIMIZU; Chishio ; et al.	2008-02-07
Method And Apparatus For Measuring Electron Density Of Plasma And Plasma Processing Apparatus App 20070284044 - MATSUMOTO; Naoki ; et al.	2007-12-13
Plasma Processing Apparatus And Plasma Processing Method App 20070235426 - Matsumoto; Naoki ; et al.	2007-10-11
Plasma Processing Apparatus App 20070236148 - Yamazawa; Yohei ; et al.	2007-10-11
Plasma Processing Method And Plasma Processing Apparatus App 20070227665 - Matsumoto; Naoki ; et al.	2007-10-04
Plasma Processing Apparatus And Plasma Processing Method App 20070227664 - MATSUMOTO; Naoki ; et al.	2007-10-04
Plasma Processing Apparatus App 20070227666 - Matsumoto; Naoki ; et al.	2007-10-04
Method And Apparatus For Measuring Electron Density Of Plasma And Plasma Processing Apparatus App 20070193514 - Matsumoto; Naoki ; et al.	2007-08-23
Method For Measuring Physical Quantity Of Measurement Object In Substrate Processing Apparatus And Storage Medium Storing Program For Implementing The Method App 20070127034 - Koshimizu; Chishio ; et al.	2007-06-07
Method And Apparatus For Measuring Electron Density Of Plasma And Plasma Processing Apparatus App 20070089835 - Koshimizu; Chishio ; et al.	2007-04-26
Stage, substrate processing apparatus, plasma processing apparatus, control method for stage, control method for plasma processing apparatus, and storage media App 20070084847 - Koshimizu; Chishio ; et al.	2007-04-19
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Capacitive coupling plasma processing apparatus and method for using the same App 20060219363 - Matsumoto; Naoki ; et al.	2006-10-05
Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method App 20060176490 - Suzuki; Tomohiro ; et al.	2006-08-10
Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method App 20060152734 - Suzuki; Tomohiro ; et al.	2006-07-13
Temperature measuring apparatus, temperature measurement method, temperature measurement system, control system and control method App 20060077394 - Suzuki; Tomohiro ; et al.	2006-04-13
Plasma processing apparatus and method App 20060066247 - Koshiishi; Akira ; et al.	2006-03-30
Plasma processing apparatus Grant 7,018,506 - Hongoh , et al. March 28, 2	2006-03-28
Plasma processing apparatus and method App 20060037701 - Koshiishi; Akira ; et al.	2006-02-23
Plasma Processing apparatus and method App 20060037704 - Iwata; Manabu ; et al.	2006-02-23
Plasma processing apparatus and method App 20060037703 - Koshiishi; Akira ; et al.	2006-02-23
Method and apparatus for measuring temperature of substrate App 20050271116 - Ito, Masafumi ; et al.	2005-12-08
Plasma processing apparatus Grant 6,949,165 - Koshimizu September 27, 2	2005-09-27
Plasma processing apparatus and plasma processing method App 20050172904 - Koshimizu, Chishio ; et al.	2005-08-11
Method and apparatus for measuring electron density of plasma and plasma processing apparatus App 20050009347 - Matsumoto, Naoki ; et al.	2005-01-13
Plasma processing apparatus, focus ring, and susceptor App 20040261946 - Endoh, Shosuke ; et al.	2004-12-30
Plasma processing apparatus and plasma processing method Grant 6,818,560 - Koshimizu , et al. November 16, 2	2004-11-16
Resonant circuit for measuring temperature profile of a semiconductor substrate Grant 6,773,158 - Koshimizu August 10, 2	2004-08-10
Plasma processor App 20040149221 - Koshimizu, Chishio ; et al.	2004-08-05
Plasma processing apparatus App 20040035365 - Yamazawa, Yohei ; et al.	2004-02-26
Plasma processing apparatus App 20040011466 - Matsumoto, Naoki ; et al.	2004-01-22
Plasma Processing apparatus App 20040011465 - Matsumoto, Naoki ; et al.	2004-01-22
Plasma processing apparatus App 20040007182 - Hongoh, Toshiaki ; et al.	2004-01-15
Method and apparatus for plasma processing Grant 6,676,804 - Koshimizu , et al. January 13, 2	2004-01-13
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Grant 6,576,860 - Koshimizu , et al. June 10, 2	2003-06-10
Method and apparatus for measuring the temperature of a semiconductor subsrate by means of a resonant circuit App 20030012255 - Koshimizu, Chishio	2003-01-16
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate App 20020179577 - Koshimizu, Chishio ; et al.	2002-12-05
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Grant 6,426,477 - Koshimizu , et al. July 30, 2	2002-07-30
End point detecting method for semiconductor plasma processing Grant 6,297,064 - Koshimizu October 2, 2	2001-10-02
Plasma processing apparatus Grant 6,214,162 - Koshimizu April 10, 2	2001-04-10
Plasma processing apparatus Grant 6,162,323 - Koshimizu December 19, 2	2000-12-19
Plasma processing apparatus Grant 6,101,970 - Koshimizu August 15, 2	2000-08-15
Plasma processing apparatus Grant 6,000,360 - Koshimizu December 14, 1	1999-12-14
Plasma processing apparatus Grant 5,997,687 - Koshimizu December 7, 1	1999-12-07
Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field Grant 5,980,687 - Koshimizu November 9, 1	1999-11-09
Method and devices for detecting the end point of plasma process Grant 5,980,767 - Koshimizu , et al. November 9, 1	1999-11-09
Plasma processing apparatus Grant 5,935,373 - Koshimizu August 10, 1	1999-08-10
Method of detecting end point of plasma processing and apparatus for the same Grant 5,928,532 - Koshimizu , et al. July 27, 1	1999-07-27
Plasma processing method, plasma processing apparatus, and plasma generating apparatus Grant 5,783,492 - Higuchi , et al. July 21, 1	1998-07-21
Etching process Grant 5,770,098 - Araki , et al. June 23, 1	1998-06-23
Plasma processing apparatus Grant 5,571,366 - Ishii , et al. November 5, 1	1996-11-05
Method and device for detecting the end point of plasma process Grant 5,565,114 - Saito , et al. October 15, 1	1996-10-15
Plasma processing method Grant 5,374,327 - Imahashi , et al. December 20, 1	1994-12-20
Plasma-process system with improved end-point detecting scheme Grant 5,322,590 - Koshimizu June 21, 1	1994-06-21
Plasma-process system with improved end-point detecting scheme Grant 5,290,383 - Koshimizu March 1, 1	1994-03-01

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