Koshiishi; Akira
Patent Applications and Registrations
Patent applications and USPTO patent grants for Koshiishi; Akira.The latest application filed is for "confinement ring for use in a plasma processing system".
Company Profile
18.71.68
- Koshiishi; Akira - Fremont CA
- Koshiishi; Akira - Hwaseong-si KR
- KOSHIISHI; Akira - Nirasaki-shi JP
- Koshiishi; Akira - Yamanashi JP
- Koshiishi; Akira - Nirasaki JP
- Koshiishi; Akira - Miyagi JP
- KOSHIISHI; Akira - Kurokawa-gun Miyagi
- Koshiishi; Akira - Kofu-City JP
- Koshiishi; Akira - San Jose CA
- Koshiishi; Akira - Kofu N/A JP
- KOSHIISHI; Akira - Kofu-shi JP
Patent Activity
| Patent | Date |
|---|---|
| Confinement Ring for Use in a Plasma Processing System App 20220254614 - Dhindsa; Rajinder ; et al. | 2022-08-11 |
| Plasma processing apparatus and method of manufacturing semiconductor device using the same Grant 11,348,760 - Koshiishi , et al. May 31, 2 | 2022-05-31 |
| Confinement ring for use in a plasma processing system Grant 11,342,166 - Dhindsa , et al. May 24, 2 | 2022-05-24 |
| Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same Grant 11,195,696 - Shin , et al. December 7, 2 | 2021-12-07 |
| Plasma Processing Apparatus And Method Of Manufacturing Semiconductor Device Using The Same App 20210142985 - KOSHIISHI; AKIRA ; et al. | 2021-05-13 |
| Electron Beam Generator, Plasma Processing Apparatus Having The Same And Plasma Processing Method Using The Same App 20210110997 - SHIN; Dongkyu ; et al. | 2021-04-15 |
| Plasma Processing Apparatus And Method App 20210082669 - KOSHIISHI; Akira ; et al. | 2021-03-18 |
| Plasma processing apparatus and method of manufacturing semiconductor device using the same Grant 10,950,414 - Nam , et al. March 16, 2 | 2021-03-16 |
| Hollow Cathode, An Apparatus Including A Hollow Cathode For Manufacturing A Semiconductor Device, And A Method Of Manufacturing A Semiconductor Device Using A Hollow Cathode App 20210057193 - NAM; SANG KI ; et al. | 2021-02-25 |
| Plasma etching apparatus and method Grant 10,861,678 - Koshiishi , et al. December 8, 2 | 2020-12-08 |
| Plasma processing apparatus and method Grant 10,854,431 - Koshiishi , et al. December 1, 2 | 2020-12-01 |
| Confinement Ring for Use in a Plasma Processing System App 20200303171 - Dhindsa; Rajinder ; et al. | 2020-09-24 |
| Confinement ring for use in a plasma processing system Grant 10,720,314 - Dhindsa , et al. | 2020-07-21 |
| Plasma Processing Apparatus And Method App 20200111645 - KOSHIISHI; Akira ; et al. | 2020-04-09 |
| Plasma processing apparatus and method Grant 10,546,727 - Koshiishi , et al. Ja | 2020-01-28 |
| Capacitive coupling plasma processing apparatus and method for using the same Grant 10,529,596 - Matsumoto , et al. J | 2020-01-07 |
| Plasma processing apparatus and method Grant 10,529,539 - Koshiishi , et al. J | 2020-01-07 |
| Method for etching layer to be etched Grant 10,347,499 - Maruyama , et al. July 9, 2 | 2019-07-09 |
| Hollow Cathode, An Apparatus Including A Hollow Cathode For Manufacturing A Semiconductor Device, And A Method Of Manufacturing A Semiconductor Device Using A Hollow Cathode App 20190122867 - Nam; Sang Ki ; et al. | 2019-04-25 |
| Plasma Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same App 20190122866 - Nam; Sang Ki ; et al. | 2019-04-25 |
| Plasma Etching Apparatus And Method App 20190115192 - Koshiishi; Akira ; et al. | 2019-04-18 |
| Plasma etching apparatus and method Grant 10,229,815 - Koshiishi , et al. | 2019-03-12 |
| Method For Etching Layer To Be Etched App 20180144948 - MARUYAMA; Koji ; et al. | 2018-05-24 |
| Method Of Selective Silicon Oxide Etching App 20170345673 - Ranjan; Alok ; et al. | 2017-11-30 |
| Multifrequency Capacitively Coupled Plasma Etch Chamber App 20170213734 - Marakhtanov; Alexei ; et al. | 2017-07-27 |
| Plasma processing apparatus and plasma processing method Grant 9,685,305 - Maruyama , et al. June 20, 2 | 2017-06-20 |
| Capacitive Coupling Plasma Processing Apparatus And Method For Using The Same App 20170162406 - MATSUMOTO; NAOKI ; et al. | 2017-06-08 |
| Capacitive coupling plasma processing apparatus and method for using the same Grant 9,607,866 - Matsumoto , et al. March 28, 2 | 2017-03-28 |
| Plasma Processing Apparatus And Method App 20170032936 - KOSHIISHI; Akira ; et al. | 2017-02-02 |
| Plasma Processing Apparatus And Method App 20160379805 - KOSHIISHI; Akira ; et al. | 2016-12-29 |
| Plasma Processing Apparatus And Method App 20160358753 - KOSHIISHI; Akira ; et al. | 2016-12-08 |
| Plasma processing apparatus and method Grant 9,490,105 - Koshiishi , et al. November 8, 2 | 2016-11-08 |
| Plasma Processing Apparatus And Plasma Processing Method App 20160163515 - Maruyama; Koji ; et al. | 2016-06-09 |
| E-beam enhanced decoupled source for semiconductor processing Grant 9,177,756 - Holland , et al. November 3, 2 | 2015-11-03 |
| E-beam enhanced decoupled source for semiconductor processing Grant 9,111,728 - Holland , et al. August 18, 2 | 2015-08-18 |
| Semiconductor processing system with source for decoupled ion and radical control Grant 8,980,046 - Koshiishi , et al. March 17, 2 | 2015-03-17 |
| Plasma Etching Apparatus And Method App 20150000843 - KOSHIISHI; Akira ; et al. | 2015-01-01 |
| Plasma Processing Apparatus And Method App 20140326409 - KOSHIISHI; Akira ; et al. | 2014-11-06 |
| Plasma etching apparatus and method Grant 8,852,385 - Koshiishi , et al. October 7, 2 | 2014-10-07 |
| Plasma processing apparatus and method Grant 8,790,490 - Koshiishi , et al. July 29, 2 | 2014-07-29 |
| Table for use in plasma processing system and plasma processing system Grant 8,741,098 - Koshiishi , et al. June 3, 2 | 2014-06-03 |
| Plasma Processing Apparatus And Method App 20140124139 - KOSHIISHI; Akira ; et al. | 2014-05-08 |
| Combined wafer area pressure control and plasma confinement assembly Grant 8,627,783 - Fischer , et al. January 14, 2 | 2014-01-14 |
| Plasma processing apparatus and method Grant 8,603,293 - Koshiishi , et al. December 10, 2 | 2013-12-10 |
| Capacitive Coupling Plasma Processing Apparatus And Method For Using The Same App 20130284371 - MATSUMOTO; Naoki ; et al. | 2013-10-31 |
| Plasma processing method and apparatus Grant 8,512,510 - Koshiishi , et al. August 20, 2 | 2013-08-20 |
| Capacitive coupling plasma processing apparatus and method for using the same Grant 8,506,753 - Matsumoto , et al. August 13, 2 | 2013-08-13 |
| Semiconductor Processing System with Source for Decoupled Ion and Radical Control App 20130157469 - Koshiishi; Akira ; et al. | 2013-06-20 |
| Plasma Processing Apparatus App 20130112666 - KOSHIISHI; Akira ; et al. | 2013-05-09 |
| E-Beam Enhanced Decoupled Source for Semiconductor Processing App 20120258607 - Holland; John Patrick ; et al. | 2012-10-11 |
| E-Beam Enhanced Decoupled Source for Semiconductor Processing App 20120258601 - Holland; John Patrick ; et al. | 2012-10-11 |
| E-Beam Enhanced Decoupled Source for Semiconductor Processing App 20120258606 - Holland; John Patrick ; et al. | 2012-10-11 |
| Plasma Processing Apparatus And Method App 20120145324 - Koshiishi; Akira ; et al. | 2012-06-14 |
| Plasma processing apparatus and method Grant 8,137,471 - Koshiishi , et al. March 20, 2 | 2012-03-20 |
| Hot edge ring with sloped upper surface Grant 8,084,375 - Koshiishi , et al. December 27, 2 | 2011-12-27 |
| Plasma processing apparatus Grant 8,080,126 - Koshiishi , et al. December 20, 2 | 2011-12-20 |
| Plasma Processing Apparatus, Plasma Processing Method, Focus Ring, And Focus Ring Component App 20110272100 - KOSHIISHI; Akira | 2011-11-10 |
| Plasma Processing Apparatus And Method App 20110272097 - Koshiishi; Akira ; et al. | 2011-11-10 |
| Plasma processing apparatus and control method thereof Grant 8,048,327 - Koshiishi , et al. November 1, 2 | 2011-11-01 |
| Capacitive Coupling Plasma Processing Apparatus And Method For Using The Same App 20110259524 - MATSUMOTO; Naoki ; et al. | 2011-10-27 |
| Plasma Processing Apparatus And Method App 20110214815 - Koshiishi; Akira ; et al. | 2011-09-08 |
| Plasma Processing Method And Apparatus App 20110214813 - Koshiishi; Akira ; et al. | 2011-09-08 |
| Plasma processing apparatus and electrode used therein Grant 8,008,596 - Koshiishi , et al. August 30, 2 | 2011-08-30 |
| Capacitive coupling plasma processing apparatus and method for using the same Grant 7,993,489 - Matsumoto , et al. August 9, 2 | 2011-08-09 |
| Plasma processing apparatus and method Grant 7,988,816 - Koshiishi , et al. August 2, 2 | 2011-08-02 |
| Plasma processing apparatus, plasma processing method, focus ring, and focus ring component Grant 7,988,814 - Koshiishi August 2, 2 | 2011-08-02 |
| Plasma processing apparatus and method Grant 7,951,262 - Koshiishi , et al. May 31, 2 | 2011-05-31 |
| Hot Edge Ring With Sloped Upper Surface App 20110104884 - Koshiishi; Akira ; et al. | 2011-05-05 |
| Ring mechanism, and plasma processing device using the ring mechanism Grant 7,882,800 - Koshiishi , et al. February 8, 2 | 2011-02-08 |
| Plasma Processing Apparatus App 20100326601 - Koshiishi; Akira ; et al. | 2010-12-30 |
| Multifrequency Capacitively Coupled Plasma Etch Chamber App 20100252199 - Marakhtanov; Alexei ; et al. | 2010-10-07 |
| Combined Wafer Area Pressure Control And Plasma Confinement Assembly App 20100154709 - Fischer; Andreas ; et al. | 2010-06-24 |
| Plasma processing apparatus and method Grant 7,740,737 - Koshiishi , et al. June 22, 2 | 2010-06-22 |
| Plasma Processing Apparatus And Method App 20100126668 - KOSHIISHI; Akira ; et al. | 2010-05-27 |
| Plasma Processing Method And Apparatus App 20100043974 - Koshiishi; Akira ; et al. | 2010-02-25 |
| Focus ring and plasma processing apparatus Grant 7,658,816 - Koshiishi , et al. February 9, 2 | 2010-02-09 |
| Method of treating a mask layer prior to performing an etching process Grant 7,642,193 - Ventzek , et al. January 5, 2 | 2010-01-05 |
| Method of treating a mask layer prior to performing an etching process Grant 7,572,386 - Ventzek , et al. August 11, 2 | 2009-08-11 |
| Apparatus for plasma processing Grant 7,537,672 - Koshiishi , et al. May 26, 2 | 2009-05-26 |
| Plasma processing apparatus and method Grant 7,506,610 - Koshiishi , et al. March 24, 2 | 2009-03-24 |
| Plasma processing apparatus and method, and electrode plate for plasma processing apparatus Grant 7,494,561 - Koshiishi , et al. February 24, 2 | 2009-02-24 |
| Plasma Processing Apparatus App 20080308041 - KOSHIISHI; Akira ; et al. | 2008-12-18 |
| Method of treating a mask layer prior to performing an etching process Grant 7,449,414 - Ventzek , et al. November 11, 2 | 2008-11-11 |
| Plasma Processing Apparatus And Control Method Thereof App 20080135519 - Koshiishi; Akira ; et al. | 2008-06-12 |
| Plasma Etching Apparatus And Method App 20080110859 - Koshiishi; Akira ; et al. | 2008-05-15 |
| Stage for plasma processing apparatus, and plasma processing apparatus App 20080073032 - Koshiishi; Akira ; et al. | 2008-03-27 |
| Table for use in plasma processing system and plasma processing system App 20080038162 - Koshiishi; Akira ; et al. | 2008-02-14 |
| Method of treating a mask layer prior to performing an etching process App 20080038926 - Ventzek; Peter L.G. ; et al. | 2008-02-14 |
| Method of treating a mask layer prior to performing an etching process App 20080029483 - Ventzek; Peter L.G. ; et al. | 2008-02-07 |
| Method of treating a mask layer prior to performing an etching process App 20080032507 - Ventzek; Peter L.G. ; et al. | 2008-02-07 |
| Plasma Processing Apparatus, Plasma Processing Method, Focus Ring, And Focus Ring Component App 20070215279 - Koshiishi; Akira | 2007-09-20 |
| Plasma Processing Apparatus And Electrode Used Therein App 20070215580 - KOSHIISHI; Akira ; et al. | 2007-09-20 |
| Focus ring and plasma processing apparatus App 20070169891 - Koshiishi; Akira ; et al. | 2007-07-26 |
| Capacitive coupling plasma processing apparatus and method for using the same App 20060219363 - Matsumoto; Naoki ; et al. | 2006-10-05 |
| Plasma processing apparatus and method App 20060066247 - Koshiishi; Akira ; et al. | 2006-03-30 |
| Plasma processing apparatus and method App 20060037701 - Koshiishi; Akira ; et al. | 2006-02-23 |
| Plasma processing apparatus and method App 20060037703 - Koshiishi; Akira ; et al. | 2006-02-23 |
| Plasma processing method and apparatus App 20060000803 - Koshiishi; Akira ; et al. | 2006-01-05 |
| Plasma processing apparatus and method, and electrode plate for plasma processing apparatus App 20050269292 - Koshiishi, Akira ; et al. | 2005-12-08 |
| Plasma processing apparatus and method App 20050257743 - Koshiishi, Akira ; et al. | 2005-11-24 |
| Plasma processing apparatus App 20050106869 - Ooyabu, Jun ; et al. | 2005-05-19 |
| Plasma processing apparatus App 20050061445 - Koshiishi, Akira ; et al. | 2005-03-24 |
| Ring mechanism, and plasma processing device using the ring mechanism App 20050005859 - Koshiishi, Akira ; et al. | 2005-01-13 |
| Plasma processing apparatus and control method thereof App 20040226815 - Koshiishi, Akira ; et al. | 2004-11-18 |
| Magnetron plasma processing apparatus Grant 6,764,575 - Yamasaki , et al. July 20, 2 | 2004-07-20 |
| Apparatus for holding an object to be processed Grant 6,733,624 - Koshiishi , et al. May 11, 2 | 2004-05-11 |
| Plasma processing method and plasma processor App 20040040931 - Koshiishi, Akira ; et al. | 2004-03-04 |
| Apparatus for holding an object to be processed App 20030106647 - Koshiishi, Akira ; et al. | 2003-06-12 |
| Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Grant 6,576,860 - Koshimizu , et al. June 10, 2 | 2003-06-10 |
| Plasma treatment method and apparatus Grant 6,544,380 - Tomoyasu , et al. April 8, 2 | 2003-04-08 |
| Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate App 20020179577 - Koshimizu, Chishio ; et al. | 2002-12-05 |
| Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Grant 6,426,477 - Koshimizu , et al. July 30, 2 | 2002-07-30 |
| Etching method Grant 6,423,242 - Kojima , et al. July 23, 2 | 2002-07-23 |
| Plasma treatment method and apparatus App 20020088547 - Tomoyasu, Masayuki ; et al. | 2002-07-11 |
| Plasma treatment method and apparatus Grant 6,264,788 - Tomoyasu , et al. July 24, 2 | 2001-07-24 |
| Magnetron plasma processing apparatus Grant 6,190,495 - Kubota , et al. February 20, 2 | 2001-02-20 |
| Plasma treatment method utilizing an amplitude-modulated high frequency power Grant 6,106,737 - Tomoyasu , et al. August 22, 2 | 2000-08-22 |
| Plasma processing apparatus Grant 6,074,518 - Imafuku , et al. June 13, 2 | 2000-06-13 |
| Plasma processing system Grant 6,072,147 - Koshiishi , et al. June 6, 2 | 2000-06-06 |
| Plasma processing apparatus Grant 5,919,332 - Koshiishi , et al. July 6, 1 | 1999-07-06 |
| Plasma treatment method and apparatus Grant 5,900,103 - Tomoyasu , et al. May 4, 1 | 1999-05-04 |
| Plasma processing apparatus Grant 5,252,892 - Koshiishi , et al. * October 12, 1 | 1993-10-12 |
| Ion generator Grant 5,101,110 - Matsudo , et al. March 31, 1 | 1992-03-31 |
| Electron beam excitation ion source Grant 5,089,747 - Koshiishi , et al. February 18, 1 | 1992-02-18 |
| Electron beam excited ion source Grant 5,083,061 - Koshiishi , et al. January 21, 1 | 1992-01-21 |
| Electron beam excitation ion source Grant 5,028,791 - Koshiishi , et al. July 2, 1 | 1991-07-02 |
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