Korolik; Mikhail

Patent Applications and Registrations

Patent applications and USPTO patent grants for Korolik; Mikhail.The latest application filed is for "isotropic silicon nitride removal".

Company Profile

4.81.79

Korolik; Mikhail - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Isotropic Silicon Nitride Removal App 20220293430 - Korolik; Mikhail ; et al.	2022-09-15
Isotropic Silicon Nitride Removal App 20210111033 - Korolik; Mikhail ; et al.	2021-04-15
Germanium etching systems and methods Grant 10,593,553 - Korolik , et al.	2020-03-17
Methods for selective etching of a silicon material using HF gas without nitrogen etchants Grant 10,204,796 - Ingle , et al. Feb	2019-02-12
Germanium Etching Systems And Methods App 20190043727 - Korolik; Mikhail ; et al.	2019-02-07
Method for fabricating junctions and spacers for horizontal gate all around devices Grant 10,177,227 - Yoshida , et al. J	2019-01-08
Self-limiting Atomic Thermal Etching Systems And Methods App 20180226278 - Arnepalli; Ranga Rao ; et al.	2018-08-09
Self-limiting atomic thermal etching systems and methods Grant 10,043,684 - Arnepalli , et al. August 7, 2	2018-08-07
Germanium etching systems and methods Grant 10,043,674 - Korolik , et al. August 7, 2	2018-08-07
Methods For Selective Etching Of A Silicon Material Using Hf Gas Without Nitrogen Etchants App 20180082849 - INGLE; Nitin K. ; et al.	2018-03-22
Self-aligned shielding of silicon oxide Grant 9,875,907 - Wang , et al. January 23, 2	2018-01-23
Self-aligned shielding of silicon oxide Grant 9,859,128 - Wang , et al. January 2, 2	2018-01-02
Methods for selective etching of a silicon material using HF gas without nitrogen etchants Grant 9,831,097 - Ingle , et al. November 28, 2	2017-11-28
Methods For Selective Etching Of A Silicon Material Using Hf Gas Without Nitrogen Etchants App 20170178915 - INGLE; Nitin K. ; et al.	2017-06-22
Self-aligned Shielding Of Silicon Oxide App 20170148640 - Wang; Fei ; et al.	2017-05-25
Self-aligned Shielding Of Silicon Oxide App 20170148642 - Wang; Fei ; et al.	2017-05-25
Etch suppression with germanium Grant 9,576,809 - Korolik , et al. February 21, 2	2017-02-21
Chlorine-based hardmask removal Grant 9,478,434 - Wang , et al. October 25, 2	2016-10-25
Selectively etching metals and metal nitrides conformally Grant 9,449,843 - Korolik , et al. September 20, 2	2016-09-20
Apparatus and method for atomic layer deposition Grant 9,359,673 - Yoon , et al. June 7, 2	2016-06-07
Non-local plasma oxide etch Grant 9,355,863 - Chen , et al. May 31, 2	2016-05-31
Fluorine-based hardmask removal Grant 9,355,862 - Pandit , et al. May 31, 2	2016-05-31
Fluorine-based Hardmask Removal App 20160086815 - Pandit; Mandar ; et al.	2016-03-24
Chlorine-based Hardmask Removal App 20160086816 - Wang; Xikun ; et al.	2016-03-24
Selective titanium nitride etch Grant 9,275,834 - Park , et al. March 1, 2	2016-03-01
Silicon germanium processing Grant 9,236,265 - Korolik , et al. January 12, 2	2016-01-12
Non-local Plasma Oxide Etch App 20150357201 - Chen; Zhijun ; et al.	2015-12-10
Non-local plasma oxide etch Grant 9,111,877 - Chen , et al. August 18, 2	2015-08-18
Silicon Germanium Processing App 20150126040 - Korolik; Mikhail ; et al.	2015-05-07
Etch Suppression With Germanium App 20150126039 - Korolik; Mikhail ; et al.	2015-05-07
Method and Systems for Cleaning A Substrate App 20150040947 - Freer; Erik M. ; et al.	2015-02-12
Method and Apparatus for Cleaning A Semiconductor Substrate App 20150040941 - Freer; Erik M. ; et al.	2015-02-12
Tungsten oxide processing Grant 8,951,429 - Liu , et al. February 10, 2	2015-02-10
Controls of Ambient Environment During Wafer Drying Using Proximity Head App 20140332037 - Korolik; Mikhail ; et al.	2014-11-13
Non-local Plasma Oxide Etch App 20140166617 - Chen; Zhijun ; et al.	2014-06-19
Method And Apparatus For Cleaning A Substrate Using Non-newtonian Fluids App 20140158167 - de Larios; John M. ; et al.	2014-06-12
Material for cleaning a substrate Grant 8,716,210 - Freer , et al. May 6, 2	2014-05-06
Method for removing material from semiconductor wafer and apparatus for performing the same Grant 8,691,027 - Korolik , et al. April 8, 2	2014-04-08
Method and apparatus for cleaning a substrate using non-newtonian fluids Grant 8,671,959 - de Larios , et al. March 18, 2	2014-03-18
Apparatus for Cleaning a Semiconductor Substrate App 20140059789 - Freer; Erik M. ; et al.	2014-03-06
Methods for atomic layer deposition Grant 8,623,456 - Yoon , et al. January 7, 2	2014-01-07
Method for removing contamination from a substrate and for making a cleaning solution Grant 8,608,859 - Freer , et al. December 17, 2	2013-12-17
Apparatus for cleaning contaminants from substrate Grant 8,590,550 - Korolik , et al. November 26, 2	2013-11-26
Methods for cleaning a semiconductor substrate Grant 8,591,662 - Freer , et al. November 26, 2	2013-11-26
Substrate Cleaning System Using Stabilized Fluid Solutions App 20130284217 - Freer; Erik M. ; et al.	2013-10-31
Method and apparatus for removing contamination from substrate Grant 8,555,903 - Freer , et al. October 15, 2	2013-10-15
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids Grant 8,535,451 - de Larios , et al. September 17, 2	2013-09-17
Apparatus and system for cleaning a substrate Grant 8,522,799 - Freer , et al. September 3, 2	2013-09-03
Method and apparatus for cleaning a semiconductor substrate Grant 8,522,801 - Freer , et al. September 3, 2	2013-09-03
Substrate Cleaning Technique Employing Multi-phase Solution App 20130206182 - Freer; Erik M. ; et al.	2013-08-15
Method and apparatus for particle removal Grant 8,480,810 - Freer , et al. July 9, 2	2013-07-09
Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions Grant 8,475,599 - Freer , et al. July 2, 2	2013-07-02
Method For Removing Material From Semiconductor Wafer And Apparatus For Performing The Same App 20130061887 - Korolik; Mikhail ; et al.	2013-03-14
Substrate cleaning technique employing multi-phase solution Grant 8,388,762 - Freer , et al. March 5, 2	2013-03-05
Apparatus for Cleaning a Semiconductor Substrate App 20130048021 - Freer; Erik M. ; et al.	2013-02-28
Methods For Atomic Layer Deposition App 20130040460 - Yoon; Hyungsuk Alexander ; et al.	2013-02-14
Method for removing material from semiconductor wafer and apparatus for performing the same Grant 8,323,420 - Korolik , et al. December 4, 2	2012-12-04
Method and apparatus for cleaning a semiconductor substrate Grant 8,316,866 - Freer , et al. November 27, 2	2012-11-27
Apparatus and method for atomic layer deposition Grant 8,287,647 - Yoon , et al. October 16, 2	2012-10-16
Apparatus And Method For Atomic Layer Deposition App 20120248219 - Yoon; Hyungsuk Alexander ; et al.	2012-10-04
Two-phase substrate cleaning material Grant 8,242,067 - Korolik , et al. August 14, 2	2012-08-14
Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same Grant 8,236,382 - Ravkin , et al. August 7, 2	2012-08-07
Cleaning Compound and Method and System for Using the Cleaning Compound App 20120145202 - Freer; Erik M. ; et al.	2012-06-14
Cleaning compound and method and system for using the cleaning compound Grant 8,137,474 - Freer , et al. March 20, 2	2012-03-20
Methods and apparatus for thin metal film thickness measurement Grant 8,128,278 - Gotkis , et al. March 6, 2	2012-03-06
Method And Apparatus For Cleaning A Substrate Using Non-newtonian Fluids App 20120017950 - de Larios; John M. ; et al.	2012-01-26
Method and apparatus for cleaning a substrate using non-Newtonian fluids Grant 8,043,441 - de Larios , et al. October 25, 2	2011-10-25
Substrate proximity drying using in-situ local heating of substrate Grant 8,011,116 - Mikhaylichenko , et al. September 6, 2	2011-09-06
Proximity head with angled vacuum conduit system, apparatus and method Grant 7,975,708 - Ravkin , et al. July 12, 2	2011-07-12
Integrated Tool Sets And Process To Keep Substrate Surface Wet During Plating And Clean In Fabrication Of Advanced Nano-electronic Devices App 20110143553 - Wang; Yaxin ; et al.	2011-06-16
Methods for atomic layer deposition (ALD) using a proximity meniscus Grant 7,939,139 - Ravkin , et al. May 10, 2	2011-05-10
Apparatus for Contained Chemical Surface Treatment App 20110061687 - Mikhaylichenko; Katrina ; et al.	2011-03-17
Material For Cleaning A Substrate App 20110065621 - Freer; Erik M. ; et al.	2011-03-17
Methods for contained chemical surface treatment Grant 7,897,213 - Mikhaylichenko , et al. March 1, 2	2011-03-01
Thermal methods for cleaning post-CMP wafers Grant 7,884,017 - Wang , et al. February 8, 2	2011-02-08
Method and material for cleaning a substrate Grant 7,862,662 - Freer , et al. January 4, 2	2011-01-04
Substrate Proximity Drying Using In-situ Local Heating Of Substrate App 20100313443 - Mikhaylichenko; Katrina ; et al.	2010-12-16
Apparatus for Cleaning Contaminants from Substrate App 20100313918 - Korolik; Mikhail ; et al.	2010-12-16
Two-Phase Substrate Cleaning Material App 20100317556 - Korolik; Mikhail ; et al.	2010-12-16
Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same Grant 7,806,126 - Mikhaylichenko , et al. October 5, 2	2010-10-05
Method and system for using a two-phases substrate cleaning compound Grant 7,799,141 - Korolik , et al. September 21, 2	2010-09-21
Method for Removing Contamination from a Substrate and for Making a Cleaning Solution App 20100206340 - Freer; Erik M. ; et al.	2010-08-19
Methods for providing a confined liquid for immersion lithography Grant 7,749,689 - Hemker , et al. July 6, 2	2010-07-06
Method for removing contamination from a substrate and for making a cleaning solution Grant 7,737,097 - Freer , et al. June 15, 2	2010-06-15
Cleaning Compound and Method and System for Using the Cleaning Compound App 20100139694 - Freer; Erik M. ; et al.	2010-06-10
Thermal Methods For Cleaning Post-cmp Wafers App 20100136788 - Wang; Zhonghui Alex ; et al.	2010-06-03
Thermal methods for cleaning post-CMP wafers Grant 7,709,400 - Wang , et al. May 4, 2	2010-05-04
Cleaning compound and method and system for using the cleaning compound Grant 7,696,141 - Freer , et al. April 13, 2	2010-04-13
Methods For Atomic Layer Deposition (ald) Using A Proximity Meniscus App 20100071730 - Ravkin; Mike ; et al.	2010-03-25
Method and Apparatus for Removing Contamination from Substrate App 20100059088 - Freer; Erik M. ; et al.	2010-03-11
Method and apparatus for removing contamination from substrate Grant 7,648,584 - Freer , et al. January 19, 2	2010-01-19
Apparatus For Integrated Surface Treatment And Deposition For Copper Interconnect App 20090320749 - Yoon; Hyungsuk Alexander ; et al.	2009-12-31
Controls Of Ambient Environment During Wafer Drying Using Proximity Head App 20090320884 - Korolik; Mikhail ; et al.	2009-12-31
Methods and Apparatus for Thin Metal Film Thickness Measurement App 20090310643 - Gotkis; Yehiel ; et al.	2009-12-17
Apparatus And System For Cleaning A Substrate App 20090308413 - Freer; Erik M. ; et al.	2009-12-17
Method And Material For Cleaning A Substrate App 20090308410 - Freer; Erik M. ; et al.	2009-12-17
Method and apparatus for atomic layer deposition (ALD) in a proximity system Grant 7,632,376 - Ravkin , et al. December 15, 2	2009-12-15
Apparatus and method for integrated surface treatment and deposition for copper interconnect Grant 7,615,486 - Yoon , et al. November 10, 2	2009-11-10
Controls of ambient environment during wafer drying using proximity head Grant 7,614,411 - Korolik , et al. November 10, 2	2009-11-10
Method and apparatus for transporting a substrate using non-newtonian fluid Grant 7,591,613 - de Larios , et al. September 22, 2	2009-09-22
Method and apparatus for thin metal film thickness measurement Grant 7,581,875 - Gotkis , et al. September 1, 2	2009-09-01
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids Grant 7,568,490 - de Larios , et al. August 4, 2	2009-08-04
Proximity head with angled vacuum conduit system, apparatus and method App 20090145464 - Ravkin; Michael ; et al.	2009-06-11
Methods for processing wafer surfaces using thin, high velocity fluid layer Grant 7,534,307 - Ravkin , et al. May 19, 2	2009-05-19
System and method for contained chemical surface treatment App 20090114249 - Mikhaylichenko; Katrina ; et al.	2009-05-07
Method and Apparatus for Cleaning Semiconductor Wafers Using Compressed and/or Pressurized Foams, Bubbles, and/or Liquids App 20090078282 - de Larios; John M. ; et al.	2009-03-26
Thermal methods for cleaning post-CMP wafers App 20080280456 - Wang; Zhonghui Alex ; et al.	2008-11-13
Substrate cleaning technique employing multi-phase solution App 20080271749 - Freer; Erik M. ; et al.	2008-11-06
Method And Apparatus For Transporting A Substrate Using Non-newtonian Fluid App 20080267721 - de Larios; John M. ; et al.	2008-10-30
Apparatus And Method For Atomic Layer Deposition App 20080261412 - Yoon; Hyungsuk Alexander ; et al.	2008-10-23
Apparatus And Method For Integrated Surface Treatment And Film Deposition App 20080260967 - Yoon; Hyungsuk Alexander ; et al.	2008-10-23
Apparatus And Method For Pre And Post Treatment Of Atomic Layer Deposition App 20080260963 - Yoon; Hyungsuk Alexander ; et al.	2008-10-23
Apparatus And Method For Integrated Surface Treatment And Deposition For Copper Interconnect App 20080260940 - Yoon; Hyungsuk Alexander ; et al.	2008-10-23
Method for cleaning semiconductor wafer surfaces by applying periodic shear stress to the cleaning solution App 20080245390 - Freer; Erik M. ; et al.	2008-10-09
Methods for Processing Wafer Surfaces Using Thin, High Velocity Fluid Layer App 20080230097 - Ravkin; Michael ; et al.	2008-09-25
Method and apparatus for transporting a substrate using non-Newtonian fluid Grant 7,416,370 - de Larios , et al. August 26, 2	2008-08-26
Methods for Providing a Confined Liquid for Immersion Lithography App 20080171292 - Hemker; David ; et al.	2008-07-17
Method and apparatus for drying substrates using a surface tensions reducing gas App 20080148595 - de Larios; John M. ; et al.	2008-06-26
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer Grant 7,383,843 - Ravkin , et al. June 10, 2	2008-06-10
Apparatus and method for providing a confined liquid for immersion lithography Grant 7,367,345 - Hemker , et al. May 6, 2	2008-05-06
Method and apparatus for thin metal film thickness measurement App 20070160107 - Gotkis; Yehiel ; et al.	2007-07-12
Method and apparatus for particle removal App 20070151583 - Freer; Erik M. ; et al.	2007-07-05
Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions App 20070155640 - Freer; Erik M. ; et al.	2007-07-05
Method And Apparatus For Cleaning A Semiconductor Substrate App 20070084483 - Freer; ErikM ; et al.	2007-04-19
Method and system for using a two-phases substrate cleaning compound App 20070087950 - Korolik; Mikhail ; et al.	2007-04-19
Method And Apparatus For Cleaning A Semiconductor Substrate App 20070084485 - Freer; Erik M. ; et al.	2007-04-19
Method and apparatus for thin metal film thickness measurement Grant 7,204,639 - Gotkis , et al. April 17, 2	2007-04-17
Method and apparatus for removing contamination from substrate App 20070079848 - Freer; Erik M. ; et al.	2007-04-12
Method for removing material from semiconductor wafer and apparatus for performing the same App 20070000518 - Korolik; Mikhail ; et al.	2007-01-04
Method and apparatus for cleaning a substrate using non-newtonian fluids App 20060283486 - de Larios; John M. ; et al.	2006-12-21
Method and apparatus for transporting a substrate using non-Newtonian fluid App 20060285930 - de Larios; John M. ; et al.	2006-12-21
Stress free etch processing in combination with a dynamic liquid meniscus Grant 7,078,344 - Bailey, III , et al. July 18, 2	2006-07-18
Method for removing contamination from a substrate and for making a cleaning solution App 20060128590 - Freer; Erik M. ; et al.	2006-06-15
Cleaning compound and method and system for using the cleaning compound App 20060128600 - Freer; Erik M. ; et al.	2006-06-15
Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same App 20050158473 - Raykin, Michael ; et al.	2005-07-21
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer App 20050145265 - Ravkin, Michael ; et al.	2005-07-07
Controls of ambient environment during wafer drying using proximity head App 20050145267 - Korolik, Mikhail ; et al.	2005-07-07
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids App 20050133060 - Larios, John M. de ; et al.	2005-06-23
Stress free etch processing in combination with a dynamic liquid meniscus App 20050090093 - Bailey, Andrew D. III ; et al.	2005-04-28
Method for fabricating multi-layered substrates Grant 6,534,381 - Cheung , et al. March 18, 2	2003-03-18
Method For Fabricating Multi-layered Substrates App 20030008475 - CHEUNG, NATHAN W. ; et al.	2003-01-09

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