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Method For Depositing Tungsten-containing Layers By Vapor Deposition Techniques App 20090156003 - XI; MING ;   et al. | 2009-06-18 |
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Method For Depositing Tungsten-containing Layers By Vapor Deposition Techniques App 20070218688 - Xi; Ming ;   et al. | 2007-09-20 |
Method for forming tungsten materials during vapor deposition processes Grant 7,235,486 - Kori , et al. June 26, 2 | 2007-06-26 |
Method for depositing tungsten-containing layers by vapor deposition techniques Grant 7,220,673 - Xi , et al. May 22, 2 | 2007-05-22 |
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Method and system for controlling the presence of fluorine in refractory metal layers Grant 7,115,494 - Sinha , et al. October 3, 2 | 2006-10-03 |
Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer Grant 7,101,795 - Xi , et al. September 5, 2 | 2006-09-05 |
Method and system for controlling the presence of fluorine in refractory metal layers App 20060128132 - Sinha; Ashok ;   et al. | 2006-06-15 |
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Method and system for controlling the presence of fluorine in refractory metal layers App 20050059241 - Kori, Moris ;   et al. | 2005-03-17 |
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Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer App 20040209465 - Xi, Ming ;   et al. | 2004-10-21 |
Dual robot processing system Grant 6,729,824 - Lei , et al. May 4, 2 | 2004-05-04 |
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System and method to form a composite film stack utilizing sequential deposition techniques App 20020197863 - Mak, Alfred W. ;   et al. | 2002-12-26 |
Substrate support member with a purge gas channel and pumping system Grant 6,040,011 - Yudovsky , et al. March 21, 2 | 2000-03-21 |