loadpatents
name:-0.018906831741333
name:-0.016348123550415
name:-0.0074632167816162
Koosau; Denis M. Patent Filings

Koosau; Denis M.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Koosau; Denis M..The latest application filed is for "apparatus and method for controlling edge ring variation".

Company Profile
6.14.17
  • Koosau; Denis M. - Pleasanton CA
  • Koosau; Denis M. - Hayward CA US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Wafer edge ring lifting solution
Grant 11,393,710 - Rice , et al. July 19, 2
2022-07-19
Apparatus And Method For Controlling Edge Ring Variation
App 20210254957 - GHANTASALA; Sathyendra ;   et al.
2021-08-19
Movable and removable process kit
Grant 11,043,400 - Schmid , et al. June 22, 2
2021-06-22
Adjustable extended electrode for edge uniformity control
Grant 10,991,556 - Luere , et al. April 27, 2
2021-04-27
Sensors And System For In-situ Edge Ring Erosion Monitor
App 20200335368 - PAN; Yaoling ;   et al.
2020-10-22
Movable And Removable Process Kit
App 20200234981 - SCHMID; Andreas ;   et al.
2020-07-23
Adjustable Extended Electrode For Edge Uniformity Control
App 20200118798 - LUERE; Olivier ;   et al.
2020-04-16
Cooling base with spiral channels for ESC
Grant 10,586,718 - Knyazik , et al.
2020-03-10
Adjustable extended electrode for edge uniformity control
Grant 10,553,404 - Luere , et al. Fe
2020-02-04
Calibration Jig And Calibration Method
App 20190385880 - MYLES; Andrew ;   et al.
2019-12-19
Adjustable extended electrode for edge uniformity control
Grant 10,504,702 - Luere , et al. Dec
2019-12-10
Processing With Powered Edge Ring
App 20190228952 - DORF; Leonid ;   et al.
2019-07-25
Adjustable Extended Electrode For Edge Uniformity Control
App 20180315583 - LUERE; Olivier ;   et al.
2018-11-01
Adjustable extended electrode for edge uniformity control
Grant 10,103,010 - Luere , et al. October 16, 2
2018-10-16
Adjustable Extended Electrode For Edge Uniformity Control
App 20180233334 - LUERE; Olivier ;   et al.
2018-08-16
Adjustable Extended Electrode For Edge Uniformity Control
App 20180218933 - LUERE; Olivier ;   et al.
2018-08-02
Adjustable extended electrode for edge uniformity control
Grant 9,947,517 - Luere , et al. April 17, 2
2018-04-17
Wafer Edge Ring Lifting Solution
App 20170213758 - RICE; Michael R. ;   et al.
2017-07-27
Cooling Base With Spiral Channels For Esc
App 20170133244 - KNYAZIK; Vladimir ;   et al.
2017-05-11
Polishing head zone boundary smoothing
Grant 9,050,699 - Chen , et al. June 9, 2
2015-06-09
Sensors in Carrier Head of a CMP System
App 20140020829 - Chen; Hung Chih ;   et al.
2014-01-23
Apparatus and method for temperature control during polishing
Grant 8,591,286 - Chen , et al. November 26, 2
2013-11-26
Polishing head zone boundary smoothing
Grant 8,460,067 - Chen , et al. June 11, 2
2013-06-11
Apparatus And Method For Temperature Control During Polishing
App 20120040592 - CHEN; HUNG CHIH ;   et al.
2012-02-16
Substrate Holder To Reduce Substrate Edge Stress During Chemical Mechanical Polishing
App 20120021673 - Chen; Hung Chih ;   et al.
2012-01-26
Polishing Head Zone Boundary Smoothing
App 20100291842 - CHEN; HUNG CHIH ;   et al.
2010-11-18
Method and apparatus for controlling temperature of a substrate
Grant 7,436,645 - Holland , et al. October 14, 2
2008-10-14
Method And Apparatus For Controlling Temperature Of A Substrate
App 20070139856 - Holland; John ;   et al.
2007-06-21

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