Kools; Jacques

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kools; Jacques.The latest application filed is for "source-collector modules for euv lithography employing a gic mirror and a lpp source".

Company Profile

0.7.4

Kools; Jacques - Simiane Collongue FR
Kools; Jacques - Simane N/A FR
Kools; Jacques - Simane-Collongue FR
Kools; Jacques - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Source-collector modules for EUV lithography employing a GIC mirror and a LPP source Grant 8,895,946 - Ceglio , et al. November 25, 2	2014-11-25
EUV mirror module with a nickel electroformed curved mirror Grant 8,810,775 - Kools August 19, 2	2014-08-19
Source-collector modules for EUV lithography employing a GIC mirror and a LPP source App 20130207004 - Ceglio; Natale M. ; et al.	2013-08-15
Adjustable clips for grazing-incidence collectors Grant 8,276,866 - Pirovano , et al. October 2, 2	2012-10-02
Zone-optimized mirrors and optical systems using same Grant 8,050,380 - Zocchi , et al. November 1, 2	2011-11-01
EUV mirror module App 20110255068 - Kools; Jacques	2011-10-20
Adjustable clips for grazing-incidence collectors App 20110216395 - Pirovano; Giorgio ; et al.	2011-09-08
Zone-optimized mirrors and optical systems using same App 20100284511 - Zocchi; Fabio ; et al.	2010-11-11
Dual collimated deposition apparatus and method of use Grant 6,592,728 - Paranjpe , et al. July 15, 2	2003-07-15
Dual collimated deposition apparatus and method of use Grant 6,572,744 - Paranjpe , et al. June 3, 2	2003-06-03

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