Kono; Motohiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kono; Motohiro.The latest application filed is for "substrate processing method and substrate processing apparatus".

Company Profile

1.8.10

Kono; Motohiro - Kyoto JP
KONO; Motohiro - Kyoto-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
In-liquid plasma generation device and liquid treatment apparatus Grant 11,267,729 - Horikoshi , et al. March 8, 2	2022-03-08
Substrate Processing Method And Substrate Processing Apparatus App 20210086238 - HORIKOSHI; Akira ; et al.	2021-03-25
In-liquid Plasma Generation Device And Liquid Treatment Apparatus App 20200407247 - HORIKOSHI; Akira ; et al.	2020-12-31
Measuring apparatus and measuring method Grant 9,766,132 - Takase , et al. September 19, 2	2017-09-19
Measuring Apparatus And Measuring Method App 20160245703 - TAKASE; Yasuhiro ; et al.	2016-08-25
Surface voltmeter Grant 7,795,886 - Kono , et al. September 14, 2	2010-09-14
Surface voltmeter and surface voltage measurement method Grant 7,598,746 - Kono , et al. October 6, 2	2009-10-06
Apparatus and method for removing organic contamination adsorbed onto substrate, and apparatus and method for measuring thickness of thin film formed on substrate App 20090019722 - Nakazawa; Yoshiyuki ; et al.	2009-01-22
Surface voltmeter App 20080238434 - Kono; Motohiro ; et al.	2008-10-02
Method and apparatus for measuring thickness of thin film formed on substrate Grant 7,427,520 - Kono , et al. September 23, 2	2008-09-23
Method and apparatus for measuring relative dielectric constant Grant 7,375,537 - Kitajima , et al. May 20, 2	2008-05-20
Surface voltmeter and surface voltage measurement method App 20070216418 - Kono; Motohiro ; et al.	2007-09-20
Method and apparatus for measuring relative dielectric constant App 20050239224 - Kitajima, Toshikazu ; et al.	2005-10-27
Method and apparatus for measuring thickness of thin film formed on substrate App 20050206911 - Kono, Motohiro ; et al.	2005-09-22
Apparatus and method for removing organic contamination adsorbed onto substrate, and apparatus and method for measuring thickness of thin film formed on substrate App 20050198857 - Nakazawa, Yoshiyuki ; et al.	2005-09-15
Film thickness measuring method, relative dielectric constant measuring method, film thickness measuring apparatus, and relative dielectric constant measuring apparatus Grant 6,915,232 - Kitajima , et al. July 5, 2	2005-07-05
Film thickness measuring method, relative dielectric constant measuring method, film thickness measuring apparatus, and relative dielectric constant measuring apparatus App 20040019442 - Kitajima, Toshikazu ; et al.	2004-01-29
Probing apparatus for measuring electrical characteristics of semiconductor device formed on wafer Grant 4,746,857 - Sakai , et al. May 24, 1	1988-05-24

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.