loadpatents
name:-0.015599966049194
name:-0.009084939956665
name:-0.00058603286743164
Kon; Yoshinori Patent Filings

Kon; Yoshinori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kon; Yoshinori.The latest application filed is for "information processing apparatus, access control method, and non-transitory computer readable medium".

Company Profile
0.7.12
  • Kon; Yoshinori - Tokyo JP
  • Kon; Yoshinori - Yokohama JP
  • Kon; Yoshinori - Chiyoda-ku JP
  • Kon; Yoshinori - Yokohoma-shi JP
  • Kon; Yoshinori - Yokohama-shi JP
  • Kon; Yoshinori - Chiba JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Information processing apparatus, access control method, and non-transitory computer readable medium
Grant 11,411,962 - Kon August 9, 2
2022-08-09
Information Processing Apparatus, Access Control Method, And Non-transitory Computer Readable Medium
App 20210126921 - KON; Yoshinori
2021-04-29
Polishing compound for semiconductor integrated circuit device, polishing method and method for producing semiconductor integrated circuit device
Grant 8,030,213 - Yoshida , et al. October 4, 2
2011-10-04
Method for producing glass substrate for magnetic disk, and magnetic disk
Grant 7,857,680 - Miyatani , et al. December 28, 2
2010-12-28
Polishing compound, method for production thereof, and polishing method
Grant 7,854,777 - Takemiya , et al. December 21, 2
2010-12-21
Polishing compound for semiconductor integrated circuit device, polishing method and method for producing semiconductor integrated circuit device
Grant 7,695,345 - Yoshida , et al. April 13, 2
2010-04-13
Semiconductor Polishing Compound, Process For Its Production And Polishing Method
App 20100055909 - Kon; Yoshinori ;   et al.
2010-03-04
Glass substrate for magnetic disk, its production method and magnetic disk
Grant 7,618,723 - Usui , et al. November 17, 2
2009-11-17
Polishing Agent For Semiconductor Integrated Circuit Device, Polishing Method, And Method For Manufacturing Semiconductor Integrated Circuit Device
App 20090181539 - KON; Yoshinori ;   et al.
2009-07-16
Polishing Agent For Semiconductor Integrated Circuit Device, Polishing Method, And Method For Manufacturing Semiconductor Integrated Circuit Device
App 20090176373 - KON; Yoshinori ;   et al.
2009-07-09
Semiconductor Polishing Compound
App 20080086950 - KON; Yoshinori ;   et al.
2008-04-17
Polishing Compound For Semiconductor Integrated Circuit Device, Polishing Method And Method For Producing Semiconductor Integrated Circuit Device
App 20080085663 - YOSHIDA; Iori ;   et al.
2008-04-10
Polishing Compound For Semiconductor Integrated Circuit Device, Polishing Method And Method For Producing Semiconductor Integrated Circuit Device
App 20080070412 - Yoshida; Iori ;   et al.
2008-03-20
Glass Substrate For Magnetic Disk, Its Production Method And Magnetic Disk
App 20080020679 - USUI; Hiroshi ;   et al.
2008-01-24
Method For Producing Glass Substrate For Magnetic Disk, And Magnetic Disk
App 20070251270 - Miyatani; Katsuaki ;   et al.
2007-11-01
Semiconductor polishing compound, process for its production and polishing method
App 20050126080 - Kon, Yoshinori ;   et al.
2005-06-16
Polishing compound, method for production thereof, and polishing method
App 20040194392 - Takemiya, Satoshi ;   et al.
2004-10-07
Recording medium excellent in ink absorptivity and process for its production, and process for producing silica-alumina composite sol
Grant 6,630,213 - Nakahara , et al. October 7, 2
2003-10-07
Recording medium excellent in ink absorptivity and process for its production, and process for producing silica-alumina composite sol
App 20010008688 - Nakahara, Katsumasa ;   et al.
2001-07-19

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