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name:-0.34288692474365
name:-0.12546396255493
name:-0.0006558895111084
Komoriya; Haruhiko Patent Filings

Komoriya; Haruhiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Komoriya; Haruhiko.The latest application filed is for "film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same".

Company Profile
0.65.62
  • Komoriya; Haruhiko - Saitama JP
  • KOMORIYA; Haruhiko - Iruma-gun Saitama
  • Komoriya; Haruhiko - Kawagoe JP
  • KOMORIYA; Haruhiko - Kawagoe-shi JP
  • Komoriya, Haruhiko - Kawagoe-si JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Composition for forming films, film produced from said composition, and method for producing organic semiconductor element using said composition
Grant 9,966,575 - Komoriya , et al. May 8, 2
2018-05-08
Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same
Grant 9,842,993 - Terui , et al. December 12, 2
2017-12-12
Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
Grant 9,678,425 - Komoriya , et al. June 13, 2
2017-06-13
Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
Grant 9,678,426 - Komoriya , et al. June 13, 2
2017-06-13
Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
Grant 9,650,451 - Sumida , et al. May 16, 2
2017-05-16
Method for producing compound containing BIS (perfluoroalkylsulfonyl) methyl group and salt thereof, and solid electrolyte membrane produced using same
Grant 9,512,070 - Takahashi , et al. December 6, 2
2016-12-06
Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same
App 20160181531 - TERUI; Yoshiharu ;   et al.
2016-06-23
Composition for Forming Films, Film Produced from Said Composition, and Method for Producing Organic Semiconductor Element Using Said Composition
App 20160164047 - KOMORIYA; Haruhiko ;   et al.
2016-06-09
Proton conducting polymer membrane, membrane-electrode assembly using same, and polymer electrolyte fuel cell
Grant 9,318,764 - Tanaka , et al. April 19, 2
2016-04-19
Positive-type resist composition
Grant 9,310,682 - Terui , et al. April 12, 2
2016-04-12
Antibacterial agent, substrate surface treatment method using the same, antibacterial agent composition, and substrate surface treatment method using the same
Grant 9,204,652 - Komoriya , et al. December 8, 2
2015-12-08
Solid electrolyte film, and method for producing same
Grant 9,171,655 - Suzuki , et al. October 27, 2
2015-10-27
Method for Producing Compound Containing BIS (Perfluoroalkylsulfonyl) Methyl Group and Salt Thereof, and Solid Electrolyte Membrane Produced Using Same
App 20150266816 - Takahashi; Arata ;   et al.
2015-09-24
Fluorine-containing polymer and anti-static agent wherein same is used
Grant 8,822,588 - Terui , et al. September 2, 2
2014-09-02
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
App 20140221589 - KOMORIYA; Haruhiko ;   et al.
2014-08-07
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
App 20140220490 - KOMORIYA; Haruhiko ;   et al.
2014-08-07
Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions
App 20140171584 - SUMIDA; Shinichi ;   et al.
2014-06-19
Positive-Type Resist Composition
App 20140134542 - Terui; Yoshiharu ;   et al.
2014-05-15
Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
Grant 8,716,385 - Komoriya , et al. May 6, 2
2014-05-06
Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
Grant 8,691,491 - Sumida , et al. April 8, 2
2014-04-08
Top coating composition
Grant 8,663,903 - Maeda , et al. March 4, 2
2014-03-04
Proton Conducting Polymer Membrane, Membrane-Electrode Assembly Using Same, and Polymer Electrolyte Fuel Cell
App 20140023953 - Tanaka; Toru ;   et al.
2014-01-23
Top coat composition
Grant 8,592,508 - Komoriya , et al. November 26, 2
2013-11-26
Water Repellent Additive for Immersion Resist
App 20130216960 - MAEDA; Kazuhiko ;   et al.
2013-08-22
Antibacterial Agent, Substrate Surface Treatment Method Using The Same, Antibacterial Agent Composition, And Substrate Surface Treatment Method Using The Same
App 20130189220 - Komoriya; Haruhiko ;   et al.
2013-07-25
Solid electrolyte membrane for fuel cell and process for producing same
Grant 8,445,551 - Obara , et al. May 21, 2
2013-05-21
Solid Electrolyte Film, and Method for Producing Same
App 20120301811 - Suzuki; Katsutoshi ;   et al.
2012-11-29
Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
Grant 8,211,612 - Maeda , et al. July 3, 2
2012-07-03
Solid Electrolyte Membrane for Fuel Cell and Process for Producing Same
App 20120142791 - Obara; Yoshihiko ;   et al.
2012-06-07
Water Repellent Additive for Immersion Resist
App 20120064459 - Maeda; Kazuhiko ;   et al.
2012-03-15
Top Coating Composition
App 20120040294 - Maeda; Kazuhiko ;   et al.
2012-02-16
Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
Grant 8,115,036 - Komoriya , et al. February 14, 2
2012-02-14
Top Coat Composition
App 20110245395 - Komoriya; Haruhiko ;   et al.
2011-10-06
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
App 20110244188 - Komoriya; Haruhiko ;   et al.
2011-10-06
Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions
App 20110196121 - SUMIDA; Shinichi ;   et al.
2011-08-11
Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
Grant 7,947,422 - Sumida , et al. May 24, 2
2011-05-24
Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used
App 20110065857 - Terui; Yoshiharu ;   et al.
2011-03-17
Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
Grant 7,781,602 - Komoriya , et al. August 24, 2
2010-08-24
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern
App 20100204422 - Komoriya; Haruhiko ;   et al.
2010-08-12
Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
Grant 7,736,835 - Komoriya , et al. June 15, 2
2010-06-15
Ester compound, polymer, resist composition, and patterning process
Grant 7,666,967 - Harada , et al. February 23, 2
2010-02-23
Resist protective coating material and patterning process
Grant 7,569,323 - Hatakeyama , et al. August 4, 2
2009-08-04
Polymer, resist composition and patterning process
Grant 7,488,567 - Harada , et al. February 10, 2
2009-02-10
Transparent fluorine-containing copolymer
Grant 7,417,100 - Komoriya , et al. August 26, 2
2008-08-26
Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same
App 20080194764 - KOMORIYA; Haruhiko ;   et al.
2008-08-14
Top coat composition
Grant 7,402,626 - Maeda , et al. July 22, 2
2008-07-22
Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
Grant 7,399,815 - Kobayashi , et al. July 15, 2
2008-07-15
Polymer, resist composition and patterning process
Grant 7,378,218 - Harada , et al. May 27, 2
2008-05-27
Polymer, resist protective coating material, and patterning process
Grant 7,354,693 - Hatakeyama , et al. April 8, 2
2008-04-08
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern
App 20080003517 - Komoriya; Haruhiko ;   et al.
2008-01-03
Polymerizable ester compounds
Grant 7,276,623 - Harada , et al. October 2, 2
2007-10-02
Polymer, resist composition, and patterning process
Grant 7,241,553 - Hatakeyama , et al. July 10, 2
2007-07-10
Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation
Grant 7,232,917 - Sumida , et al. June 19, 2
2007-06-19
Novel ester compound, polymer, resist composition, and patterning process
App 20070128555 - Harada; Yuji ;   et al.
2007-06-07
Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
App 20070105044 - Maeda; Kazuhiko ;   et al.
2007-05-10
Process for producing top coat film used in lithography
App 20070087125 - Maeda; Kazuhiko ;   et al.
2007-04-19
Resist protective coating material and patterning process
App 20070026341 - Hatakeyama; Jun ;   et al.
2007-02-01
Polymers, resist compositions and patterning process
Grant 7,169,869 - Harada , et al. January 30, 2
2007-01-30
Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation
App 20060270864 - Sumida; Shinichi ;   et al.
2006-11-30
Novel polymerizable ester compounds
App 20060269870 - Harada; Yuji ;   et al.
2006-11-30
Polymer, resist composition and patterning process
App 20060269871 - Harada; Yuji ;   et al.
2006-11-30
Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection file material using such copolymers
App 20060264592 - Kobayashi; Satoru ;   et al.
2006-11-23
Polymers, resist compositions and patterning process
Grant 7,125,643 - Harada , et al. October 24, 2
2006-10-24
Sulfonates, polymers, resist compositions and patterning process
Grant 7,125,642 - Harada , et al. October 24, 2
2006-10-24
Polymers, resist compositions and patterning process
Grant 7,125,641 - Harada , et al. October 24, 2
2006-10-24
Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
Grant 7,125,943 - Sumida , et al. October 24, 2
2006-10-24
Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same
Grant 7,122,292 - Sumida , et al. October 17, 2
2006-10-17
Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
Grant 7,109,383 - Kobayashi , et al. September 19, 2
2006-09-19
Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same
Grant 7,105,618 - Komoriya , et al. September 12, 2
2006-09-12
Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process
App 20060194143 - Sumida; Shinichi ;   et al.
2006-08-31
Polymer, resist composition and patterning process
App 20060177765 - Harada; Yuji ;   et al.
2006-08-10
Polymers, resist compositions and patterning process
Grant 7,067,231 - Harada , et al. June 27, 2
2006-06-27
Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
App 20060135744 - Komoriya; Haruhiko ;   et al.
2006-06-22
Transparent fluorine-containing copolymer
Grant 7,060,771 - Komoriya , et al. June 13, 2
2006-06-13
Transparent fluorine-containing copolymer
App 20060063902 - Komoriya; Haruhiko ;   et al.
2006-03-23
Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same
App 20060057489 - Sumida; Shinichi ;   et al.
2006-03-16
Resist compositions and patterning process
Grant 7,001,707 - Hatakeyama , et al. February 21, 2
2006-02-21
Polymer, resist protective coating material, and patterning process
App 20060029884 - Hatakeyama; Jun ;   et al.
2006-02-09
Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes
Grant 6,992,210 - Kobayashi , et al. January 31, 2
2006-01-31
Polymers, resist compositions and patterning process
App 20050267275 - Harada, Yuji ;   et al.
2005-12-01
Top coat composition
App 20050250898 - Maeda, Kazuhiko ;   et al.
2005-11-10
Polymer, resist composition, and patterning process
App 20050221221 - Hatakeyama, Jun ;   et al.
2005-10-06
Polymers, resist compositions and patterning process
Grant 6,946,235 - Harada , et al. September 20, 2
2005-09-20
Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same
Grant 6,943,271 - Sumida , et al. September 13, 2
2005-09-13
Polymer, resist composition, and patterning process
App 20050175935 - Harada, Yuji ;   et al.
2005-08-11
Esters, polymers, resist compositions and patterning process
Grant 6,916,592 - Harada , et al. July 12, 2
2005-07-12
Polymers, resist compositions and patterning process
App 20050106499 - Harada, Yuji ;   et al.
2005-05-19
Polymers, resist compositions and patterning process
App 20050089797 - Harada, Yuji ;   et al.
2005-04-28
Resist compositions and patterning process
App 20050084796 - Hatakeyama, Jun ;   et al.
2005-04-21
Resist compositions and patterning process
Grant 6,875,556 - Harada , et al. April 5, 2
2005-04-05
Polymers, resist compositions and patterning process
Grant 6,872,514 - Harada , et al. March 29, 2
2005-03-29
Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
Grant 6,858,760 - Komoriya , et al. February 22, 2
2005-02-22
Chemically amplified resist compositions and patterning process
Grant 6,855,477 - Hatakeyama , et al. February 15, 2
2005-02-15
Polymers, resist compositions and patterning process
Grant 6,824,955 - Harada , et al. November 30, 2
2004-11-30
Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
App 20040225159 - Komoriya, Haruhiko ;   et al.
2004-11-11
Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes
App 20040180954 - Kobayashi, Satoru ;   et al.
2004-09-16
Polymers, resist compositions and patterning process
App 20040157155 - Harada, Yuji ;   et al.
2004-08-12
Sulfonates, polymers, resist compositions and patterning process
App 20040157156 - Harada, Yuji ;   et al.
2004-08-12
Resist compositions and patterning process
App 20040144752 - Harada, Yuji ;   et al.
2004-07-29
Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
App 20040116750 - Kobayashi, Satoru ;   et al.
2004-06-17
Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
App 20040106755 - Sumida, Shinichi ;   et al.
2004-06-03
Polymers, resist compositions and patterning process
App 20040030079 - Harada, Yuji ;   et al.
2004-02-12
Fluorinated polymer
App 20040023176 - Harada, Yuji ;   et al.
2004-02-05
Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same
App 20040002612 - Sumida, Shinichi ;   et al.
2004-01-01
Transparent fluorine-containing copolymer
App 20030236369 - Komoriya, Haruhiko ;   et al.
2003-12-25
Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same
App 20030232940 - Komoriya, Haruhiko ;   et al.
2003-12-18
Novel esters, polymers, resist compositions and patterning process
App 20030219678 - Harada, Yuji ;   et al.
2003-11-27
Polymers, resist compositions and patterning process
App 20030215739 - Harada, Yuji ;   et al.
2003-11-20
Polymers, resist compositions and patterning process
App 20030165773 - Harada, Yuji ;   et al.
2003-09-04
Ester compounds
Grant 6,603,037 - Harada , et al. August 5, 2
2003-08-05
Novel Ester Compounds
App 20030100791 - Harada, Yuji ;   et al.
2003-05-29
Chemically amplified resist compositions and patterning process
App 20030099901 - Hatakeyama, Jun ;   et al.
2003-05-29
Coated granular fertilizer and method for producing same
Grant 6,322,606 - Komoriya , et al. November 27, 2
2001-11-27
Coated granular fertilizer and method for producing same
Grant 6,176,891 - Komoriya , et al. January 23, 2
2001-01-23

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